KR940011100U - 패턴 마스크 구조 - Google Patents

패턴 마스크 구조

Info

Publication number
KR940011100U
KR940011100U KR2019920020140U KR920020140U KR940011100U KR 940011100 U KR940011100 U KR 940011100U KR 2019920020140 U KR2019920020140 U KR 2019920020140U KR 920020140 U KR920020140 U KR 920020140U KR 940011100 U KR940011100 U KR 940011100U
Authority
KR
South Korea
Prior art keywords
pattern mask
mask structure
pattern
mask
Prior art date
Application number
KR2019920020140U
Other languages
English (en)
Other versions
KR960001367Y1 (ko
Inventor
허훈
Original Assignee
엘지반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체 주식회사 filed Critical 엘지반도체 주식회사
Priority to KR92020140U priority Critical patent/KR960001367Y1/ko
Publication of KR940011100U publication Critical patent/KR940011100U/ko
Application granted granted Critical
Publication of KR960001367Y1 publication Critical patent/KR960001367Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR92020140U 1992-10-19 1992-10-19 패턴 마스크 구조 KR960001367Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92020140U KR960001367Y1 (ko) 1992-10-19 1992-10-19 패턴 마스크 구조

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92020140U KR960001367Y1 (ko) 1992-10-19 1992-10-19 패턴 마스크 구조

Publications (2)

Publication Number Publication Date
KR940011100U true KR940011100U (ko) 1994-05-27
KR960001367Y1 KR960001367Y1 (ko) 1996-02-13

Family

ID=19342077

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92020140U KR960001367Y1 (ko) 1992-10-19 1992-10-19 패턴 마스크 구조

Country Status (1)

Country Link
KR (1) KR960001367Y1 (ko)

Also Published As

Publication number Publication date
KR960001367Y1 (ko) 1996-02-13

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