KR950009942A - Pattern formation method of semiconductor device - Google Patents
Pattern formation method of semiconductor device Download PDFInfo
- Publication number
- KR950009942A KR950009942A KR1019930019531A KR930019531A KR950009942A KR 950009942 A KR950009942 A KR 950009942A KR 1019930019531 A KR1019930019531 A KR 1019930019531A KR 930019531 A KR930019531 A KR 930019531A KR 950009942 A KR950009942 A KR 950009942A
- Authority
- KR
- South Korea
- Prior art keywords
- insulating film
- film
- semiconductor device
- photosensitive film
- etching
- Prior art date
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Abstract
본 발명은 반도체 소자의 패턴 형성방법에 관한 것으로, 감광막(2)을 도포하고 마스크(3)을 사용하여 패턴형성 부위의 표면을 노광(4)시켜 상기 감광막(2)의 표면 일부만을 현상하는 단계와; 전체구조 상부에 절연막(5)을 도포한 후 상기 절연막(4)을 식각하되 패턴형성된 상기 감광막(2)상에 형성된 절연막(5)을 잔류시키는 단계와; 잔류된 절연막(5)을 식각장벽으로 상기 감광막(2)을 식각하여 원하는 패턴을 형성하는 단계를 포함하여 이루어짐으로써 종래의 다층감광막에 의한 패턴 형성기술에 비해 공정단계 및 원재료의 사용량은 줄이면서 파티클에 의한 오염은 감소시키는 이중의 효과를 얻을 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a pattern of a semiconductor device, the method comprising: applying a photosensitive film (2) and exposing (4) the surface of a pattern formation site using a mask (3) to develop only a part of the surface of the photosensitive film (2) Wow; Applying an insulating film (5) over the entire structure and etching the insulating film (4), but leaving the insulating film (5) formed on the patterned photosensitive film (2); Forming a desired pattern by etching the photoresist film 2 with the remaining insulating film 5 as an etch barrier, thereby reducing the use of particles and processing steps and raw materials, Pollution by can achieve the dual effect of reducing.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도는 본 발명에 따른 패턴 형성 공정 단면도.1 is a cross-sectional view of a pattern forming process according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930019531A KR950009942A (en) | 1993-09-23 | 1993-09-23 | Pattern formation method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930019531A KR950009942A (en) | 1993-09-23 | 1993-09-23 | Pattern formation method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950009942A true KR950009942A (en) | 1995-04-26 |
Family
ID=66823998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930019531A KR950009942A (en) | 1993-09-23 | 1993-09-23 | Pattern formation method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950009942A (en) |
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1993
- 1993-09-23 KR KR1019930019531A patent/KR950009942A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |