KR950009929A - Method of forming contact window of semiconductor device - Google Patents
Method of forming contact window of semiconductor device Download PDFInfo
- Publication number
- KR950009929A KR950009929A KR1019930019532A KR930019532A KR950009929A KR 950009929 A KR950009929 A KR 950009929A KR 1019930019532 A KR1019930019532 A KR 1019930019532A KR 930019532 A KR930019532 A KR 930019532A KR 950009929 A KR950009929 A KR 950009929A
- Authority
- KR
- South Korea
- Prior art keywords
- contact window
- forming
- semiconductor device
- sog
- mask
- Prior art date
Links
Abstract
본 발명은 반도체 소자의 접촉창 형성방법에 있어서, 웨이퍼(1)상에 중착된 중착물(2) 상부에 접촉창 마스크(3)를 형성하는 단계, 상기 접촉창 마스크(3)가 형성된 웨이퍼 전체구조 상부에 SOG막(4)을 형성하는 단계, 상기 SOG막(4)을 전면 식각하여 상기 접촉창 마스크(3)의 측벽에 SOG 스페이서(4')를 형성하는 단계, 상기 증착물(2)을 식각하여 접촉창을 형성하는 단계를 포함하여 이루어지는 것을 특징으로 하는 반도체 소자의 접촉창 형성 방법에 관한 것으로, 접촉창 마스크의 측벽에 SOG 스페이서를 형성하므로써 식각되는 하부 중착물의 식각폭 즉, 접촉창의 폭을 줄여주어 미세한 접촉창을 형성하며, 해상력의 향상 및 설계상 요구되는 작은 크기의 접촉창을 형성할 수 있는 효과가 있다.The present invention provides a method for forming a contact window of a semiconductor device, the method comprising: forming a contact window mask 3 on an intermediate material 2 deposited on a wafer 1, and a whole wafer on which the contact window mask 3 is formed. Forming an SOG film 4 on the structure, etching the entire SOG film 4 to form SOG spacers 4 'on sidewalls of the contact window mask 3, and depositing the deposit 2 A method of forming a contact window of a semiconductor device, the method comprising: forming a contact window by etching, wherein the contact width of the lower intermediate material etched by forming the SOG spacer on the sidewall of the contact window mask, that is, the contact window It reduces the width to form a fine contact window, and has the effect of improving the resolution and forming a small contact window required by the design.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2a도 내지 제2e도는 본 발명에 따른 접촉창 형성 공정도.2a to 2e is a contact window forming process according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930019532A KR950009929A (en) | 1993-09-23 | 1993-09-23 | Method of forming contact window of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930019532A KR950009929A (en) | 1993-09-23 | 1993-09-23 | Method of forming contact window of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950009929A true KR950009929A (en) | 1995-04-26 |
Family
ID=66824004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930019532A KR950009929A (en) | 1993-09-23 | 1993-09-23 | Method of forming contact window of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950009929A (en) |
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1993
- 1993-09-23 KR KR1019930019532A patent/KR950009929A/en not_active Application Discontinuation
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