KR960024675A - 광경화성 조성물 - Google Patents
광경화성 조성물 Download PDFInfo
- Publication number
- KR960024675A KR960024675A KR1019940036793A KR19940036793A KR960024675A KR 960024675 A KR960024675 A KR 960024675A KR 1019940036793 A KR1019940036793 A KR 1019940036793A KR 19940036793 A KR19940036793 A KR 19940036793A KR 960024675 A KR960024675 A KR 960024675A
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- KR
- South Korea
- Prior art keywords
- photocurable composition
- compound
- weight
- composition according
- polymer binder
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/08—Homopolymers or copolymers of acrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Polymerisation Methods In General (AREA)
Abstract
본 발명은 광중합성 다관능성 단량체, 광중합 개시제, 고분자 결합제 및 첨가제를 함유하는 광경화성 조성물에 있어서, 상기 고분자 결합제가 무수말레익산의 아민유도체와 아크릴유도체로 이루어져 있는 것을 특징으로 하는, 동밀착력이 우수하고 내약품성과 텐팅성이 향상된 코팅재료, 포토레지스트 등으로 유용한 광경화성 조성물에 관한 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 광중합성 다관능성 단량체, 광중합 개시제, 고분자 결합제 및 첨가제를 함유하는 광경화성 조성물에 있어서, 상기 고분자 결합제가 다음 구조식 (I)로 표시되는 화합물 10~40중량%와 다음 구조식(II)로 표시되는 화합물 60~90중량%로 이루어지는 것을 특징으로 하는 광경화성 조성물.(I)(II)상기식에서 R1은 -(CH2)-CH3또는 -(CH2)m--R2(ℓ=3~12, m=0~3, R2=H, CH3또는 C2H5) R3는 H, CH3R4는 H, -(CH2)n-CH3-CH2CH(C2H5)CH2CH|2CH2CH3, 또는 -CH2CH2O(n=0~11)이다.
- 제1항에 있어서, 상기 구조식(Ⅱ) 화합물은 2종 이상을 조합한 것임을 특징으로 하는 광경화성 조성물.
- 제1항 또는 제2항에 있어서, 상기 구조식(Ⅱ) 화합물은 아크릴산 및/또는 메타크릴산을 포함하는 것을 특징으로 하는 광경화성 조성물.
- 제3항에 있어서, 상기 구조식(Ⅱ) 화합물 중 아크릴산 및/또는 메타크릴산을 고분자 결합제 함량 대비 10~35중량% 포함하는 것을 특징으로 하는 광경화성 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940036793A KR100191085B1 (ko) | 1994-12-26 | 1994-12-26 | 광경화성 조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940036793A KR100191085B1 (ko) | 1994-12-26 | 1994-12-26 | 광경화성 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960024675A true KR960024675A (ko) | 1996-07-20 |
KR100191085B1 KR100191085B1 (ko) | 1999-06-15 |
Family
ID=19403511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940036793A KR100191085B1 (ko) | 1994-12-26 | 1994-12-26 | 광경화성 조성물 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100191085B1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980049928A (ko) * | 1996-12-20 | 1998-09-15 | 구광시 | 광경화성 수지 조성물 |
TWI423307B (zh) | 2010-11-05 | 2014-01-11 | Far Eastern New Century Corp | 製造微結構的方法 |
US8828650B2 (en) | 2011-09-13 | 2014-09-09 | Far Eastern New Century Corporation | Method for making a retarder |
-
1994
- 1994-12-26 KR KR1019940036793A patent/KR100191085B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100191085B1 (ko) | 1999-06-15 |
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