KR970023610A - Supply device for chemical solution for semiconductor device manufacturing - Google Patents
Supply device for chemical solution for semiconductor device manufacturing Download PDFInfo
- Publication number
- KR970023610A KR970023610A KR1019950035602A KR19950035602A KR970023610A KR 970023610 A KR970023610 A KR 970023610A KR 1019950035602 A KR1019950035602 A KR 1019950035602A KR 19950035602 A KR19950035602 A KR 19950035602A KR 970023610 A KR970023610 A KR 970023610A
- Authority
- KR
- South Korea
- Prior art keywords
- flow rate
- chemical liquid
- valve
- supply
- semiconductor manufacturing
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
본 발명은 반도체 제조공정에 사용되는 화학용액을 공급하는 반도제조장치에 관한 것으로, 특히 비율이 높은 화학용액의 혼합시 소량의 약액을 공정조 또는 혼합조에 정밀한 제어로 공급이 가능하도록 한 화학용액의 정량공급장치에 대한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus for supplying chemical solutions used in semiconductor manufacturing processes. It is about a fixed quantity supply device.
종래의 약액공급장치는 이러한 설비가 공간을 많이 차지할 뿐 아니라 다양한 비율을 요구하는 현재의 세정공정에 대처하기 어렵고, 정량을 조절할 수 없는 상태에서 자체적으로 보정할거나 제어할 수 있는 장비가 없어 후속세정공정에 막대한 영향을 미쳐왔었다.The conventional chemical liquid supply device is difficult to cope with the current cleaning process that requires various ratios, such as the equipment takes up a lot of space, and there is no equipment for self-calibration or control in the absence of control of the subsequent cleaning. It has had a huge impact on the process.
본 발명은 상술한 문제점들을 극복하기 위한 것으로, 반도체 제조장비에 사용되는 화학용액을 공정조 또는 혼합조에 정량공급하기 위한 밸브를 구비한 약액중앙공급부(CCSS)을 구비하고 상기 약액중앙공급부와 밸브사이의 공급라인에 연결되는 유량감지수단과, 상기 유량감지부재에서 감지된 데이터를 입력받아 상기 밸브를 제어하는 제어 신호를 출력하는 제어수단을 포함하여 약액의 정량공급과 다양한 비율에 대한 조절은 물론 정량공급의 에러에 대해 자체진단을 하여 보정할 수 있도록 한 것이다.SUMMARY OF THE INVENTION The present invention is to overcome the above-mentioned problems, and includes a chemical solution central supply unit (CCSS) having a valve for quantitatively supplying a chemical solution used in semiconductor manufacturing equipment to a process tank or a mixing tank, and between the chemical solution central supply unit and the valve. Flow rate sensing means connected to the supply line of the control unit, and the control means for receiving the data sensed by the flow rate sensing member and outputs a control signal for controlling the valve, the quantitative supply of the chemical liquid and the adjustment of various ratios as well as quantitative The self-diagnosis of the supply error can be made and corrected.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 종래의 화학용액 공급장치.2 is a conventional chemical solution supply device.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950035602A KR970023610A (en) | 1995-10-16 | 1995-10-16 | Supply device for chemical solution for semiconductor device manufacturing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950035602A KR970023610A (en) | 1995-10-16 | 1995-10-16 | Supply device for chemical solution for semiconductor device manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970023610A true KR970023610A (en) | 1997-05-30 |
Family
ID=66583851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950035602A KR970023610A (en) | 1995-10-16 | 1995-10-16 | Supply device for chemical solution for semiconductor device manufacturing |
Country Status (1)
Country | Link |
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KR (1) | KR970023610A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100382045B1 (en) * | 2000-11-10 | 2003-04-26 | 씨앤지하이테크 주식회사 | Multi-channel Batch Controller and the Method Therefor |
KR100425962B1 (en) * | 2001-06-13 | 2004-04-03 | 강정호 | Apparatus for controlling chemical flux in a wafer cleaning system and the method thereof |
KR100507617B1 (en) * | 2000-12-28 | 2005-08-10 | 씨앤지하이테크 주식회사 | Supply Monitoring Method and Supply Monitoring of Medicinal Fluid for Wafer Coating and Flow Measurement System for Supply Control |
KR100506800B1 (en) * | 1998-10-01 | 2005-09-26 | 삼성전자주식회사 | System for sensing strange flow of developer |
-
1995
- 1995-10-16 KR KR1019950035602A patent/KR970023610A/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100506800B1 (en) * | 1998-10-01 | 2005-09-26 | 삼성전자주식회사 | System for sensing strange flow of developer |
KR100382045B1 (en) * | 2000-11-10 | 2003-04-26 | 씨앤지하이테크 주식회사 | Multi-channel Batch Controller and the Method Therefor |
KR100507617B1 (en) * | 2000-12-28 | 2005-08-10 | 씨앤지하이테크 주식회사 | Supply Monitoring Method and Supply Monitoring of Medicinal Fluid for Wafer Coating and Flow Measurement System for Supply Control |
KR100425962B1 (en) * | 2001-06-13 | 2004-04-03 | 강정호 | Apparatus for controlling chemical flux in a wafer cleaning system and the method thereof |
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |