KR960035600U - Wafer cleaning tank - Google Patents

Wafer cleaning tank

Info

Publication number
KR960035600U
KR960035600U KR2019950007499U KR19950007499U KR960035600U KR 960035600 U KR960035600 U KR 960035600U KR 2019950007499 U KR2019950007499 U KR 2019950007499U KR 19950007499 U KR19950007499 U KR 19950007499U KR 960035600 U KR960035600 U KR 960035600U
Authority
KR
South Korea
Prior art keywords
cleaning tank
wafer cleaning
wafer
tank
cleaning
Prior art date
Application number
KR2019950007499U
Other languages
Korean (ko)
Other versions
KR0139532Y1 (en
Inventor
김두호
최기태
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950007499U priority Critical patent/KR0139532Y1/en
Publication of KR960035600U publication Critical patent/KR960035600U/en
Application granted granted Critical
Publication of KR0139532Y1 publication Critical patent/KR0139532Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019950007499U 1995-04-14 1995-04-14 Cleaning bath for semiconductor process KR0139532Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950007499U KR0139532Y1 (en) 1995-04-14 1995-04-14 Cleaning bath for semiconductor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950007499U KR0139532Y1 (en) 1995-04-14 1995-04-14 Cleaning bath for semiconductor process

Publications (2)

Publication Number Publication Date
KR960035600U true KR960035600U (en) 1996-11-21
KR0139532Y1 KR0139532Y1 (en) 1999-04-15

Family

ID=19411280

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950007499U KR0139532Y1 (en) 1995-04-14 1995-04-14 Cleaning bath for semiconductor process

Country Status (1)

Country Link
KR (1) KR0139532Y1 (en)

Also Published As

Publication number Publication date
KR0139532Y1 (en) 1999-04-15

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20041119

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee