KR950025905A - How to make photo mask - Google Patents
How to make photo mask Download PDFInfo
- Publication number
- KR950025905A KR950025905A KR1019940002269A KR19940002269A KR950025905A KR 950025905 A KR950025905 A KR 950025905A KR 1019940002269 A KR1019940002269 A KR 1019940002269A KR 19940002269 A KR19940002269 A KR 19940002269A KR 950025905 A KR950025905 A KR 950025905A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- vernier
- present
- overlay
- photomask
- Prior art date
Links
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
본 발명은 반도체 소자 제조공정중 패턴 레이어 간의 멀티 레이아웃 체크가 가능토록 하는 포토마스크 제작방법에 관한 것으로, 패턴 상호간의 오버레이를 체크하고자 하는 모 버니어(100)를 형성하고, 상기 모 버니어(100)의 각 패턴 사이의 소정영역에 자 버니어(10,20,30,40)를 형성하는 것을 특징으로 함으로써 본 발명은 여러 개의 포토마스크 레이어 패턴간의 상호 오버레이를 쉽고 간단하게 체크 해낼 수 있었다. 따라서 소자 불량 분석에 많은 도움이 되며, 오정렬에 의한 소자 불량이 감소되는 효과를 얻을 수 있다.The present invention relates to a photomask fabrication method that enables a multi-layout check between pattern layers during a semiconductor device manufacturing process. The present invention provides a method of forming a parent vernier (100) for checking overlay of patterns. By forming the vernier (10, 20, 30, 40) in a predetermined region between each pattern, the present invention was able to easily and simply check the cross-overlay between a plurality of photomask layer patterns. Therefore, it is very helpful for device defect analysis, and it is possible to obtain an effect of reducing device defects due to misalignment.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도 및 제2도는 본 발명의 일실시예에 따른 분리용 포토마스크의 부분 단면도,1 and 2 are partial cross-sectional view of the separation photomask according to an embodiment of the present invention,
제3도는 제1도 및 제2도의 분리마스크가 중첩된 경우의 단면도.3 is a cross-sectional view when the separation masks of FIGS. 1 and 2 overlap.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940002269A KR950025905A (en) | 1994-02-07 | 1994-02-07 | How to make photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940002269A KR950025905A (en) | 1994-02-07 | 1994-02-07 | How to make photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950025905A true KR950025905A (en) | 1995-09-18 |
Family
ID=66663565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940002269A KR950025905A (en) | 1994-02-07 | 1994-02-07 | How to make photo mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950025905A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376889B1 (en) * | 1995-10-11 | 2003-06-11 | 주식회사 하이닉스반도체 | Overlay vernier structure and method for forming the same |
-
1994
- 1994-02-07 KR KR1019940002269A patent/KR950025905A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376889B1 (en) * | 1995-10-11 | 2003-06-11 | 주식회사 하이닉스반도체 | Overlay vernier structure and method for forming the same |
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WITN | Withdrawal due to no request for examination |