KR960039170A - 에어밸브 구동시스템 - Google Patents

에어밸브 구동시스템 Download PDF

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Publication number
KR960039170A
KR960039170A KR1019950009797A KR19950009797A KR960039170A KR 960039170 A KR960039170 A KR 960039170A KR 1019950009797 A KR1019950009797 A KR 1019950009797A KR 19950009797 A KR19950009797 A KR 19950009797A KR 960039170 A KR960039170 A KR 960039170A
Authority
KR
South Korea
Prior art keywords
air
valve
solenoid valve
system controller
control
Prior art date
Application number
KR1019950009797A
Other languages
English (en)
Other versions
KR0147634B1 (ko
Inventor
강정호
이광열
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950009797A priority Critical patent/KR0147634B1/ko
Publication of KR960039170A publication Critical patent/KR960039170A/ko
Application granted granted Critical
Publication of KR0147634B1 publication Critical patent/KR0147634B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F7/00—Ventilation
    • F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
    • F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
    • F24F7/08—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit with separate ducts for supplied and exhausted air with provisions for reversal of the input and output systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Indication Of The Valve Opening Or Closing Status (AREA)
  • Magnetically Actuated Valves (AREA)

Abstract

반도체 제조장비의 순환 배관 시스템에 있어서, 에어 동작 밸브(Air Operated Valve)의 오픈/클로우즈(open/close) 상태를 전기적으로 감지할 수 있는 에어동작밸브의 구동시스템을 개시한다. 본 발명은 시스템 컨트롤러의 제어신호에 의해 구동되는 솔레노이드 밸브, 상기 솔레노이드 밸브에 접속되어 솔레노이드 밸브의 구동상태에 따라 공기의 흐름을 제어하는 에어포트, 상기 에어포트의 에어라인에 접속되고 유입되는 공기의 공기압에 의해 구동되어 유체의 흐름을 제어하는 에어동작밸브, 및 상기 에어동작밸브의 열림/닫힘 상태를 감지하여 상기 시스템 컨트롤러에 에어밸브의 구동상태를 알려주기 위한 감지수단을 포함하여, 에어밸브의 오동작 및 불량에 신속히 대처함과 아룰러 이상 발생시 관련 장비들의 손상을 방지할 수 있다.

Description

에어밸브 구동시스템
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 본 발명에 의한 에어동작밸브의 구동시스템을 개략적으로 도시한 단면이다.

Claims (3)

  1. 시스템 컨트롤러의 제어신호에 따라 구동되는 솔레노이드 밸브; 상기 솔레노이드 밸브에 접속되어 솔레노이드 밸브의 구동상태에 따라 공기의 흐름을 제어하는 에어포트; 상기 에어포트의 에어라인에 접속되고 유입되는 공기의 공기압에 의해 구동되어 유체의 흐름을 제어하는 에어동작밸브(air operated valve); 및 상기 에어동작밸브의 열림/닫힘 상태를 감지하여 상기 시스템 컨트롤러에 에어밸브의 구동상태를 알려주기 위한 감지수단을 포함하는 것을 특징으로 하는 에어밸브 구동시스템.
  2. 제1항에 있어서, 상기 감지수단은 노말 클로우즈형(normal close type)의 에어밸브인 경우, 리미트(limit)스위치로 이루어진 것을 특징으로 하는 에어밸브 구동시스템.
  3. 제1항에 있어서, 상기 시스템 컨트롤러에 상기 에어밸브의 오동작시 구동되는 경보수단을 부가한 것을 특징으로 하는 에어밸브 구동시스템.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950009797A 1995-04-25 1995-04-25 에어밸브 구동시스템 KR0147634B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950009797A KR0147634B1 (ko) 1995-04-25 1995-04-25 에어밸브 구동시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950009797A KR0147634B1 (ko) 1995-04-25 1995-04-25 에어밸브 구동시스템

Publications (2)

Publication Number Publication Date
KR960039170A true KR960039170A (ko) 1996-11-21
KR0147634B1 KR0147634B1 (ko) 1998-11-02

Family

ID=19412911

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950009797A KR0147634B1 (ko) 1995-04-25 1995-04-25 에어밸브 구동시스템

Country Status (1)

Country Link
KR (1) KR0147634B1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100474984B1 (ko) * 1997-05-31 2005-04-14 삼성전자주식회사 반도체소자제조장치
KR100498434B1 (ko) * 1998-08-31 2005-09-26 삼성전자주식회사 안전성이 향상된 반도체 제조공정의 공기압 구동용 검사설비 및조립설비

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100400034B1 (ko) * 2001-02-10 2003-09-29 삼성전자주식회사 반도체 제조장치에서의 에어밸브 시스템
US8012366B2 (en) 2006-10-30 2011-09-06 Applied Materials, Inc. Process for etching a transparent workpiece including backside endpoint detection steps
US8017029B2 (en) 2006-10-30 2011-09-13 Applied Materials, Inc. Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
US7967930B2 (en) 2006-10-30 2011-06-28 Applied Materials, Inc. Plasma reactor for processing a workpiece and having a tunable cathode
US9218944B2 (en) 2006-10-30 2015-12-22 Applied Materials, Inc. Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
US7976671B2 (en) * 2006-10-30 2011-07-12 Applied Materials, Inc. Mask etch plasma reactor with variable process gas distribution
US8002946B2 (en) 2006-10-30 2011-08-23 Applied Materials, Inc. Mask etch plasma reactor with cathode providing a uniform distribution of etch rate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100474984B1 (ko) * 1997-05-31 2005-04-14 삼성전자주식회사 반도체소자제조장치
KR100498434B1 (ko) * 1998-08-31 2005-09-26 삼성전자주식회사 안전성이 향상된 반도체 제조공정의 공기압 구동용 검사설비 및조립설비

Also Published As

Publication number Publication date
KR0147634B1 (ko) 1998-11-02

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