KR960019107U - 다중챔버 - Google Patents

다중챔버

Info

Publication number
KR960019107U
KR960019107U KR2019940030805U KR19940030805U KR960019107U KR 960019107 U KR960019107 U KR 960019107U KR 2019940030805 U KR2019940030805 U KR 2019940030805U KR 19940030805 U KR19940030805 U KR 19940030805U KR 960019107 U KR960019107 U KR 960019107U
Authority
KR
South Korea
Prior art keywords
multiple chamber
chamber
Prior art date
Application number
KR2019940030805U
Other languages
English (en)
Other versions
KR200161482Y1 (ko
Inventor
홍성규
지수연
최철열
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940030805U priority Critical patent/KR200161482Y1/ko
Publication of KR960019107U publication Critical patent/KR960019107U/ko
Application granted granted Critical
Publication of KR200161482Y1 publication Critical patent/KR200161482Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
KR2019940030805U 1994-11-21 1994-11-21 다중챔버 KR200161482Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940030805U KR200161482Y1 (ko) 1994-11-21 1994-11-21 다중챔버

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940030805U KR200161482Y1 (ko) 1994-11-21 1994-11-21 다중챔버

Publications (2)

Publication Number Publication Date
KR960019107U true KR960019107U (ko) 1996-06-19
KR200161482Y1 KR200161482Y1 (ko) 1999-11-15

Family

ID=19398666

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940030805U KR200161482Y1 (ko) 1994-11-21 1994-11-21 다중챔버

Country Status (1)

Country Link
KR (1) KR200161482Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100846107B1 (ko) * 2007-02-13 2008-07-15 세메스 주식회사 다수의 가스 스틱을 구비하는 반도체 제조 설비

Also Published As

Publication number Publication date
KR200161482Y1 (ko) 1999-11-15

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Legal Events

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E701 Decision to grant or registration of patent right
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Payment date: 20080617

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