KR960042995A - Scrubber Washer - Google Patents
Scrubber WasherInfo
- Publication number
- KR960042995A KR960042995A KR1019960039938A KR19950039938A KR960042995A KR 960042995 A KR960042995 A KR 960042995A KR 1019960039938 A KR1019960039938 A KR 1019960039938A KR 19950039938 A KR19950039938 A KR 19950039938A KR 960042995 A KR960042995 A KR 960042995A
- Authority
- KR
- South Korea
- Prior art keywords
- brush
- arm
- motor
- attached
- holding frame
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
Abstract
스크래버세정장치에 있어서, 브러쉬를 자동적으로 교환한다.In the scrubber cleaning device, the brush is changed automatically.
브러쉬(5)를 선단에 착탈자재하게 부착한 아암(1)과, 모우터(3)에 의해 요동가능하게 설치함과 아울러, 유압실린더(7)에 의해 상하동할 수 있도록 한다. 상기 모우터(3)에 의해 아암(1)은 세정위치로 움직여지고, 그 위치에서 모우터(3)에 의새 상기 브러쉬(5)를 회전시켜서 웨이퍼를 스크래퍼 세정한다. 상기 모우터(3)에 의해 아암(1)을 세정위치로부터 후퇴한 위치에 이동한다. 이 후퇴위치에는 복수의 브러쉬(5)가 브러쉬 보전지지틀(25)에 지지되어서 대기하고 있다.The arm 1 which detachably attaches the brush 5 to the front-end | tip and the motor 3 are installed so that it can be swung, and can be moved up and down by the hydraulic cylinder 7. As shown in FIG. The arm 1 is moved to the cleaning position by the motor 3, and the brush 5 is rotated by the motor 3 at the position to clean the wafer. The arm 3 is moved to the position where the arm 1 has retreated from the cleaning position. At this retreat position, a plurality of brushes 5 are supported by the brush holding frame 25 and are waiting.
상기한 아암(1)에 부착한 브러쉬(5)는 보전지지를(25)의 보전지지홈(27)에 끼워져서 아암(1)에서 벗어난다.The brush 5 attached to the arm 1 is inserted into the holding groove 27 of the holding paper 25 and is out of the arm 1.
이 아암(1)에는 상기 보전지지틀에 지지되어 있는 별개의 브러쉬가 부착된다. 이와 같은 동작은 상기 모우터(3) 및 유체실린더(7)의 조작에 의하여 자동적으로 행해진다.The arm 1 is attached with a separate brush supported by the holding frame. This operation is automatically performed by the operation of the motor 3 and the fluid cylinder 7.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명의 일실시예를 표시하는 사시도, 제2도는 본 발명의 구성을 표시하는 설명도.1 is a perspective view showing an embodiment of the present invention, Figure 2 is an explanatory view showing the configuration of the present invention.
Claims (2)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7151178A JPH08318226A (en) | 1995-05-26 | 1995-05-26 | Scrubber cleaning device |
JP95-151178 | 1995-05-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960042995A true KR960042995A (en) | 1996-12-21 |
KR100221572B1 KR100221572B1 (en) | 1999-09-15 |
Family
ID=15513011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950039938A KR100221572B1 (en) | 1995-05-26 | 1995-11-06 | A brush scrubber |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH08318226A (en) |
KR (1) | KR100221572B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100372896B1 (en) * | 2000-06-14 | 2003-02-19 | (주)케이.씨.텍 | Apparatus For Cleaning A Substrate |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3764228B2 (en) * | 1996-12-17 | 2006-04-05 | 芝浦メカトロニクス株式会社 | Brush cleaning device |
JP3578193B2 (en) * | 1997-02-07 | 2004-10-20 | 大日本スクリーン製造株式会社 | Substrate cleaning equipment |
JP3630524B2 (en) * | 1997-05-08 | 2005-03-16 | 大日本スクリーン製造株式会社 | Substrate cleaning device |
US5966766A (en) * | 1997-10-06 | 1999-10-19 | Advanced Micro Devices, Inc. | Apparatus and method for cleaning semiconductor wafer |
JPH11285671A (en) * | 1998-04-03 | 1999-10-19 | Tokyo Electron Ltd | Treating device and treating method |
KR20130039882A (en) * | 2011-10-13 | 2013-04-23 | 세메스 주식회사 | Apparatus for cleaning substrate |
KR101351412B1 (en) * | 2013-04-12 | 2014-01-23 | 주식회사 로그테크놀러지 | The combination method of disc brush for cleaning the glass and wapor and thereof device |
KR101467369B1 (en) * | 2013-10-04 | 2014-12-10 | 주식회사 로그테크놀러지 | The combination method of disc brush for cleaning the glass and wapor and thereof device |
JP6509652B2 (en) * | 2015-07-02 | 2019-05-08 | 株式会社ディスコ | Cleaning device |
CN108885985B (en) * | 2016-03-22 | 2023-07-07 | 东京毅力科创株式会社 | Substrate cleaning device |
JP2018049926A (en) * | 2016-09-21 | 2018-03-29 | 株式会社Screenホールディングス | Brush storage container, brush storage container storing cleansing brush, and substrate processing apparatus |
-
1995
- 1995-05-26 JP JP7151178A patent/JPH08318226A/en active Pending
- 1995-11-06 KR KR1019950039938A patent/KR100221572B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100372896B1 (en) * | 2000-06-14 | 2003-02-19 | (주)케이.씨.텍 | Apparatus For Cleaning A Substrate |
Also Published As
Publication number | Publication date |
---|---|
KR100221572B1 (en) | 1999-09-15 |
JPH08318226A (en) | 1996-12-03 |
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Legal Events
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E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20051118 Year of fee payment: 8 |
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LAPS | Lapse due to unpaid annual fee |