KR950010172U - 크로스마스크의 결합구조 - Google Patents

크로스마스크의 결합구조

Info

Publication number
KR950010172U
KR950010172U KR2019930018195U KR930018195U KR950010172U KR 950010172 U KR950010172 U KR 950010172U KR 2019930018195 U KR2019930018195 U KR 2019930018195U KR 930018195 U KR930018195 U KR 930018195U KR 950010172 U KR950010172 U KR 950010172U
Authority
KR
South Korea
Prior art keywords
combination structure
mask combination
cross mask
cross
mask
Prior art date
Application number
KR2019930018195U
Other languages
English (en)
Other versions
KR200151990Y1 (ko
Inventor
김병규
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019930018195U priority Critical patent/KR200151990Y1/ko
Publication of KR950010172U publication Critical patent/KR950010172U/ko
Application granted granted Critical
Publication of KR200151990Y1 publication Critical patent/KR200151990Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019930018195U 1993-09-11 1993-09-11 크로스마스크의 결합구조 KR200151990Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930018195U KR200151990Y1 (ko) 1993-09-11 1993-09-11 크로스마스크의 결합구조

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930018195U KR200151990Y1 (ko) 1993-09-11 1993-09-11 크로스마스크의 결합구조

Publications (2)

Publication Number Publication Date
KR950010172U true KR950010172U (ko) 1995-04-24
KR200151990Y1 KR200151990Y1 (ko) 1999-07-15

Family

ID=19363294

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930018195U KR200151990Y1 (ko) 1993-09-11 1993-09-11 크로스마스크의 결합구조

Country Status (1)

Country Link
KR (1) KR200151990Y1 (ko)

Also Published As

Publication number Publication date
KR200151990Y1 (ko) 1999-07-15

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