KR960026514A - Stage focus and leveling device and method - Google Patents

Stage focus and leveling device and method Download PDF

Info

Publication number
KR960026514A
KR960026514A KR1019940035341A KR19940035341A KR960026514A KR 960026514 A KR960026514 A KR 960026514A KR 1019940035341 A KR1019940035341 A KR 1019940035341A KR 19940035341 A KR19940035341 A KR 19940035341A KR 960026514 A KR960026514 A KR 960026514A
Authority
KR
South Korea
Prior art keywords
stage
light
image pickup
horizontal
signal
Prior art date
Application number
KR1019940035341A
Other languages
Korean (ko)
Other versions
KR100254253B1 (en
Inventor
김성욱
Original Assignee
이대원
삼성항공산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이대원, 삼성항공산업 주식회사 filed Critical 이대원
Priority to KR1019940035341A priority Critical patent/KR100254253B1/en
Publication of KR960026514A publication Critical patent/KR960026514A/en
Application granted granted Critical
Publication of KR100254253B1 publication Critical patent/KR100254253B1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026Focusing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034Leveling

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)

Abstract

공정 대상물인 웨이퍼등을 지지하는 스테이지 수평 및 초점 조정장치 및 방법이 개시되어 있다.Disclosed is a stage horizontal and focus adjusting apparatus and method for supporting a wafer or the like as a process target.

이 개시된 스테이지 수평 및 초점 조정은 스테이지를 구동하는 액츄에이터를 스테이지의 세부분에 독립적으로 구비하고, 스테이지의 상면에 광을 조사하여 반사된 광을 수광한후, 기준위치에 대한 오차 정도를 수평 조정단계와 초점 조정단계를걸친후 상기 액츄에이터를 구동함으로 가능하다. 스테이지의 상면에서 반사된 광을 수광하는 수광소자로 선형 촬상소자를 구비하였다. 이 소자는 기준위치에 대한 입사광의 변위를 정확히 감지한다. 또한, 스테이지의 세부분을 지지하는 액츄에이터를 독립적으로 구동하기 위하여 광원과 선형 촬상소자를 세개씩 구비하였으며, 선형 활상소자 각각에 수광되는 신호의 편차를 비교하여 수평 및 초점 정도를 조정할 수 있다.The disclosed stage horizontal and focus adjustment includes an actuator for driving the stage independently of the details of the stage, irradiates light onto the upper surface of the stage to receive the reflected light, and then adjusts the level of error with respect to the reference position. This is possible by driving the actuator after the focus adjustment step has been performed. A linear image pickup device was provided as a light receiving device that receives light reflected from the upper surface of the stage. This device accurately detects the displacement of incident light with respect to the reference position. In addition, three independent light sources and three linear image pickup devices are provided to independently drive the actuators supporting the subdivisions of the stage, and the horizontal and the focusing degree can be adjusted by comparing deviations of signals received by the linear active devices.

Description

스테이지 초점 및 수평 조정장치 및 방법Stage focus and leveling device and method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제4도는 본 발명에 따른 스테이지 수평 및 초점 조정장치를 나타낸 개략적인 사시도.4 is a schematic perspective view showing a stage horizontal and focus adjusting apparatus according to the present invention.

Claims (9)

광을 생성하여 스테이지로 조사하는 세개의 광원과, 이 각각의 광원에서 출사된 광중 특정편광의 광만이스테이지로 향하도록 각각의 광축상에 위치한 슬릿과, 상기 슬릿을 통과한후 상기 스테이지의 적어도 세점에서 반사된 광을 수광하는 적어도 세개의 선형 촬상소자와, 이 각각의 촬상소자에서 수광된 신호로부터 초점 및 수평오차를 검출하는오차검출수단과, 이 오차검출수단에 의해 검출된 신호로부터 스테이지를 구동하는 액츄에이터를 구비한 것을 특징으로 하는 스테이지 수평 및 초점 조정장지.Three light sources that generate light and irradiate it to the stage, slits positioned on each optical axis such that only light of a specific polarization of light emitted from each light source is directed to the stage, and at least three points of the stage after passing through the slit At least three linear image pickup elements for receiving the light reflected from the image pickup unit, error detection means for detecting focus and horizontal error from the signals received at the respective image pickup elements, and driving the stage from the signals detected by the error detection unit. The stage horizontal and focus adjustment device characterized in that it comprises an actuator to. 제1항에 있어서, 상기 각각의 광원과 스테이지 사이의 광경로 상에 상기 광원에서 출사된 광을 평행광으로바꾸어 주거나 집속광으로 바꾸어 주는 렌즈를 구비한 것을 특징으로 하는 스테이지의 수평 및 초점 조정장치.The horizontal and focus adjusting apparatus of claim 1, further comprising a lens for converting the light emitted from the light source into parallel light or converting the focused light into a focused light on an optical path between each light source and the stage. . 제1항에 있어서, 상기 액츄에이터는 상기 각각의 선형 촬상소자에 의한 신호로 부터 독립적으로 구동되도록 상기 스테이지의 다른 부분에 적어도 세개 구비된 것을 특징으로 하는 스테이지 수평 및 초점 조정장치.The stage horizontal and focus adjusting apparatus of claim 1, wherein at least three actuators are provided at different portions of the stage to be driven independently from signals by the respective linear image pickup devices. 광을 생성하여 스테이지의 세개의 점에 조사하는 단계와, 상기 스테이지에서 반사되는 광들을 각각의 선형촬상소자를 통하여 수광하는 수광단계와, 상기 선형 촬상소자에서 수광된 광으로 부터 수평 및 초점오차를 검출하는 오차검출단계와, 이 오차검출단계에 의해 검출된 신호로 부터 스테이지를 구동하는 구동단계로 이루어진 것을 특징으로 하는스테이지 초점 및 수평 조정방법.Generating light and irradiating three points of the stage; receiving light reflected from the stage through each linear image pickup device; and adjusting horizontal and focus errors from the light received from the linear image pickup device. And an error detecting step of detecting, and a driving step of driving a stage from the signal detected by the error detecting step. 제4항에 있어서, 상기 초점오차 검출하는 단계는 상기 세개의 선형 촬상소자중 어느 하나의 선형 촬상소자에서 검출된 신호로부터 스테이지의 높이를 측정하는 제1단계와, 이 제1단계에서 측정된 높이와 기준위치를 비교하여 그차를 계산하는 제2단계와, 상기 제2단계에서 계산된 값이 허용오차 범위내에 포함되는지를 판단하는 제3단계와, 상기 제3단계에서 허용오차 범위를 벗어나는 경우로 판단된 경우 상기 액츄에이터의 각 부분의 이동량을 계산하고 이동신호를 전달하는 제4단계로 이루어지고, 상기 제4단계를 완료후 제1단계로 피드백하여 상기 제2단계에서 계산된 신호가 상기 제3단계에서 허용오차 범위내에 포함되도록 반복하는 루프를 가지는 것을 특징으로 하는 스테이지 초점 및 수평 조정방법.The method of claim 4, wherein the detecting of the focus error comprises a first step of measuring a height of a stage from a signal detected by one of the three linear image pickup devices, and the height measured in the first step. A second step of calculating the difference by comparing the reference position with a reference position, a third step of determining whether the value calculated in the second step is within the tolerance range, and a case out of the tolerance range in the third step. If it is determined, the fourth step of calculating the movement amount of each part of the actuator and transmitting the movement signal is completed, the fourth step is completed and fed back to the first step so that the signal calculated in the second step is the third step. And a loop that repeats to fall within the tolerance range in the step. 제5항에 있어서, 상기 선형 촬상소자에 상기 제1단계에서 신호가 검출되지 않는 경우 그 상황을 분석하는프로그램으로 신호가 전달되도록 판별하는 단계를 상기 제1단계와 상기 제2단계 사이에 더 구비한 것을 특징으로 하는 스테이지 수평 및 초점 조정방법.6. The method of claim 5, further comprising determining between the first step and the second step that the linear image pickup device transmits a signal to a program for analyzing a situation when a signal is not detected in the first step. Stage horizontal and focus adjustment method characterized in that. 제4항에 있어서, 상기 오차검출 단계는 상기 세개의 선형 촬상소자로 상기 스테이지의 세부분 각각의 높이를 측정하는 제1단계와, 제1단계에서 측정된 높이와 기준위치와의 위치차를 계산하는 제2단계와, 상기 제2단계에서 계산된 위치차가 허용오차범위 내인지의 여부를 판단하는 제3단계와, 상기 제3단계에서 허용오차 범위를 벗어나는 경우로 판단된 경우 상기 액츄에이터의 각 부분의 이동량을 계산하고 이동신호를 전달하는 제4단계로 이루어지고, 상기 제4단계를완료후 제1단계로 피드백하여 상기 제2단계에서 계산된 신호가 상기 제3단계에서 허용오차 범위내에 포함되도록 반복하는 루프를 가지는 것을 특징으로 하는 수평 및 초점 조정방법.5. The method of claim 4, wherein the error detecting step comprises: a first step of measuring the height of each part of the stage with the three linear image pickup devices, and calculating a position difference between the height measured in the first step and the reference position; And a third step of determining whether or not the position difference calculated in the second step is within a tolerance range, and each part of the actuator when it is determined that it is out of the tolerance range in the third step. Comprising a fourth step of calculating the amount of movement and transfer the movement signal, the fourth step is fed back to the first step after completion of the fourth step so that the signal calculated in the second step is included within the tolerance range in the third step Horizontal and focus adjustment method characterized by having a repeating loop. 제7항에 있어서, 상기 선형 촬상소자에 상기 제1단계에서 신호가 검출되지 않는 경우 그 상황을 분석하는 프로그램으로 신호가 전달되도록 판별하는 단계를 상기 제1단계와 상기 제2단계 사이에 더 구비한 것을 특징으로 하는 스테이지 수평 및 초점 조정방법.The method of claim 7, further comprising determining between the first step and the second step that the linear image pickup device transmits a signal to a program for analyzing the situation when a signal is not detected in the first step. Stage horizontal and focus adjustment method characterized in that. 제4항에 있어서, 상기 수평 오차검출 단계와, 상기 초점 오차검출 단계가 독립적으로 수행되는 것을 특징으로 하는 스테이지 수평 및 초점 조정방법.5. The method as claimed in claim 4, wherein the horizontal error detection step and the focus error detection step are performed independently. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940035341A 1994-12-20 1994-12-20 Control device of stage focus and level of water and the method thereof KR100254253B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940035341A KR100254253B1 (en) 1994-12-20 1994-12-20 Control device of stage focus and level of water and the method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940035341A KR100254253B1 (en) 1994-12-20 1994-12-20 Control device of stage focus and level of water and the method thereof

Publications (2)

Publication Number Publication Date
KR960026514A true KR960026514A (en) 1996-07-22
KR100254253B1 KR100254253B1 (en) 2000-05-01

Family

ID=19402441

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940035341A KR100254253B1 (en) 1994-12-20 1994-12-20 Control device of stage focus and level of water and the method thereof

Country Status (1)

Country Link
KR (1) KR100254253B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104749901B (en) 2013-12-31 2017-08-29 上海微电子装备有限公司 A kind of focusing leveling device

Also Published As

Publication number Publication date
KR100254253B1 (en) 2000-05-01

Similar Documents

Publication Publication Date Title
US4650983A (en) Focusing apparatus for projection optical system
US4999510A (en) Apparatus for detecting foreign particles on a surface of a reticle or pellicle
JP2523227Y2 (en) Foreign matter inspection device
KR20170030100A (en) Laser processing apparatus and laser processing method
KR102144567B1 (en) Scan reflection mirror monitoring system and method, focusing and leveling system
KR100490685B1 (en) Surface height measuring device and exposure device using it
KR960009024A (en) Auto Focus and Auto Leveling Device and Control Method in Exposure Equipment
KR19980063666A (en) Auto focusing method and device
JP2006317428A (en) Face position detector
JPH0381082A (en) Method and apparatus for controlling diameter of laser beam
KR960026514A (en) Stage focus and leveling device and method
KR960035741A (en) Scanning electron microscope
JP2569563B2 (en) Projection exposure equipment
CN110095944A (en) A kind of focus adjustment method of focus control, litho machine and focus control
JPH09201689A (en) Focal position detector and laser beam machine using such a device
CN102346384A (en) Method for regulating optimum focal plane for silicon chip and exposure device thereof
KR20050063094A (en) Apparatus for focusing laser beam automatically
JPH07190735A (en) Optical measuring device and its measuring method
JPH08193810A (en) Device for measuring displacement
JP3243784B2 (en) Work table positioning device
JP2861671B2 (en) Overlay accuracy measuring device
KR100854222B1 (en) Exposure apparatus
KR100649719B1 (en) Apparatus of Focusing Adjustment for Exposer
JP4419427B2 (en) Method for controlling focal position of reticle inspection apparatus
KR960026095A (en) Reticle slope compensation method and apparatus for semiconductor exposure equipment

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee