KR940026536A - - Google Patents

Info

Publication number
KR940026536A
KR940026536A KR19940007207A KR19940007207A KR940026536A KR 940026536 A KR940026536 A KR 940026536A KR 19940007207 A KR19940007207 A KR 19940007207A KR 19940007207 A KR19940007207 A KR 19940007207A KR 940026536 A KR940026536 A KR 940026536A
Authority
KR
South Korea
Application number
KR19940007207A
Other languages
Korean (ko)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR940026536A publication Critical patent/KR940026536A/ko

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
KR19940007207A 1993-05-31 1994-04-06 KR940026536A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5154452A JPH06341958A (ja) 1993-05-31 1993-05-31 シャドウマスク検査方法及び装置

Publications (1)

Publication Number Publication Date
KR940026536A true KR940026536A (ja) 1994-12-09

Family

ID=15584535

Family Applications (1)

Application Number Title Priority Date Filing Date
KR19940007207A KR940026536A (ja) 1993-05-31 1994-04-06

Country Status (2)

Country Link
JP (1) JPH06341958A (ja)
KR (1) KR940026536A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009104871A2 (ko) * 2008-02-19 2009-08-27 에스엔유 프리시젼 주식회사 암시야 검사장치

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5702990B2 (ja) * 2010-11-16 2015-04-15 東洋鋼鈑株式会社 板材検査方法及び板材検査装置
JP5601984B2 (ja) * 2010-11-16 2014-10-08 東洋鋼鈑株式会社 多孔板表面検査方法及び多孔板表面検査装置
CN104115004B (zh) * 2012-02-10 2016-07-13 株式会社岛津制作所 太阳能电池单体的检查装置以及太阳能电池单体的处理装置
JP6330284B2 (ja) * 2013-09-30 2018-05-30 大日本印刷株式会社 蒸着マスクの検査方法および蒸着マスクの検査治具

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009104871A2 (ko) * 2008-02-19 2009-08-27 에스엔유 프리시젼 주식회사 암시야 검사장치
WO2009104871A3 (ko) * 2008-02-19 2009-10-22 에스엔유 프리시젼 주식회사 암시야 검사장치

Also Published As

Publication number Publication date
JPH06341958A (ja) 1994-12-13

Similar Documents

Publication Publication Date Title
DE9305074U1 (ja)
DE9300991U1 (ja)
DE9300499U1 (ja)
DE9300400U1 (ja)
DE9305692U1 (ja)
DE9305442U1 (ja)
DE9303350U1 (ja)
DE9304388U1 (ja)
DE9301448U1 (ja)
DE9306347U1 (ja)
DE9300761U1 (ja)
DE9303277U1 (ja)
DE9303266U1 (ja)
DE9301828U1 (ja)
DE9301235U1 (ja)
DE9301529U1 (ja)
DE9306033U1 (ja)
DE9301895U1 (ja)
DE9302261U1 (ja)
DE9300938U1 (ja)
DE9305056U1 (ja)
DE9304912U1 (ja)
DE9304482U1 (ja)
DE9304005U1 (ja)
DE9300399U1 (ja)

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application