KR910005099A - Formation of contact phase - Google Patents

Formation of contact phase Download PDF

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Publication number
KR910005099A
KR910005099A KR1019890010977A KR890010977A KR910005099A KR 910005099 A KR910005099 A KR 910005099A KR 1019890010977 A KR1019890010977 A KR 1019890010977A KR 890010977 A KR890010977 A KR 890010977A KR 910005099 A KR910005099 A KR 910005099A
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KR
South Korea
Prior art keywords
oxide layer
etching
formation
connection window
forming
Prior art date
Application number
KR1019890010977A
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Korean (ko)
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KR910006544B1 (en
Inventor
이명길
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to KR1019890010977A priority Critical patent/KR910006544B1/en
Publication of KR910005099A publication Critical patent/KR910005099A/en
Application granted granted Critical
Publication of KR910006544B1 publication Critical patent/KR910006544B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

내용 없음No content

Description

접속창 형성방법How to Form a Connection Window

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따른 접속창 형성방법을 나타낸 공정순서의 단면도이다.2 is a cross-sectional view of a process procedure showing a method for forming a contact window according to the present invention.

Claims (2)

반도체 메모리소자 상부에 산화층(3)을 형성하고, 접속창형성부위(x)에 포토리지스트(4)를 도포시키는 공정과, 적당량의 산화층(3)을 식각시키고 질화막(5)을 데포시키는 공정과, 다시 사진식각 방법으로 포토리지스트(4)를 마스크로 하여 식각하는 공정과, 로 접속창패턴 형성시 사진공정에 의한 접속창바(BAR)가 형성되게 한 접속창 형성방법.Forming an oxide layer 3 on the semiconductor memory device, applying a photoresist 4 to the connection window forming portion x, and etching an appropriate amount of the oxide layer 3 to depot the nitride film 5 And a process of etching the photoresist (4) as a mask by a photolithography method again, and a connection window bar (BAR) formed by a photolithography process when forming a furnace connection window pattern. 제1항에 있어서, 산화층의 에칭시 산화층과 선택비를 가지는 물질은 질화막, 폴리실리콘, 메탈 중 하나를 사용하고 상기 물질을 마스크로 사용하는 접속창 형성방법.The method of claim 1, wherein the material having a selectivity to an oxide layer when etching the oxide layer is one of a nitride film, polysilicon, and a metal, and the material is used as a mask. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019890010977A 1989-08-01 1989-08-01 Process for forming contact hole KR910006544B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890010977A KR910006544B1 (en) 1989-08-01 1989-08-01 Process for forming contact hole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890010977A KR910006544B1 (en) 1989-08-01 1989-08-01 Process for forming contact hole

Publications (2)

Publication Number Publication Date
KR910005099A true KR910005099A (en) 1991-03-30
KR910006544B1 KR910006544B1 (en) 1991-08-27

Family

ID=19288651

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010977A KR910006544B1 (en) 1989-08-01 1989-08-01 Process for forming contact hole

Country Status (1)

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KR (1) KR910006544B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9637899B2 (en) 2013-03-01 2017-05-02 Duravit Aktiengesellschaft Vacuum breaker, automatic flushing system for toilet and electronic bidet toilet

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9637899B2 (en) 2013-03-01 2017-05-02 Duravit Aktiengesellschaft Vacuum breaker, automatic flushing system for toilet and electronic bidet toilet

Also Published As

Publication number Publication date
KR910006544B1 (en) 1991-08-27

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