KR950012922A - Laser Diode and Manufacturing Method - Google Patents

Laser Diode and Manufacturing Method Download PDF

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Publication number
KR950012922A
KR950012922A KR1019930022326A KR930022326A KR950012922A KR 950012922 A KR950012922 A KR 950012922A KR 1019930022326 A KR1019930022326 A KR 1019930022326A KR 930022326 A KR930022326 A KR 930022326A KR 950012922 A KR950012922 A KR 950012922A
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KR
South Korea
Prior art keywords
layer
channel
substrate
laser diode
current limiting
Prior art date
Application number
KR1019930022326A
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Korean (ko)
Inventor
김종렬
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019930022326A priority Critical patent/KR950012922A/en
Publication of KR950012922A publication Critical patent/KR950012922A/en

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Abstract

본 발명은 레이저 다이오드와 그 제조방법에 관한 것이다.The present invention relates to a laser diode and a method of manufacturing the same.

본 발명 레이저 다이오드와 그 제조방법은, 액상결정 성장법의 되녹임 식각 및 재성장 기술을 적용하여 한 단계공정으로 이중의 전류주입채널을 용이하게 형성하고, 곧바로 단절없이 깨끗한 표면위에 재성장을 행함으로써, 제작이 간단하며, 2차 성장에 의한 불순물의 확산을 막을 수 있어 소자의 계면 특성, 고출력 특성 및 신뢰성등을 향상시킬 수 있는 이점을 제공한다.The laser diode of the present invention and a method of manufacturing the same, by applying the re-melt etching and regrowth technology of the liquid crystal growth method to easily form a double current injection channel in one step, and immediately re-grow on a clean surface without disconnection, It is simple to manufacture and can prevent the diffusion of impurities by secondary growth, thereby providing the advantage of improving the interface characteristics, high output characteristics and reliability of the device.

Description

레이저 다이오드와 그 제조방법Laser Diode and Manufacturing Method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도 내지 제3도는 본 발명 제조방법의 공정을 개략적으로 도시하는 공정 단면도,2 to 3 are process cross-sectional views schematically showing the process of the manufacturing method of the present invention,

제4도는 본 발명에 따른 레이저 다이오드의 개략적인 단면도이다.4 is a schematic cross-sectional view of a laser diode according to the present invention.

Claims (3)

그 저면에 전극이 마련되는 기판과, 상기 기판의 상부에 제1크래드층과 활성층 및 제2크래드층이 순차적으로 형성되어 레이저빔을 발진시키는 레이저 발진층과, 상기 기판과 제1크래드층사이에 개재되어 제한된 전류룰 주입하는 전류제한층이 구비된 레이저 다이오드에 있어서, 상기 기판에 두개의 U형 전류주입채널이 소정거리 이격되어 형성되며, 상기 전류주입채널사이에 형성되며, 상기 전류주입채널이 각 외측부에도 상기 전류주입채널 사이에 형성된 전류제한층보다 위치가 높은 전류제한층이 형성되며, 상기 활성층은 상기 U형 전류주입채널과 전류제한층에 대응하여 가운데 부분은 들어가고 그 양측부분은 올라간 굴곡형상으로 형성된 것을 특징으로 하는 레이저 다이오드.A substrate on which an electrode is provided on its bottom surface, a first cladding layer, an active layer, and a second cladding layer formed on top of the substrate to sequentially oscillate a laser beam, and the substrate and the first cladding A laser diode having a current limiting layer interposed between layers to inject a limited current, wherein two U-type current injection channels are formed on the substrate at a predetermined distance apart from each other, and are formed between the current injection channels. A current limiting layer having a position higher than that of the current limiting layer formed between the current injection channels is formed on each outer side of the injection channel, and the active layer enters the center portion corresponding to the U-type current injection channel and the current limiting layer, and both sides thereof. The laser diode, characterized in that formed in a raised shape. (1)기판에 평탄한 저면과 그 져면보다 좁은 입구가 마련된 채널을 형성하는 기판형성단계, (2)채널이 형성된 상기 기판상에 전류제한층을 성장하는 전류제한층성장단계, (3)상기 기판의 채널 입구 영역을 식각하여 소정의 거리가 이격된 이중의 전류주입채널을 형성하는 채널형성단계, (4)상기 전류주입채널 내부영역과 전휴제한층에 대응하여 제1크래드층, 활성층 및 제2크래드층을 성장하는 다층성장단계를 포함하는 것을 특징으로 하는 레이저 다이오드의 제조방법.(1) a substrate forming step of forming a channel having a flat bottom surface and a narrower inlet than the bottom surface thereof, (2) a current limiting layer growth step of growing a current limiting layer on the substrate on which the channel is formed, and (3) the substrate A channel forming step of forming a dual current injection channel spaced apart from a predetermined distance by etching the channel inlet region of the channel inlet; (4) a first cladding layer, an active layer, and a first cladding layer corresponding to the inner region of the current injection channel The method of manufacturing a laser diode comprising a multi-layer growth step of growing two clad layers. 제2항에 있어서, 상기 전류제한층성장단계, 채널형성단계 및 다층성장단계를 액상결정 성장법에 의한 성장/되녹임 식각/재성장의 단일공정으로 한 것을 특징으로 하는 레이저 다이오드의 제조방법.The method of manufacturing a laser diode according to claim 2, wherein the current limiting layer growing step, the channel forming step and the multi-layer growing step are a single step of growth / demelting etching / regrowth by a liquid crystal growth method. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930022326A 1993-10-26 1993-10-26 Laser Diode and Manufacturing Method KR950012922A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019930022326A KR950012922A (en) 1993-10-26 1993-10-26 Laser Diode and Manufacturing Method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930022326A KR950012922A (en) 1993-10-26 1993-10-26 Laser Diode and Manufacturing Method

Publications (1)

Publication Number Publication Date
KR950012922A true KR950012922A (en) 1995-05-17

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KR1019930022326A KR950012922A (en) 1993-10-26 1993-10-26 Laser Diode and Manufacturing Method

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KR (1) KR950012922A (en)

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PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19931026

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