KR970056056U - Ion implanter - Google Patents

Ion implanter

Info

Publication number
KR970056056U
KR970056056U KR2019960005022U KR19960005022U KR970056056U KR 970056056 U KR970056056 U KR 970056056U KR 2019960005022 U KR2019960005022 U KR 2019960005022U KR 19960005022 U KR19960005022 U KR 19960005022U KR 970056056 U KR970056056 U KR 970056056U
Authority
KR
South Korea
Prior art keywords
ion implanter
implanter
ion
Prior art date
Application number
KR2019960005022U
Other languages
Korean (ko)
Other versions
KR0136231Y1 (en
Inventor
문중호
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960005022U priority Critical patent/KR0136231Y1/en
Publication of KR970056056U publication Critical patent/KR970056056U/en
Application granted granted Critical
Publication of KR0136231Y1 publication Critical patent/KR0136231Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
KR2019960005022U 1996-03-16 1996-03-16 An ion implanter KR0136231Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960005022U KR0136231Y1 (en) 1996-03-16 1996-03-16 An ion implanter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960005022U KR0136231Y1 (en) 1996-03-16 1996-03-16 An ion implanter

Publications (2)

Publication Number Publication Date
KR970056056U true KR970056056U (en) 1997-10-13
KR0136231Y1 KR0136231Y1 (en) 1999-03-20

Family

ID=19452025

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960005022U KR0136231Y1 (en) 1996-03-16 1996-03-16 An ion implanter

Country Status (1)

Country Link
KR (1) KR0136231Y1 (en)

Also Published As

Publication number Publication date
KR0136231Y1 (en) 1999-03-20

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