KR960011558A - Resist Material and Pattern Formation - Google Patents

Resist Material and Pattern Formation Download PDF

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Publication number
KR960011558A
KR960011558A KR1019950006581A KR19950006581A KR960011558A KR 960011558 A KR960011558 A KR 960011558A KR 1019950006581 A KR1019950006581 A KR 1019950006581A KR 19950006581 A KR19950006581 A KR 19950006581A KR 960011558 A KR960011558 A KR 960011558A
Authority
KR
South Korea
Prior art keywords
pattern formation
resist material
resist
pattern
formation
Prior art date
Application number
KR1019950006581A
Other languages
Korean (ko)
Other versions
KR100249255B1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of KR960011558A publication Critical patent/KR960011558A/en
Application granted granted Critical
Publication of KR100249255B1 publication Critical patent/KR100249255B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
KR1019950006581A 1994-09-02 1995-03-27 Resist material and pattern formation KR100249255B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23424694 1994-09-02
JP94-234246 1994-09-02

Publications (2)

Publication Number Publication Date
KR960011558A true KR960011558A (en) 1996-04-20
KR100249255B1 KR100249255B1 (en) 2000-06-01

Family

ID=16967972

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950006581A KR100249255B1 (en) 1994-09-02 1995-03-27 Resist material and pattern formation

Country Status (4)

Country Link
US (2) US5558971A (en)
EP (1) EP0704762B1 (en)
KR (1) KR100249255B1 (en)
DE (1) DE69513925T2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010050483A (en) * 1999-09-17 2001-06-15 카나가와 치히로 Resist Compositions and Patterning Process

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Also Published As

Publication number Publication date
EP0704762A1 (en) 1996-04-03
KR100249255B1 (en) 2000-06-01
EP0704762B1 (en) 1999-12-15
US5558976A (en) 1996-09-24
DE69513925T2 (en) 2000-06-08
DE69513925D1 (en) 2000-01-20
US5558971A (en) 1996-09-24

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