KR960043844A - Manufacturing method of optical path control device - Google Patents

Manufacturing method of optical path control device Download PDF

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Publication number
KR960043844A
KR960043844A KR1019950013352A KR19950013352A KR960043844A KR 960043844 A KR960043844 A KR 960043844A KR 1019950013352 A KR1019950013352 A KR 1019950013352A KR 19950013352 A KR19950013352 A KR 19950013352A KR 960043844 A KR960043844 A KR 960043844A
Authority
KR
South Korea
Prior art keywords
forming
sacrificial layer
protective film
manufacturing
optical path
Prior art date
Application number
KR1019950013352A
Other languages
Korean (ko)
Other versions
KR0159393B1 (en
Inventor
최영준
Original Assignee
배순훈
대우전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 배순훈, 대우전자 주식회사 filed Critical 배순훈
Priority to KR1019950013352A priority Critical patent/KR0159393B1/en
Priority to US08/639,575 priority patent/US5637517A/en
Priority to CN96105153A priority patent/CN1160220A/en
Priority to JP8116130A priority patent/JPH08327881A/en
Publication of KR960043844A publication Critical patent/KR960043844A/en
Application granted granted Critical
Publication of KR0159393B1 publication Critical patent/KR0159393B1/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3141—Constructional details thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/09372—Pads and lands

Abstract

본 발명은 광로조절장치의 제조방법에 관한 것으로서, 상부전극의 표면과 액츄에이터 들을 분리할 때 생성되는 측면들에보호막을 형성함과 동시에 노출된 구동기판의 소정 부분에 인접하는 액츄에이터들에 형성된 보호막을 기계적으로 연결시키도록 브리지를 길게 형성하여 희생막을 식각용액으로 제거한 후 세정 및 건조할 때 액츄에이터들의 유동을 방지한다.따라서, 세정 및 건조시 세정용액의 표면장력에 의해 발생되는 스티킹 현상을 방지할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical path control device, wherein a protective film is formed on surfaces of an upper electrode and side surfaces generated when separating actuators, and a protective film formed on actuators adjacent to a predetermined portion of an exposed driving substrate. The bridge is formed long to be mechanically connected to remove the sacrificial film with an etching solution, and then to prevent the flow of the actuators during cleaning and drying. Therefore, it is possible to prevent the sticking phenomenon caused by the surface tension of the cleaning solution during cleaning and drying. Can be.

Description

광로 조절 장치의 제조방법Manufacturing method of optical path control device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도(A) 내지 (D)는 본 발명의 실시예에 따른 광로 조절 장치의 제조공정도.2 (A) to (D) is a manufacturing process diagram of the optical path control apparatus according to an embodiment of the present invention.

Claims (9)

트랜지스터들을 매트릭스 상태로 내장하고 표면에 상기 트랜지스터들과 전기적으로 연결된 패드(43)들을갖는 구동기판(41)의 상부에 희생막(45)을 형성하는 공정과, 상기 패드(43)들 주위의 소정 부분의 상기 희생막(45)을 제거하여 상기 구동기판(41)을 노출시키고, 상기 노출된 구동기판(41)과 상기 희생막(45)의 상부에 멤브레인(47)을 형성하는 공정과, 상기 멤브레인(47)의 소정 부분을 상기 패드(43)가 노출되도록 제거하여 개구(49)를 형성하고 그 개구(49)에플러그(51)를 형성하는 공정과, 상기 멤브레인(47)의 상부에 상기 플러그(51)와 전기적으로 접촉되는 하부전극(53)을 형성하는 공정과, 상기 하부전극(53)의 상부에 변형부(55)와 상부전극(57)을 순차적으로 형성하는 공정과, 상기 상부전극(57) 부터 상기 멤브레인(47)까지 소정 부분을 상기 희생막(45)이 노출되도록 제거하여 액츄에이터들을 분리하는 공정과,상기 상부전극(57)의 표면 및 액츄에이터의 표면에 보호막(59)을 형성함과 동시에 상기 노출된 구동기판(41)의 소정 부분에 보호막(59)과 인접하는 액츄에이터의 보호막을 기계적으로 연결하는 브리지(61)를 형성하는 공정과, 상기 희생막(45)을 제거하는 공정과, 상기 보호막(59) 및 브리지(61)를 제거하는 공정을 구비하는 광로조절장치의 제조방법.Forming a sacrificial layer 45 on top of the driving substrate 41 having the transistors embedded in a matrix state and having pads 43 electrically connected to the transistors on a surface thereof; Removing the sacrificial layer 45 at a portion to expose the driving substrate 41, and forming a membrane 47 on the exposed driving substrate 41 and the sacrificial layer 45; Removing a portion of the membrane 47 so that the pad 43 is exposed to form an opening 49 and forming a plug 51 in the opening 49, and the upper portion of the membrane 47 Forming a lower electrode 53 in electrical contact with the plug 51, sequentially forming a deformable portion 55 and an upper electrode 57 on the lower electrode 53; The sacrificial layer 45 is exposed to a predetermined portion from the electrode 57 to the membrane 47. And removing the locks to separate the actuators, and forming a protective film 59 on the surface of the upper electrode 57 and the surface of the actuator and adjacent the protective film 59 to a predetermined portion of the exposed driving substrate 41. Forming a bridge 61 to mechanically connect the protective film of the actuator; removing the sacrificial film 45; and removing the protective film 59 and the bridge 61; Method of manufacturing the device. 제1항에 있어서, 상기 변형부(55)를 BaTiO3, PZT 또는 PLZT의 압전세라믹으로 형성하는 광로조절장치의 제조방법.The method of claim 1, wherein the deformable portion (55) is formed of piezoelectric ceramics of BaTiO 3 , PZT or PLZT. 제1항에 있어서, 상기 변형부(55)을 PMN의 전왜세라믹으로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 1, wherein the deformation part (55) is formed of a total distortion ceramic of PMN. 제2항 또는 제3항에 있어서, 상기 변형부(55)를 회전도포법, 분사법 또는 화학기상침적법으로 형성하는 광로조절장치의 제조방법.The method according to claim 2 or 3, wherein the deformable portion (55) is formed by a rotary coating method, a spraying method or a chemical vapor deposition method. 제4항에 있어서, 상기 변형부(55)를 1~2㎛의 두께로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 4, wherein the deformation part (55) is formed to a thickness of 1 to 2 mu m. 제1항에 있어서, 상기 보호막(59) 및 브리지(61)를 포토레지스트로 형성하는 광로조절장치의 제조방법.The method of manufacturing an optical path control device according to claim 1, wherein the protective film (59) and the bridge (61) are formed of photoresist. 제1항에 있어서, 상기 희생막(45)을 습식식각 방법으로 제거하는 광로조절장치의 제조방법.The method of claim 1, wherein the sacrificial layer is removed by a wet etching method. 제1항에 있어서, 상기 희생막(45) 제거 후 세정 및 건조하는 공정을 더 구비하는 광로조절장치의 제조방법.The method of claim 1, further comprising: cleaning and drying the sacrificial layer after removing the sacrificial layer (45). 제1항에 있어서, 상기 보호막(59) 및 브리지(61)를 태우거나 또는 플라즈마를 이용하는 건식식각 방법으로제거하는 광로조절장치의 제조방법.The method of claim 1, wherein the passivation layer (59) and the bridge (61) are burned or removed by a dry etching method using plasma. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950013352A 1995-05-26 1995-05-26 Method for fabricating optical projection system KR0159393B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019950013352A KR0159393B1 (en) 1995-05-26 1995-05-26 Method for fabricating optical projection system
US08/639,575 US5637517A (en) 1995-05-26 1996-04-29 Method for forming array of thin film actuated mirrors
CN96105153A CN1160220A (en) 1995-05-26 1996-05-09 Method for forming array of thin film actuated mirrors
JP8116130A JPH08327881A (en) 1995-05-26 1996-05-10 Manufacture of thin-film actuated mirror array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950013352A KR0159393B1 (en) 1995-05-26 1995-05-26 Method for fabricating optical projection system

Publications (2)

Publication Number Publication Date
KR960043844A true KR960043844A (en) 1996-12-23
KR0159393B1 KR0159393B1 (en) 1999-01-15

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100456771B1 (en) * 2002-02-04 2004-11-12 주식회사 엠에스솔루션 Piezoelectric switching device for high frequency

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