KR960009258U - Ion implantation equipment - Google Patents

Ion implantation equipment

Info

Publication number
KR960009258U
KR960009258U KR2019940020047U KR19940020047U KR960009258U KR 960009258 U KR960009258 U KR 960009258U KR 2019940020047 U KR2019940020047 U KR 2019940020047U KR 19940020047 U KR19940020047 U KR 19940020047U KR 960009258 U KR960009258 U KR 960009258U
Authority
KR
South Korea
Prior art keywords
ion implantation
implantation equipment
equipment
ion
implantation
Prior art date
Application number
KR2019940020047U
Other languages
Korean (ko)
Other versions
KR0114868Y1 (en
Inventor
나금주
신동선
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940020047U priority Critical patent/KR0114868Y1/en
Publication of KR960009258U publication Critical patent/KR960009258U/en
Application granted granted Critical
Publication of KR0114868Y1 publication Critical patent/KR0114868Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019940020047U 1994-08-09 1994-08-09 Ion implantation equipment KR0114868Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940020047U KR0114868Y1 (en) 1994-08-09 1994-08-09 Ion implantation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940020047U KR0114868Y1 (en) 1994-08-09 1994-08-09 Ion implantation equipment

Publications (2)

Publication Number Publication Date
KR960009258U true KR960009258U (en) 1996-03-16
KR0114868Y1 KR0114868Y1 (en) 1998-04-16

Family

ID=19390339

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940020047U KR0114868Y1 (en) 1994-08-09 1994-08-09 Ion implantation equipment

Country Status (1)

Country Link
KR (1) KR0114868Y1 (en)

Also Published As

Publication number Publication date
KR0114868Y1 (en) 1998-04-16

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20081125

Year of fee payment: 12

EXPY Expiration of term