KR950025881U - 이비알(ebr)장치 - Google Patents
이비알(ebr)장치Info
- Publication number
- KR950025881U KR950025881U KR2019940003815U KR19940003815U KR950025881U KR 950025881 U KR950025881 U KR 950025881U KR 2019940003815 U KR2019940003815 U KR 2019940003815U KR 19940003815 U KR19940003815 U KR 19940003815U KR 950025881 U KR950025881 U KR 950025881U
- Authority
- KR
- South Korea
- Prior art keywords
- ebr
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
- G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94003815U KR0107478Y1 (en) | 1994-02-28 | 1994-02-28 | Ebr apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94003815U KR0107478Y1 (en) | 1994-02-28 | 1994-02-28 | Ebr apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950025881U true KR950025881U (ko) | 1995-09-18 |
KR0107478Y1 KR0107478Y1 (en) | 1997-09-30 |
Family
ID=19378064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR94003815U KR0107478Y1 (en) | 1994-02-28 | 1994-02-28 | Ebr apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0107478Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100447012B1 (ko) * | 1997-01-24 | 2004-11-06 | 동경 엘렉트론 주식회사 | 기판주변부의도포막제거방법및도포막제거장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100934820B1 (ko) * | 2007-06-29 | 2009-12-31 | 주식회사 하이닉스반도체 | 반도체 소자의 제조 장치 및 방법 |
-
1994
- 1994-02-28 KR KR94003815U patent/KR0107478Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100447012B1 (ko) * | 1997-01-24 | 2004-11-06 | 동경 엘렉트론 주식회사 | 기판주변부의도포막제거방법및도포막제거장치 |
Also Published As
Publication number | Publication date |
---|---|
KR0107478Y1 (en) | 1997-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20080619 Year of fee payment: 12 |
|
EXPY | Expiration of term |