KR970018766A - Horizontal Chemical Vapor Deposition of Semiconductor Manufacturing Equipment - Google Patents
Horizontal Chemical Vapor Deposition of Semiconductor Manufacturing Equipment Download PDFInfo
- Publication number
- KR970018766A KR970018766A KR1019950031808A KR19950031808A KR970018766A KR 970018766 A KR970018766 A KR 970018766A KR 1019950031808 A KR1019950031808 A KR 1019950031808A KR 19950031808 A KR19950031808 A KR 19950031808A KR 970018766 A KR970018766 A KR 970018766A
- Authority
- KR
- South Korea
- Prior art keywords
- chemical vapor
- vapor deposition
- reaction chamber
- reactor
- supplied
- Prior art date
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Abstract
본 발명은 반도체 제조공정중 화학증착장비에 관한 것으로 특히 프로세스 튜브의 구조를 개선하여 공정의 균일성을 향상하기 위한 것이다. 공정시 N2O 가스가 반응실인 프로세스 튜브의 앞 플랜지부위에서 직접 공급되므로 활성화 되지 않은 상태에서 공정을 진행함으로써 균일성이 좋지 않았다. 본 발명은 상술한 문제점을 극복하기 위한 것으로 반응실내에 가스를 공급하여 증착공정을 하는 저압 화학 기상 증착시스템에 있어서, 공급되는 반응가스를 반응실에 이중구조의 튜브나 분사기를 통해 활성화시켜 공급하여 균일한 증착효과를 가져오도록 한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to chemical vapor deposition equipment in semiconductor manufacturing processes, and in particular, to improve process uniformity by improving the structure of process tubes. During the process, N 2 O gas was supplied directly from the front flange of the process tube, which is the reaction chamber. The present invention is to overcome the above-mentioned problems, in the low pressure chemical vapor deposition system to supply the gas into the reaction chamber to perform the deposition process, by supplying the reaction gas supplied to the reaction chamber through a double tube or injector It is to bring a uniform deposition effect.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도는 본 발명의 전체적인 구성도.1 is an overall configuration diagram of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950031808A KR970018766A (en) | 1995-09-26 | 1995-09-26 | Horizontal Chemical Vapor Deposition of Semiconductor Manufacturing Equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950031808A KR970018766A (en) | 1995-09-26 | 1995-09-26 | Horizontal Chemical Vapor Deposition of Semiconductor Manufacturing Equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970018766A true KR970018766A (en) | 1997-04-30 |
Family
ID=66615635
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950031808A KR970018766A (en) | 1995-09-26 | 1995-09-26 | Horizontal Chemical Vapor Deposition of Semiconductor Manufacturing Equipment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970018766A (en) |
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1995
- 1995-09-26 KR KR1019950031808A patent/KR970018766A/en not_active Application Discontinuation
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