KR970023787A - Flow automatic control - Google Patents
Flow automatic control Download PDFInfo
- Publication number
- KR970023787A KR970023787A KR1019950036465A KR19950036465A KR970023787A KR 970023787 A KR970023787 A KR 970023787A KR 1019950036465 A KR1019950036465 A KR 1019950036465A KR 19950036465 A KR19950036465 A KR 19950036465A KR 970023787 A KR970023787 A KR 970023787A
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- KR
- South Korea
- Prior art keywords
- flow rate
- line
- supply
- facility
- main tank
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Abstract
반도체 소자 제조시 사용되는 유량 자동 통제장치에 관하여 기재하고 있다. 본 발명에 따른 유량 자동 통제장치는 반도체 소자 제조시 사용되는 액체가 저장된 주탱크, 상기 주탱크로부터 각 라인별/설비별로 공급되는 액 체의 유량을 측정하기 위해 각 라인별/설비별 공급 및 회수 배관에 설치된 초음파 유량 측정 센서, 상기 주탱크로부터 액체 공급을 제어하기 위해 각 라인별/설비별 공급 및 회수배관에 설치된 밸브, 및 상기 센서들로부터 감지된 데이터를 표시, 저장 및 처리하여 상기 데이터를 중앙관리할수 있도록 상기 센서들과 접속되고, 유량을 제어하기 위해 상기 밸브와 접속되는 주컴퓨터를 구비한다. 따라서, 각 제조라인/설비에 일정한 압력의 유량공급이 가능하게 하여, 생산원가 절감이 가능하고 세정공정을 안정하게 관리할 수 있다.Disclosed is a flow rate automatic control device used in the manufacture of semiconductor devices. The automatic flow control device according to the present invention is the main tank in which the liquid used in the manufacture of the semiconductor device is stored, the supply and recovery of each line / facility to measure the flow rate of the liquid supplied by each line / facility from the main tank Ultrasonic flow rate measurement sensor installed in the pipe, valves installed in the supply and recovery piping for each line and equipment to control the liquid supply from the main tank, and the data sensed from the sensors to display, store and process the data A main computer is connected to the sensors for central management and to the valve for controlling the flow rate. Therefore, it is possible to supply a constant pressure flow rate to each production line / equipment, thereby reducing production costs and stably managing the cleaning process.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명의 제1실시예에 따른 유량자동 통제장치를 도시한 개략도이다,1 is a schematic diagram showing a flow automatic control device according to a first embodiment of the present invention,
제2도는 본 발명의 제2실시예에 따른 유량자동 통제장치를 도시한 개략도이다.2 is a schematic view showing a flow automatic control apparatus according to a second embodiment of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950036465A KR970023787A (en) | 1995-10-20 | 1995-10-20 | Flow automatic control |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950036465A KR970023787A (en) | 1995-10-20 | 1995-10-20 | Flow automatic control |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970023787A true KR970023787A (en) | 1997-05-30 |
Family
ID=66584243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950036465A KR970023787A (en) | 1995-10-20 | 1995-10-20 | Flow automatic control |
Country Status (1)
Country | Link |
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KR (1) | KR970023787A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100607468B1 (en) * | 2004-07-16 | 2006-08-03 | 허상록 | The device of scrubber contain ultrasonic wave sensor and the method of check on flux over scrubber using ultrasonic wave sensor |
KR101037182B1 (en) * | 2008-11-14 | 2011-05-26 | 세메스 주식회사 | An Apparatus for Handling Requid in System for Manufacturing Substrate and Method Thereof |
KR20160083278A (en) * | 2014-12-30 | 2016-07-12 | 세메스 주식회사 | Apparatus and method for treatinf substrate |
KR20190121584A (en) * | 2018-04-18 | 2019-10-28 | (주)지엠에스티코리아 | A System for Detecting a Fluid Situation with a Ultrasonic Sensor and a Method for the Same |
-
1995
- 1995-10-20 KR KR1019950036465A patent/KR970023787A/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100607468B1 (en) * | 2004-07-16 | 2006-08-03 | 허상록 | The device of scrubber contain ultrasonic wave sensor and the method of check on flux over scrubber using ultrasonic wave sensor |
KR101037182B1 (en) * | 2008-11-14 | 2011-05-26 | 세메스 주식회사 | An Apparatus for Handling Requid in System for Manufacturing Substrate and Method Thereof |
KR20160083278A (en) * | 2014-12-30 | 2016-07-12 | 세메스 주식회사 | Apparatus and method for treatinf substrate |
KR20190121584A (en) * | 2018-04-18 | 2019-10-28 | (주)지엠에스티코리아 | A System for Detecting a Fluid Situation with a Ultrasonic Sensor and a Method for the Same |
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WITN | Withdrawal due to no request for examination |