KR940002255A - Dihydroxyallyl cefem compound and preparation method thereof - Google Patents

Dihydroxyallyl cefem compound and preparation method thereof Download PDF

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KR940002255A
KR940002255A KR1019920012642A KR920012642A KR940002255A KR 940002255 A KR940002255 A KR 940002255A KR 1019920012642 A KR1019920012642 A KR 1019920012642A KR 920012642 A KR920012642 A KR 920012642A KR 940002255 A KR940002255 A KR 940002255A
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South Korea
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compound
formula
hydrogen
same
dihydroxyallyl
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KR1019920012642A
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Korean (ko)
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KR950008319B1 (en
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장문호
강한영
고훈영
배애님
심상철
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서정욱
한국과학기술연구원
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/26—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
    • C07D501/34—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/02—Preparation
    • C07D501/04—Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • C07D501/06—Acylation of 7-aminocephalosporanic acid
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/22—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with radicals containing only hydrogen and carbon atoms, attached in position 3
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/36—Methylene radicals, substituted by sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/48—Methylene radicals, substituted by hetero rings
    • C07D501/56—Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

본 발명은 일반구조식(I)의 광범위한 항균력을 지난 세라포스포린 화합물 및 그의 약제학적으로 허용되는 염 및 그 제조방법에 관한 것이다.The present invention relates to a ceraphosphorin compound, a pharmaceutically acceptable salt thereof, and a method for preparing the same, which have undergone the extensive antimicrobial activity of general formula (I).

본 발명에서 합성된 화합물들은 그람양성균이나, 그람음성균에서 뛰어난 항균력을 나타내므로 세파로스포린 화합물 계열 의약품에 유용하게 사용할 수 있다.Compounds synthesized in the present invention exhibit excellent antimicrobial activity in Gram-positive bacteria or Gram-negative bacteria, and thus can be usefully used in Separosporin compound-based medicines.

Description

디히드록시알릴세펨 화합물 및 이의 제조방법Dihydroxyallyl cefem compound and preparation method thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (2)

다음 일반식(I)으로 표시되는 세파로스포린 화합물 및 약제학적으로 허용되는 염.Separosporin compound represented by the following general formula (I) and a pharmaceutically acceptable salt. 상기 일반식(I)에 있어서 R1은 H, 또는 트리틸, 3급-부톡시 카르보닐, 포르밀등으로, R2는 수소 또는 디페닐메틸기, 파라-메톡시벤질기이고 또는 염을 만드는 Na나 K가 같은 원자이며, R3, R4는 서로 같거나 다를 수가 있으며, H 또는 아세틸, 파라-메톡시벤질이고, X, Y는 수소 또는 플루오로, 클로로, 브로모, 요오드이며, Q는 수소, 비닐, 아세톡시메틸, 메톡시메틸, 할로메틸, 피리디니움메틸, N-에틸피리디니움일티오메틸, N-카르복시메틸피리디니움일티오메틸, 카르바모일옥시메틸, N-메틸-테트라졸릴티오메틸과 같은 치환기를 나타낸다.In Formula (I), R 1 is H, or trityl, tert-butoxy carbonyl, formyl, and the like, R 2 is hydrogen or diphenylmethyl group, para-methoxybenzyl group, or salt Na or K are the same atom, R 3 , R 4 may be the same or different, H or acetyl, para-methoxybenzyl, X, Y is hydrogen or fluoro, chloro, bromo, iodine, Q Is hydrogen, vinyl, acetoxymethyl, methoxymethyl, halomethyl, pyridiniummethyl, N-ethylpyridiniumylthiomethyl, N-carboxymethylpyridiniumylthiomethyl, carbamoyloxymethyl, N-methyl- Substituents such as tetrazolylthiomethyl. 일반식(II)의 화합물과 일반식(III)의 화합물을 아실화 반응시키는 것을 특징으로 하는 제1항의 일반식(I) 화합물의 제조방법.A process for producing the compound of formula (I) according to claim 1, characterized in that the compound of formula (II) and the compound of formula (III) are acylated. 상기식에서, R1, R2, R3, R4및 Q는 각각 제1항에 정의한 것과 동일하다.Wherein R 1 , R 2 , R 3 , R 4 and Q are the same as defined in claim 1, respectively. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920012642A 1992-07-15 1992-07-15 Dihydroxy allyl cephem compound and process of their preparation KR950008319B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920012642A KR950008319B1 (en) 1992-07-15 1992-07-15 Dihydroxy allyl cephem compound and process of their preparation

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Application Number Priority Date Filing Date Title
KR1019920012642A KR950008319B1 (en) 1992-07-15 1992-07-15 Dihydroxy allyl cephem compound and process of their preparation

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KR940002255A true KR940002255A (en) 1994-02-17
KR950008319B1 KR950008319B1 (en) 1995-07-27

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