KR940008660U - Ion implantation device - Google Patents

Ion implantation device

Info

Publication number
KR940008660U
KR940008660U KR2019920018083U KR920018083U KR940008660U KR 940008660 U KR940008660 U KR 940008660U KR 2019920018083 U KR2019920018083 U KR 2019920018083U KR 920018083 U KR920018083 U KR 920018083U KR 940008660 U KR940008660 U KR 940008660U
Authority
KR
South Korea
Prior art keywords
ion implantation
implantation device
ion
implantation
Prior art date
Application number
KR2019920018083U
Other languages
Korean (ko)
Other versions
KR950007252Y1 (en
Inventor
최기철
Original Assignee
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자 주식회사 filed Critical 삼성전자 주식회사
Priority to KR92018083U priority Critical patent/KR950007252Y1/en
Publication of KR940008660U publication Critical patent/KR940008660U/en
Application granted granted Critical
Publication of KR950007252Y1 publication Critical patent/KR950007252Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
KR92018083U 1992-09-23 1992-09-23 Ion injection apparatus KR950007252Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92018083U KR950007252Y1 (en) 1992-09-23 1992-09-23 Ion injection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92018083U KR950007252Y1 (en) 1992-09-23 1992-09-23 Ion injection apparatus

Publications (2)

Publication Number Publication Date
KR940008660U true KR940008660U (en) 1994-04-21
KR950007252Y1 KR950007252Y1 (en) 1995-09-04

Family

ID=19340518

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92018083U KR950007252Y1 (en) 1992-09-23 1992-09-23 Ion injection apparatus

Country Status (1)

Country Link
KR (1) KR950007252Y1 (en)

Also Published As

Publication number Publication date
KR950007252Y1 (en) 1995-09-04

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Year of fee payment: 7

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