KR970011995A - Mask Manufacturing Method Using Photoresist - Google Patents
Mask Manufacturing Method Using Photoresist Download PDFInfo
- Publication number
- KR970011995A KR970011995A KR1019950028517A KR19950028517A KR970011995A KR 970011995 A KR970011995 A KR 970011995A KR 1019950028517 A KR1019950028517 A KR 1019950028517A KR 19950028517 A KR19950028517 A KR 19950028517A KR 970011995 A KR970011995 A KR 970011995A
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist
- mask
- electron beam
- manufacturing
- fluorescent material
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
포토레시스트를 이용한 마스크의 제조방법에 관하여 개시한다. 본 발명은 전자빔으로 포토레지스크를 노광하기 위하여 상기 포토레지스트위에 형광물질을 도포하는 단계를 포하하는 것을 특징으로 하는 마스크의 제조방법을 제공한다. 본 발명에 따라서 상기 형광 물질을 이용하여 상기 전자빔은 상기 포토레지스크를 노광할 수 있는 빛으로 변환되고, 이 변환된 빛을 이용하여 용이하게 상기 포토레지스트를 노광하여 포토레지스크 패턴을 형성할 수 있다. 따라서, 고해상도 및 높은 재현성을 가지는 마스크 패턴을 쉽게 얻을 수 있으며, 공정도 상당히 용이하여 고집적 반도체 장치에 필요한 마스크를 제작 할 수 있다.A method of manufacturing a mask using photoresist is disclosed. The present invention provides a method of manufacturing a mask, comprising the step of applying a fluorescent material on the photoresist for exposing the photoresist with an electron beam. According to the present invention, the electron beam is converted into light capable of exposing the photoresist using the fluorescent material, and the photoresist can be easily exposed using the converted light to form a photoresist pattern. have. Therefore, a mask pattern having a high resolution and a high reproducibility can be easily obtained, and the process is also very easy to manufacture a mask required for a highly integrated semiconductor device.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제 2도는 본 발명에 의하여 마스크를 제작하는 방법을 순서대로 보여주는 단면도이다.2 is a cross-sectional view sequentially showing a method of manufacturing a mask according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950028517A KR970011995A (en) | 1995-08-31 | 1995-08-31 | Mask Manufacturing Method Using Photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950028517A KR970011995A (en) | 1995-08-31 | 1995-08-31 | Mask Manufacturing Method Using Photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970011995A true KR970011995A (en) | 1997-03-29 |
Family
ID=66597067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950028517A KR970011995A (en) | 1995-08-31 | 1995-08-31 | Mask Manufacturing Method Using Photoresist |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970011995A (en) |
-
1995
- 1995-08-31 KR KR1019950028517A patent/KR970011995A/en not_active Application Discontinuation
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Legal Events
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WITN | Withdrawal due to no request for examination |