KR950019934A - How to remove polymer and reduce step after metal etching - Google Patents
How to remove polymer and reduce step after metal etching Download PDFInfo
- Publication number
- KR950019934A KR950019934A KR1019930031859A KR930031859A KR950019934A KR 950019934 A KR950019934 A KR 950019934A KR 1019930031859 A KR1019930031859 A KR 1019930031859A KR 930031859 A KR930031859 A KR 930031859A KR 950019934 A KR950019934 A KR 950019934A
- Authority
- KR
- South Korea
- Prior art keywords
- metal
- silicon nitride
- oxide film
- etching
- low temperature
- Prior art date
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- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
본 발명은 반도체 소자제조 공정중, 하드 마스크(Hard mask)를 사용하여 메탈(Metal)식각시 발생하는 폴리머(Polymer)를 제거하고 단차를 줄이는 방법에 관한 것으로, 특히, 하드 마스크를 사용하고 단층 감광막 패턴을 형성하는 SLR(Single Layer Resist)공정으로 미세한 메탈 라인 식각시 발생하는 폴리머를 제거하고, 단차를 줄여 포토공정을 용이하게 하는 방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method of removing polymers and reducing steps generated during metal etching using a hard mask during a semiconductor device manufacturing process. The SLR (Single Layer Resist) process to form a pattern to remove the polymer generated during fine metal line etching, and to reduce the step to facilitate a photo process.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1A도 내지 제C도는 종래의 메탈 식각공정을 도시한 단면도,1A to C are cross-sectional views showing a conventional metal etching process,
제2A도 내지 제D도는 본 발명에 따라 메탈 식각공정의 단계를 도시한 단면도.2A through D are cross-sectional views illustrating the steps of a metal etching process according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930031859A KR950019934A (en) | 1993-12-31 | 1993-12-31 | How to remove polymer and reduce step after metal etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930031859A KR950019934A (en) | 1993-12-31 | 1993-12-31 | How to remove polymer and reduce step after metal etching |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950019934A true KR950019934A (en) | 1995-07-24 |
Family
ID=66853503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930031859A KR950019934A (en) | 1993-12-31 | 1993-12-31 | How to remove polymer and reduce step after metal etching |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950019934A (en) |
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1993
- 1993-12-31 KR KR1019930031859A patent/KR950019934A/en not_active Application Discontinuation
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