KR950023950U - Operation control device of ion implanter - Google Patents

Operation control device of ion implanter

Info

Publication number
KR950023950U
KR950023950U KR2019940001386U KR19940001386U KR950023950U KR 950023950 U KR950023950 U KR 950023950U KR 2019940001386 U KR2019940001386 U KR 2019940001386U KR 19940001386 U KR19940001386 U KR 19940001386U KR 950023950 U KR950023950 U KR 950023950U
Authority
KR
South Korea
Prior art keywords
control device
operation control
ion implanter
implanter
ion
Prior art date
Application number
KR2019940001386U
Other languages
Korean (ko)
Other versions
KR0113516Y1 (en
Inventor
류하수
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019940001386U priority Critical patent/KR0113516Y1/en
Publication of KR950023950U publication Critical patent/KR950023950U/en
Application granted granted Critical
Publication of KR0113516Y1 publication Critical patent/KR0113516Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
KR2019940001386U 1994-01-25 1994-01-25 Controller of ion implanter KR0113516Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940001386U KR0113516Y1 (en) 1994-01-25 1994-01-25 Controller of ion implanter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940001386U KR0113516Y1 (en) 1994-01-25 1994-01-25 Controller of ion implanter

Publications (2)

Publication Number Publication Date
KR950023950U true KR950023950U (en) 1995-08-23
KR0113516Y1 KR0113516Y1 (en) 1998-04-15

Family

ID=19376269

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940001386U KR0113516Y1 (en) 1994-01-25 1994-01-25 Controller of ion implanter

Country Status (1)

Country Link
KR (1) KR0113516Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100392039B1 (en) * 1999-02-22 2003-07-22 가부시끼가이샤 도시바 Ion implantation method and ion implantation equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100392039B1 (en) * 1999-02-22 2003-07-22 가부시끼가이샤 도시바 Ion implantation method and ion implantation equipment

Also Published As

Publication number Publication date
KR0113516Y1 (en) 1998-04-15

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Legal Events

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