KR960019100U - Wafer cleaning tank - Google Patents

Wafer cleaning tank

Info

Publication number
KR960019100U
KR960019100U KR2019940028883U KR19940028883U KR960019100U KR 960019100 U KR960019100 U KR 960019100U KR 2019940028883 U KR2019940028883 U KR 2019940028883U KR 19940028883 U KR19940028883 U KR 19940028883U KR 960019100 U KR960019100 U KR 960019100U
Authority
KR
South Korea
Prior art keywords
cleaning tank
wafer cleaning
wafer
tank
cleaning
Prior art date
Application number
KR2019940028883U
Other languages
Korean (ko)
Other versions
KR0124716Y1 (en
Inventor
홍경호
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940028883U priority Critical patent/KR0124716Y1/en
Publication of KR960019100U publication Critical patent/KR960019100U/en
Application granted granted Critical
Publication of KR0124716Y1 publication Critical patent/KR0124716Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940028883U 1994-11-01 1994-11-01 Cleaning bath of semiconductor wafer KR0124716Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940028883U KR0124716Y1 (en) 1994-11-01 1994-11-01 Cleaning bath of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940028883U KR0124716Y1 (en) 1994-11-01 1994-11-01 Cleaning bath of semiconductor wafer

Publications (2)

Publication Number Publication Date
KR960019100U true KR960019100U (en) 1996-06-19
KR0124716Y1 KR0124716Y1 (en) 1999-02-18

Family

ID=19397101

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940028883U KR0124716Y1 (en) 1994-11-01 1994-11-01 Cleaning bath of semiconductor wafer

Country Status (1)

Country Link
KR (1) KR0124716Y1 (en)

Also Published As

Publication number Publication date
KR0124716Y1 (en) 1999-02-18

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040331

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee