KR970048750A - Formation method of black matrix - Google Patents

Formation method of black matrix Download PDF

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Publication number
KR970048750A
KR970048750A KR1019950065947A KR19950065947A KR970048750A KR 970048750 A KR970048750 A KR 970048750A KR 1019950065947 A KR1019950065947 A KR 1019950065947A KR 19950065947 A KR19950065947 A KR 19950065947A KR 970048750 A KR970048750 A KR 970048750A
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KR
South Korea
Prior art keywords
glass substrate
black matrix
light blocking
forming
blocking material
Prior art date
Application number
KR1019950065947A
Other languages
Korean (ko)
Inventor
진용석
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950065947A priority Critical patent/KR970048750A/en
Publication of KR970048750A publication Critical patent/KR970048750A/en

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  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)

Abstract

본 발명은 유리기판의 단차문제와 표면 반사를 제거하기 위하여 유리기판상에 홈을 형성하고 그속에 차광물질을 채워넣어 블랙매트릭스를 형성하는 방법에 관한 것이다.The present invention relates to a method of forming a black matrix by forming a groove on a glass substrate and filling a light blocking material therein in order to eliminate a step problem and surface reflection of the glass substrate.

본 발명의 목적은 상기 종래 기술의 문제점을 해결하기 위하여 단차가 발생하지 않고 표면반사에 의해 표시 품질이 저하되지 않는 블랙매트릭스를 형성하는 것이다.An object of the present invention is to form a black matrix in which a step does not occur and display quality is not degraded by surface reflection in order to solve the problems of the prior art.

이와 같은 본 발명의 목적을 실현하기 위해 본 발명은 유리기판 상에 감광성 포토레지스트를 도포하는 단계,블랙매트릭스 마스크로 상기 포토레지스트를 노광,현상하여 포토레지스트 패턴을 형성하는 단계,상기 유리기판을 습식에 칭하여 홈을 형성하는 단계,유동성 차광물질을 상기 유리기판 전면에 도포하는 단계,상기 차광물질을 상기 홈에만 잔류시킨 채 상기 유리기판의 표면으로부터 제거하는 단계로 이루어진 것을 특징으로 한다.In order to realize the object of the present invention, the present invention comprises the steps of applying a photosensitive photoresist on a glass substrate, forming a photoresist pattern by exposing and developing the photoresist with a black matrix mask, wet the glass substrate Forming a groove, applying a liquid light blocking material to the entire surface of the glass substrate, and removing the light blocking material from the surface of the glass substrate while leaving the light blocking material only in the groove.

상기와 같이 형성된 블랙매트릭스는 차광물질이 유리기판내의 홈으로 충진되기 때문에 단차를 전혀 발생하지 않으며 외부 입사광이 블랙매트릭스에서 반사될 때 반사광의 각도가 크게 바뀌어 반사광이 직접나오지 않는다.따라서 표면 반사에 의한 품질저하를 억제할 수 있다.The black matrix formed as described above does not generate any step because the light blocking material is filled into the grooves in the glass substrate. Quality deterioration can be suppressed.

Description

블랙매트릭스 형성방법Formation method of black matrix

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명의 블랙매트릭스를 제조하기 위한 공정도.3 is a process chart for producing a black matrix of the present invention.

Claims (3)

액정표시장치의 유리기판상에 블랙매트릭스를 형성하는 방법에 있어서,유리기판(1)상에 감광성 포토레지스트(5)를 도포하는 단계,블랙매트릭스 마스크(4)로 상기 포토레지스트를 노광,현상하여 포토레지스트 패턴을 형성하는 단계,상기 유리기판을 습식에칭하여 홈(6)을 형성하는 단계,유동성 차광물질(7)을 상기 유리기판 전면에 도포하는 단계,상기 차광물질을 상기 홈에만 잔류시킨 채 상기 유리기판의표면으로부터 제거하는 단계로 이루어진 것을 특징으로 하는 블랙매트릭스 형성방법.A method of forming a black matrix on a glass substrate of a liquid crystal display device, the method comprising: applying a photosensitive photoresist 5 on a glass substrate 1, exposing and developing the photoresist with a black matrix mask 4 Forming a resist pattern, forming a groove 6 by wet etching the glass substrate, applying a liquid light blocking material 7 to the entire surface of the glass substrate, and leaving the light blocking material in the groove only. And removing the surface of the glass substrate. 제1항에 있어서,상기 홈(6)은 쐐기형 홈인 것을 특징으로 하는 블랙매트릭스 형성방법.The method according to claim 1, wherein the groove (6) is a wedge-shaped groove. 제1항에 있어서,상기 유리기판(1)상의 잔류물질은 스퀴저(8)를 이용하여 제거하는 것을 특징으로 하는 블랙매트릭스 형성방법.The method according to claim 1, wherein the residual material on the glass substrate (1) is removed by using a squeezer (8). ※ 참고사항: 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the original application.
KR1019950065947A 1995-12-29 1995-12-29 Formation method of black matrix KR970048750A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950065947A KR970048750A (en) 1995-12-29 1995-12-29 Formation method of black matrix

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Application Number Priority Date Filing Date Title
KR1019950065947A KR970048750A (en) 1995-12-29 1995-12-29 Formation method of black matrix

Publications (1)

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KR970048750A true KR970048750A (en) 1997-07-29

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KR1019950065947A KR970048750A (en) 1995-12-29 1995-12-29 Formation method of black matrix

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060093411A (en) * 2005-02-21 2006-08-25 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for repairing bright spot of the same
KR100729561B1 (en) * 2000-06-19 2007-06-18 엘지.필립스 엘시디 주식회사 Thin Film Transistor Liquid Crystal Display Device and Method of fabricating the same
KR100849387B1 (en) * 2006-12-01 2008-07-31 엘지전자 주식회사 Contrast ratio film, manufacturing method thereof and plasma display panel using the same
KR101108383B1 (en) * 2004-12-03 2012-01-30 엘지디스플레이 주식회사 Liquid Crystal Display Panel and Method of Fabricating the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100729561B1 (en) * 2000-06-19 2007-06-18 엘지.필립스 엘시디 주식회사 Thin Film Transistor Liquid Crystal Display Device and Method of fabricating the same
KR101108383B1 (en) * 2004-12-03 2012-01-30 엘지디스플레이 주식회사 Liquid Crystal Display Panel and Method of Fabricating the same
KR20060093411A (en) * 2005-02-21 2006-08-25 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for repairing bright spot of the same
KR100849387B1 (en) * 2006-12-01 2008-07-31 엘지전자 주식회사 Contrast ratio film, manufacturing method thereof and plasma display panel using the same

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