KR970023787A - Flow automatic control - Google Patents

Flow automatic control Download PDF

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Publication number
KR970023787A
KR970023787A KR1019950036465A KR19950036465A KR970023787A KR 970023787 A KR970023787 A KR 970023787A KR 1019950036465 A KR1019950036465 A KR 1019950036465A KR 19950036465 A KR19950036465 A KR 19950036465A KR 970023787 A KR970023787 A KR 970023787A
Authority
KR
South Korea
Prior art keywords
flow rate
line
supply
facility
main tank
Prior art date
Application number
KR1019950036465A
Other languages
Korean (ko)
Inventor
유성준
박용웅
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950036465A priority Critical patent/KR970023787A/en
Publication of KR970023787A publication Critical patent/KR970023787A/en

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Abstract

반도체 소자 제조시 사용되는 유량 자동 통제장치에 관하여 기재하고 있다. 본 발명에 따른 유량 자동 통제장치는 반도체 소자 제조시 사용되는 액체가 저장된 주탱크, 상기 주탱크로부터 각 라인별/설비별로 공급되는 액 체의 유량을 측정하기 위해 각 라인별/설비별 공급 및 회수 배관에 설치된 초음파 유량 측정 센서, 상기 주탱크로부터 액체 공급을 제어하기 위해 각 라인별/설비별 공급 및 회수배관에 설치된 밸브, 및 상기 센서들로부터 감지된 데이터를 표시, 저장 및 처리하여 상기 데이터를 중앙관리할수 있도록 상기 센서들과 접속되고, 유량을 제어하기 위해 상기 밸브와 접속되는 주컴퓨터를 구비한다. 따라서, 각 제조라인/설비에 일정한 압력의 유량공급이 가능하게 하여, 생산원가 절감이 가능하고 세정공정을 안정하게 관리할 수 있다.Disclosed is a flow rate automatic control device used in the manufacture of semiconductor devices. The automatic flow control device according to the present invention is the main tank in which the liquid used in the manufacture of the semiconductor device is stored, the supply and recovery of each line / facility to measure the flow rate of the liquid supplied by each line / facility from the main tank Ultrasonic flow rate measurement sensor installed in the pipe, valves installed in the supply and recovery piping for each line and equipment to control the liquid supply from the main tank, and the data sensed from the sensors to display, store and process the data A main computer is connected to the sensors for central management and to the valve for controlling the flow rate. Therefore, it is possible to supply a constant pressure flow rate to each production line / equipment, thereby reducing production costs and stably managing the cleaning process.

Description

유량 자동 통제장치Flow automatic control

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 제1실시예에 따른 유량자동 통제장치를 도시한 개략도이다,1 is a schematic diagram showing a flow automatic control device according to a first embodiment of the present invention,

제2도는 본 발명의 제2실시예에 따른 유량자동 통제장치를 도시한 개략도이다.2 is a schematic view showing a flow automatic control apparatus according to a second embodiment of the present invention.

Claims (2)

반도체 소자 제조시 사용되는 액체가 저장된 주탱크; 상기 주탱크로부터 각 라인별/설비 별로 공급되는 액체의 유량을 측정하기 위해 각 라인별/설비별 공급 및 회수 배관에 설치된 초음파 유량 측정 센서 ; 상기 주탱크로부터 액체 공급을 제어하기 위해 각 라인별/설비별 공급 및 회수배관에 설치된 밸브; 및 상기 센서들로부터 감지된 데이터를 표시 저장 및 처리하여 상기 데이터를 중앙관리할 수 있도록 상기 센서들과 접속되고 유량을 제어하기 위해 상기 밸브와 접속되는 주컴퓨터를 구비하는 것을 특징으로 하는 유량 자동 통제장치.A main tank in which a liquid used in manufacturing a semiconductor device is stored; Ultrasonic flow rate measurement sensor installed in the supply and recovery pipes for each line / facility to measure the flow rate of the liquid supplied to each line / facility from the main tank; A valve installed in each line / equipment supply and recovery piping to control the liquid supply from the main tank; And a main computer connected with the valves to control the flow rate so as to centrally manage the data by displaying, storing and processing the data sensed by the sensors. Device. 제1항에 있어서, 각 설비에서의 순간 유량 최소화로 공급 배관에 과부하가 발생될 경우, 배관의 파손을 방지하기 위한 우회라인에 설치되고 상기 각 설비와 연결된 릴리프(relief) 밸브를 더 구비하는 것을 특징으로 하는 유량 자동 통제장치.The method of claim 1, further comprising a relief valve installed in the bypass line and connected to each facility in order to prevent damage to the pipe when the supply pipe is overloaded by minimizing the flow rate in each facility. Features automatic flow control. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950036465A 1995-10-20 1995-10-20 Flow automatic control KR970023787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950036465A KR970023787A (en) 1995-10-20 1995-10-20 Flow automatic control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950036465A KR970023787A (en) 1995-10-20 1995-10-20 Flow automatic control

Publications (1)

Publication Number Publication Date
KR970023787A true KR970023787A (en) 1997-05-30

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950036465A KR970023787A (en) 1995-10-20 1995-10-20 Flow automatic control

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KR (1) KR970023787A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100607468B1 (en) * 2004-07-16 2006-08-03 허상록 The device of scrubber contain ultrasonic wave sensor and the method of check on flux over scrubber using ultrasonic wave sensor
KR101037182B1 (en) * 2008-11-14 2011-05-26 세메스 주식회사 An Apparatus for Handling Requid in System for Manufacturing Substrate and Method Thereof
KR20160083278A (en) * 2014-12-30 2016-07-12 세메스 주식회사 Apparatus and method for treatinf substrate
KR20190121584A (en) * 2018-04-18 2019-10-28 (주)지엠에스티코리아 A System for Detecting a Fluid Situation with a Ultrasonic Sensor and a Method for the Same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100607468B1 (en) * 2004-07-16 2006-08-03 허상록 The device of scrubber contain ultrasonic wave sensor and the method of check on flux over scrubber using ultrasonic wave sensor
KR101037182B1 (en) * 2008-11-14 2011-05-26 세메스 주식회사 An Apparatus for Handling Requid in System for Manufacturing Substrate and Method Thereof
KR20160083278A (en) * 2014-12-30 2016-07-12 세메스 주식회사 Apparatus and method for treatinf substrate
KR20190121584A (en) * 2018-04-18 2019-10-28 (주)지엠에스티코리아 A System for Detecting a Fluid Situation with a Ultrasonic Sensor and a Method for the Same

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