KR940004435B1 - Cathode of electron gun - Google Patents
Cathode of electron gun Download PDFInfo
- Publication number
- KR940004435B1 KR940004435B1 KR1019880018213A KR880018213A KR940004435B1 KR 940004435 B1 KR940004435 B1 KR 940004435B1 KR 1019880018213 A KR1019880018213 A KR 1019880018213A KR 880018213 A KR880018213 A KR 880018213A KR 940004435 B1 KR940004435 B1 KR 940004435B1
- Authority
- KR
- South Korea
- Prior art keywords
- cathode
- electron
- electron gun
- heat
- porous substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 229910052788 barium Inorganic materials 0.000 claims description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000008188 pellet Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229960002050 hydrofluoric acid Drugs 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 229910052706 scandium Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/14—Solid thermionic cathodes characterised by the material
Landscapes
- Solid Thermionic Cathode (AREA)
Abstract
내용 없음.No content.
Description
제1도는 전자총의 내부구조 개략도.1 is a schematic diagram of the internal structure of the electron gun.
*도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 캐소드 2 : 내열성의 다공질 기판1: cathode 2: heat resistant porous substrate
3 : 전자방출부3: electron emission unit
본 발명은 컬러 브라운관등에 사용되는 전자총의 캐소드(Cathode :음극)에 관한 것으로, 특히 Ba(바륨)을 주(主)전자 방출 물질로 사용하는 고기능 캐소드에서 동작중 발생하는 Ba의 증발을 억제할 수 있도록 한 전자총의 캐소드에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to cathodes of electron guns used in color CRT tubes, and the like. In particular, it is possible to suppress evaporation of Ba generated during operation in a high-performance cathode using Ba (barium) as the main electron emitting material. So that it relates to the cathode of an electron gun.
일반적으로, 고기능 캐소드는 종래의 산화물(oxide) 캐소드에는 얻기 힘든 고전류 밀도 및 긴 수명을 보장할 수 있는 특성이 있다.In general, high-performance cathodes have the property of ensuring high current density and long lifetime, which are difficult to obtain in conventional oxide cathodes.
이롸같은 고기능 캐소드는 W(텅스텐), Mo(몰리브덴) 등의 내열성 금속분말을 Sc(스칸듐) 또는 Ir(이리듐) 등의 금속으로 코팅(coating)하거나 혹은 HF(불산) 등으로 전처리하여 입도(粒度)를 조절한다.High performance cathodes are coated with heat-resistant metal powders such as W (tungsten) and Mo (molybdenum) with a metal such as Sc (scandium) or Ir (iridium), or pretreated with HF (fluoric acid), etc. ).
다음에, 이들을 저온에서 휘발하는 물질과 함께 가압성형하여 펠렛(pellet)을 형성한 후, 고온에서 처리하여 저온 휘발 물질을 제거하므로써 내열성이 높은 다공질 기판을 만든다.Next, these are press-molded together with a material which volatilizes at a low temperature to form pellets, and then processed at a high temperature to remove the low temperature volatile material, thereby making a porous substrate having high heat resistance.
상기 내열성의 다공질 기판의 기공부에 캐소드의 동작 중 고온에서 기판과의 반응, 또는 복합 금속 산화물인 전자방출 물질의 분해등에 의하여 지속적으로 전자를 방출하도록 전자방출 물질을 함침 시키거나, 상기 내열성의 다공질 기판에 고농도 전자 방출 물질을 저장하는 저장부분을 설치한다.Impregnating an electron-emitting material to continuously emit electrons through the reaction of the cathode at a high temperature during the operation of the cathode or decomposition of the electron-emitting material, which is a complex metal oxide, during the operation of the cathode, or the heat-resistant porous substrate A storage compartment for storing high electron emission materials is provided on the substrate.
그러나, 이와 같이 구성하면 지속적으로 전자를 방출하는 고기능 캐소드의 경우 그 동작 온도가 800~1200℃로 높으므로 동작중 Ba이 다량으로 증발되어 캐소드의 수명이 단축될뿐만 아니라, 이와같이 다량으로 증발된 Ba이 전극에 흡착되어 방전을 일으키기도 하고 또는 히-터(Heater)등의 절연부위에 흡착되어 절연을 파괴하는 등의 문제점이 있었다.However, in this configuration, in the case of a high-performance cathode which emits electrons continuously, its operating temperature is high at 800-1200 ° C., so that Ba is evaporated in a large amount during operation to shorten the life of the cathode, and thus Ba is evaporated in such a large amount. There is a problem that the electrode is adsorbed by this electrode to cause a discharge, or it is adsorbed by an insulating part such as a heater to destroy the insulation.
한편, 이러한 문제점을 개선하기 위하여 기판의 기공률제어, 전자방출표면의 피복, 또는 다공성 금속박막(Foil)등을 이용하여 Ba의 억제를 시도하였으나 이와같은 구성의 캐소드에 있어서도 고온에서 Ba이 다량으로 방출되어 별다른 효과를 얻을 수 없다는 문제점이 있었다.On the other hand, in order to improve this problem, attempts have been made to suppress Ba by controlling the porosity of the substrate, coating the electron emission surface, or porous metal foil. However, even in a cathode having such a configuration, a large amount of Ba is released at a high temperature. There was a problem that you can not get a different effect.
본 발명의 이러한 문제점을 개선하기 위하여 이루어진 것으로써, 본 발명의 목적은 통상의 내열성의 다공질 금속기판의 전자방출부에 비등점이 높고, 캐소드 동작중 Ba과 화합하는 B(붕소) 및 B화합물을 첨가(Dopping)시키므로써 전자방출 표면에서 Ba의 증발을 억제할 수 있는 전자총의 캐소드를 제공하는데 있다.In order to solve this problem of the present invention, an object of the present invention is to add a B (boron) and a B compound having a high boiling point and compounding Ba with a cathode during operation of a conventional heat-resistant porous metal substrate. It is to provide a cathode of the electron gun that can suppress the evaporation of Ba on the electron emission surface by doping.
이하, 본 발명을 첨부된 도면에 의하여 상세히 설명한다.Hereinafter, the present invention will be described in detail by the accompanying drawings.
본 발명은 W,MO 등의 내열성 금속 분말을 Sc, 또는 Ir 등의 금속으로 코팅하거나 기타 HF(불산)등의 전처리를 통하여 입도를 조절한 후, 저온에서 휘발하는 물질과 함께 가압성형하여 펠렛을 만든다음, 이 펠렛을 고온 열처리하여 내열성의 다공질기판(2)을 제조하고, 알코올(Alcohol)을 용매로 하여 B(Boron : 붕소) 및 B화합물을 녹인 용액을 상기 내열성의 다공질기판(2)의 전자방출부(3)의 표면이나 전자방출부(3)전체에 코팅하거나 스프레이(Spray) 방법으로 도포하여 B 또는 B화합물 성분을 첨가시킨다. 한편, 상기 전자방출부(3)를 구성하는 내열성의 금속분말에 B 또는 B화합물을 코팅해서 상기 B성분이 캐소드(1)동작중 전자방출 물질인 Ba과 화합되게 하여 Ba의 증발을 억제시키도록 해도 된다.The present invention is to control the particle size by coating a heat-resistant metal powder, such as W, MO with a metal such as Sc, Ir, or other pre-treatment such as HF (fluoric acid), and then press-molded with pellets at a low temperature to pellet the pellets Then, the pellets are subjected to high temperature heat treatment to prepare a heat resistant porous substrate 2, and a solution obtained by dissolving B (Boron: boron) and B compounds using an alcohol (Alcohol) as a solvent is applied to the heat resistant porous substrate (2). The B or B compound component is added by coating on the surface of the electron-emitting part 3 or the entire electron-emitting part 3 or by spraying. On the other hand, by coating a B or B compound on the heat-resistant metal powder constituting the electron-emitting portion 3 so that the B component is combined with Ba, an electron-emitting material during the operation of the cathode (1) to suppress the evaporation of Ba You may also
상기에서 알코올을 용매로 사용한 B 또는 B화합물 용액을 도포하거나 스프레이할때, 수반되는 상기 알코올 성분은 펠렛의 고온열처리과정에서 휘발 제거된다.When applying or spraying a B or B compound solution using alcohol as a solvent, the alcohol component involved is volatilized off during the high temperature heat treatment of the pellets.
이와 같이 구성된 본 발명의 전자총 캐소드에 의하면, 내열성의 다공질 기판의 전자방출부 및 그 표면에 B 또는 B화합물을 첨가시킴으로써, 캐소드 동작중 고온에서 Ba의 다량증발을 억제할 수 있으므로, 상기 캐소드의 수명을 연장시킬 수 있고, 상기 Ba이 전극 및 히터에 흡착될때 발생하는 방전 및 절연파괴등의 불량을 해소할 수 있으며 전자방출 표면부에 B 또는 B화합물을 첨가함으로써 내열성 다공질기판의 기공률을 제어할 수 있다는 잇점이 있다.According to the electron gun cathode of the present invention configured as described above, since a large amount of Ba can be suppressed at a high temperature during the cathode operation by adding B or B compounds to the electron emitting portion and the surface of the heat resistant porous substrate, the lifetime of the cathode Can solve the defects such as discharge and insulation breakdown generated when the Ba is adsorbed on the electrode and the heater, and can control the porosity of the heat resistant porous substrate by adding B or B compound to the electron emission surface There is an advantage.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019880018213A KR940004435B1 (en) | 1988-12-31 | 1988-12-31 | Cathode of electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019880018213A KR940004435B1 (en) | 1988-12-31 | 1988-12-31 | Cathode of electron gun |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR900010884A KR900010884A (en) | 1990-07-09 |
| KR940004435B1 true KR940004435B1 (en) | 1994-05-25 |
Family
ID=19281221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019880018213A Expired - Fee Related KR940004435B1 (en) | 1988-12-31 | 1988-12-31 | Cathode of electron gun |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR940004435B1 (en) |
-
1988
- 1988-12-31 KR KR1019880018213A patent/KR940004435B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR900010884A (en) | 1990-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4165473A (en) | Electron tube with dispenser cathode | |
| US3558966A (en) | Directly heated dispenser cathode | |
| US2639399A (en) | Electron emitter | |
| US3308329A (en) | Thermionic emissive cathode with end structure for emissive suppression | |
| KR940004435B1 (en) | Cathode of electron gun | |
| US2175696A (en) | Electron emitter | |
| Liu et al. | Cathodes in magnetrons: A review | |
| US1552310A (en) | Electrode for discharge tubes | |
| US4018489A (en) | Method for extending cathode life in vidicon tubes | |
| JPH0794072A (en) | Hot cathode for electron radiation, its manufacture, and electron beam working device using it | |
| US2686886A (en) | Electric discharge tube | |
| US20060076871A1 (en) | Vacuum tube with oxide cathode | |
| RU2177657C1 (en) | Method for coating emissive cathode | |
| KR100244219B1 (en) | Activation method of submerged type cathode | |
| US2875361A (en) | Auxiliary heaters to aid in activation of cathode ray type guns | |
| JPH0418660B2 (en) | ||
| KR920009323B1 (en) | Cathode | |
| Falce | A cavity reservoir dispenser cathode for CRTs and low-cost traveling-wave tube applications | |
| US3275873A (en) | Electric discharge device having improved dispenser cathode | |
| JP3715790B2 (en) | Method for producing impregnated cathode for discharge tube | |
| JPS6343860B2 (en) | ||
| KR100198572B1 (en) | Activation processing method of impregnation type cathode | |
| KR920008786B1 (en) | Cathode | |
| JPH065198A (en) | Cathode including cathode element | |
| KR0144050B1 (en) | Impregnated Cathode |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19881231 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19910710 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19881231 Comment text: Patent Application |
|
| G160 | Decision to publish patent application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19931207 Patent event code: PE09021S01D |
|
| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19940428 Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19931122 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19940824 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19941012 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 19941004 End annual number: 3 Start annual number: 1 |
|
| PR1001 | Payment of annual fee |
Payment date: 19970421 Start annual number: 4 End annual number: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 19980421 Start annual number: 5 End annual number: 5 |
|
| PR1001 | Payment of annual fee |
Payment date: 19990430 Start annual number: 6 End annual number: 6 |
|
| PR1001 | Payment of annual fee |
Payment date: 20000429 Start annual number: 7 End annual number: 7 |
|
| PR1001 | Payment of annual fee |
Payment date: 20010430 Start annual number: 8 End annual number: 8 |
|
| PR1001 | Payment of annual fee |
Payment date: 20020429 Start annual number: 9 End annual number: 9 |
|
| PR1001 | Payment of annual fee |
Payment date: 20030428 Start annual number: 10 End annual number: 10 |
|
| PR1001 | Payment of annual fee |
Payment date: 20040429 Start annual number: 11 End annual number: 11 |
|
| PR1001 | Payment of annual fee |
Payment date: 20050429 Start annual number: 12 End annual number: 12 |
|
| FPAY | Annual fee payment |
Payment date: 20060502 Year of fee payment: 13 |
|
| PR1001 | Payment of annual fee |
Payment date: 20060502 Start annual number: 13 End annual number: 13 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |