KR940004302U - Trap for semiconductor deposition equipment - Google Patents

Trap for semiconductor deposition equipment

Info

Publication number
KR940004302U
KR940004302U KR2019920013009U KR920013009U KR940004302U KR 940004302 U KR940004302 U KR 940004302U KR 2019920013009 U KR2019920013009 U KR 2019920013009U KR 920013009 U KR920013009 U KR 920013009U KR 940004302 U KR940004302 U KR 940004302U
Authority
KR
South Korea
Prior art keywords
trap
deposition equipment
semiconductor deposition
semiconductor
equipment
Prior art date
Application number
KR2019920013009U
Other languages
Korean (ko)
Other versions
KR950004146Y1 (en
Inventor
이중재
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92013009U priority Critical patent/KR950004146Y1/en
Publication of KR940004302U publication Critical patent/KR940004302U/en
Application granted granted Critical
Publication of KR950004146Y1 publication Critical patent/KR950004146Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR92013009U 1992-07-14 1992-07-14 Trap of semiconductor deposition apparatus KR950004146Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92013009U KR950004146Y1 (en) 1992-07-14 1992-07-14 Trap of semiconductor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92013009U KR950004146Y1 (en) 1992-07-14 1992-07-14 Trap of semiconductor deposition apparatus

Publications (2)

Publication Number Publication Date
KR940004302U true KR940004302U (en) 1994-02-24
KR950004146Y1 KR950004146Y1 (en) 1995-05-22

Family

ID=19336731

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92013009U KR950004146Y1 (en) 1992-07-14 1992-07-14 Trap of semiconductor deposition apparatus

Country Status (1)

Country Link
KR (1) KR950004146Y1 (en)

Also Published As

Publication number Publication date
KR950004146Y1 (en) 1995-05-22

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20030417

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee