KR940025393A

KR940025393A - Manufacturing method of multi-color thin film electroluminescence (EL) device

Info

Publication number: KR940025393A
Application number: KR1019930007039A
Authority: KR
Inventors: 강해용
Original assignee: 이헌조; 주식회사 금성사
Priority date: 1993-04-26
Filing date: 1993-04-26
Publication date: 1994-11-19

Abstract

본 발명은 다색 박막 전계 발광(EL) 소자 제조방법에 관한 것으로, 종래의 다색 박막 전계 발광소자 제조방법은 포토레지스트를 단층으로 형성하여 발광층의 패턴을 형성하는데 패턴에칭을 위해 사용되는 식각용액으로 인해 포토레지스트가 손상이 되고, 이 손상으로 인해 리프트-오프 공정시 포토레지스트의 성질변화로 인한 점도의 감소 및 포토레지스트 두께 감소로 인한 단차 두께증가 등으로 리프트-오프가 이루어지지 않는 문제점이 있게 된다.The present invention relates to a multicolor thin film electroluminescent (EL) device manufacturing method, a conventional multicolor thin film electroluminescent device manufacturing method is formed by a single layer of the photoresist to form a pattern of the light emitting layer due to the etching solution used for pattern etching The photoresist is damaged, and this damage causes a problem in that the lift-off is not performed due to a decrease in viscosity due to a change in properties of the photoresist and an increase in step thickness due to a decrease in photoresist thickness.

본 발명은 이러한 문제점을 해결하기 위한 것으로, 서로 다른 두 종류의 포토레지스트를 이증구주로 형성하여 식각용액에 의한 손상을 상부의 포토레지스트에 국한시킴으로써 리프트-오프 공정시 깨끗한 발광층 패턴을 얻도록 하고, 소자의 안정성을 개선시키도록 하는 것이다.The present invention is to solve this problem, by forming two different types of photoresist as a distillation column to limit the damage caused by the etching solution to the upper photoresist to obtain a clean light emitting layer pattern during the lift-off process, To improve the stability of the device.

Description

Manufacturing method of multi-color thin film electroluminescence (EL) device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 1 도는 종래 다색 박막 전계 발광소자의 단면구조도, 제 2 도의 (가) 내지 (마)는 제 1 도에 대한 제조공정도, 제 3 도의 (가) 내지 (마)는 본 발명 다색 박막 전계 발광(EL) 소자 제조 공정도.1 is a cross-sectional structure diagram of a conventional multicolor thin film EL device, (a) to (e) of FIG. 2 is a manufacturing process diagram for FIG. 1, and (a) to (e) of FIG. 3 is a multicolor thin film electric field of the present invention. Process of manufacturing light emitting (EL) device.

Claims

Continuously forming a transparent conductive film 2 and a first insulating layer 3 on the transparent glass substrate 1, and first emitting layer 4, first and second photoresist on the first insulating layer 3 (8) forming the first and second photoresist (8) and (9) patterns after depositing (9), and then forming the first light emitting layer (4) pattern, and forming the first light emitting layer (5). After the deposition, removing the first and second photoresist 8 and 9 patterns through a life-off process, followed by the second insulating layer 6 and the back electrode 7 Method for manufacturing a multi-color thin film electroluminescent (EL) device, characterized in that the manufacturing step.

The method of manufacturing a multicolor thin film electroluminescence (EL) device according to claim 1, wherein the first and second photoresists (8) (9) use photoresists having different properties.

The method of manufacturing a multicolor thin film electroluminescence (EL) device according to claim 2, wherein the photoresist (8) uses a photoresist having a weak polymerization property and easily dissolving by exposure.

The method of manufacturing a multicolor thin film electroluminescence (EL) device according to claim 2, wherein the first photoresist (9) uses a photoresist having good resistance to ionic shock or an etching solution.

※ Note: The disclosure is based on the initial application.