KR960005935A - Method for manufacturing field oxide film of semiconductor device - Google Patents
Method for manufacturing field oxide film of semiconductor device Download PDFInfo
- Publication number
- KR960005935A KR960005935A KR1019940016107A KR19940016107A KR960005935A KR 960005935 A KR960005935 A KR 960005935A KR 1019940016107 A KR1019940016107 A KR 1019940016107A KR 19940016107 A KR19940016107 A KR 19940016107A KR 960005935 A KR960005935 A KR 960005935A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide film
- field oxide
- semiconductor device
- manufacturing
- mask
- Prior art date
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- Local Oxidation Of Silicon (AREA)
Abstract
본 발명은 반도체 소자의 필드 산화막 제조방법에 관한 것으로, 필드 산화막의 가장자리 부분에 발생하는 버즈 비크(bird's beak)를 제거한 후 실리콘 기판상에 에피텍셜 단결정 실리콘을 소정두께 성장시켜 필드 산화막과 활성영역(active region)간의 단차를 최소화하면서 버즈 비크로 인한 활성영역의 감소를 방지할 수 있는 반도체 소자의 필드 산화막 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a field oxide film of a semiconductor device, wherein the epitaxial single crystal silicon is grown on a silicon substrate by removing a bird's beak generated at the edge of the field oxide film, thereby forming a field oxide film and an active region ( The present invention relates to a method of manufacturing a field oxide film of a semiconductor device capable of preventing a decrease in an active region due to a buzz bee while minimizing a step difference between active regions.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2D도는 본 발명에 의한 반도체 소자의 필드 산화막을 제조하는 단계를 도시한 소자의 단면도이다.2D is a cross-sectional view of the device, showing the steps of manufacturing a field oxide film of the semiconductor device according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940016107A KR960005935A (en) | 1994-07-06 | 1994-07-06 | Method for manufacturing field oxide film of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940016107A KR960005935A (en) | 1994-07-06 | 1994-07-06 | Method for manufacturing field oxide film of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960005935A true KR960005935A (en) | 1996-02-23 |
Family
ID=66689349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940016107A KR960005935A (en) | 1994-07-06 | 1994-07-06 | Method for manufacturing field oxide film of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960005935A (en) |
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1994
- 1994-07-06 KR KR1019940016107A patent/KR960005935A/en not_active Application Discontinuation
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