KR950021392U - Wafer contamination prevention device for wet cleaning equipment - Google Patents

Wafer contamination prevention device for wet cleaning equipment

Info

Publication number
KR950021392U
KR950021392U KR2019930028828U KR930028828U KR950021392U KR 950021392 U KR950021392 U KR 950021392U KR 2019930028828 U KR2019930028828 U KR 2019930028828U KR 930028828 U KR930028828 U KR 930028828U KR 950021392 U KR950021392 U KR 950021392U
Authority
KR
South Korea
Prior art keywords
prevention device
cleaning equipment
wet cleaning
contamination prevention
wafer contamination
Prior art date
Application number
KR2019930028828U
Other languages
Korean (ko)
Other versions
KR200164527Y1 (en
Inventor
양두영
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019930028828U priority Critical patent/KR200164527Y1/en
Publication of KR950021392U publication Critical patent/KR950021392U/en
Application granted granted Critical
Publication of KR200164527Y1 publication Critical patent/KR200164527Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019930028828U 1993-12-21 1993-12-21 Wafer contamination preventing apparatus for wet treatment equipment KR200164527Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930028828U KR200164527Y1 (en) 1993-12-21 1993-12-21 Wafer contamination preventing apparatus for wet treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930028828U KR200164527Y1 (en) 1993-12-21 1993-12-21 Wafer contamination preventing apparatus for wet treatment equipment

Publications (2)

Publication Number Publication Date
KR950021392U true KR950021392U (en) 1995-07-28
KR200164527Y1 KR200164527Y1 (en) 2000-01-15

Family

ID=19371919

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930028828U KR200164527Y1 (en) 1993-12-21 1993-12-21 Wafer contamination preventing apparatus for wet treatment equipment

Country Status (1)

Country Link
KR (1) KR200164527Y1 (en)

Also Published As

Publication number Publication date
KR200164527Y1 (en) 2000-01-15

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070914

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee