KR960015707A - - Google Patents

Info

Publication number
KR960015707A
KR960015707A KR19950035952A KR19950035952A KR960015707A KR 960015707 A KR960015707 A KR 960015707A KR 19950035952 A KR19950035952 A KR 19950035952A KR 19950035952 A KR19950035952 A KR 19950035952A KR 960015707 A KR960015707 A KR 960015707A
Authority
KR
South Korea
Application number
KR19950035952A
Other languages
Korean (ko)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960015707A publication Critical patent/KR960015707A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR19950035952A 1994-10-18 1995-10-18 KR960015707A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25224394A JP3613288B2 (ja) 1994-10-18 1994-10-18 露光装置用のクリーニング装置

Publications (1)

Publication Number Publication Date
KR960015707A true KR960015707A (ja) 1996-05-22

Family

ID=17234512

Family Applications (1)

Application Number Title Priority Date Filing Date
KR19950035952A KR960015707A (ja) 1994-10-18 1995-10-18

Country Status (2)

Country Link
JP (1) JP3613288B2 (ja)
KR (1) KR960015707A (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001319872A (ja) * 2000-03-01 2001-11-16 Nikon Corp 露光装置
KR101163435B1 (ko) 2003-04-09 2012-07-13 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101508809B1 (ko) 2003-04-11 2015-04-06 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
TWI424470B (zh) 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI412067B (zh) 2004-02-06 2013-10-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
EP2966670B1 (en) 2004-06-09 2017-02-22 Nikon Corporation Exposure apparatus and device manufacturing method
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP2006147776A (ja) * 2004-11-18 2006-06-08 Nikon Corp メンテナンス装置及びメンテナンス方法並びに露光装置
EP3232270A3 (en) 2005-05-12 2017-12-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP4835976B2 (ja) * 2006-01-31 2011-12-14 株式会社ニコン 保持装置及び露光装置
US7894037B2 (en) 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5104280B2 (ja) * 2007-12-17 2012-12-19 株式会社ニコン クリーニング装置、クリーニング方法、露光装置、露光方法及びデバイス製造方法
TWI417980B (zh) * 2009-02-04 2013-12-01 Hoya Corp 載台清潔器、描繪裝置及基板處理裝置
NL2004153A (en) 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
JP6313585B2 (ja) * 2013-12-10 2018-04-18 キヤノン株式会社 露光装置及び物品の製造方法
JP6942562B2 (ja) 2017-08-25 2021-09-29 キヤノン株式会社 リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
JP3613288B2 (ja) 2005-01-26
JPH08115868A (ja) 1996-05-07

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application