KR930026522U - 기판지지 장치 - Google Patents

기판지지 장치

Info

Publication number
KR930026522U
KR930026522U KR2019930008168U KR930008168U KR930026522U KR 930026522 U KR930026522 U KR 930026522U KR 2019930008168 U KR2019930008168 U KR 2019930008168U KR 930008168 U KR930008168 U KR 930008168U KR 930026522 U KR930026522 U KR 930026522U
Authority
KR
South Korea
Prior art keywords
support device
board support
board
support
Prior art date
Application number
KR2019930008168U
Other languages
English (en)
Inventor
랏쯔 루돌프
리텔 조첸
Original Assignee
레이볼트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 레이볼트 아크티엔게젤샤프트 filed Critical 레이볼트 아크티엔게젤샤프트
Publication of KR930026522U publication Critical patent/KR930026522U/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Materials For Photolithography (AREA)
KR2019930008168U 1992-05-15 1993-05-15 기판지지 장치 KR930026522U (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE9206635U DE9206635U1 (ko) 1992-05-15 1992-05-15

Publications (1)

Publication Number Publication Date
KR930026522U true KR930026522U (ko) 1993-12-28

Family

ID=6879567

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930008168U KR930026522U (ko) 1992-05-15 1993-05-15 기판지지 장치

Country Status (5)

Country Link
EP (1) EP0569660A1 (ko)
JP (1) JPH0596059U (ko)
KR (1) KR930026522U (ko)
CA (1) CA2096274A1 (ko)
DE (1) DE9206635U1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4307382A1 (de) * 1993-03-09 1994-09-15 Leybold Ag Maske zum Abdecken des radial äußeren Bereichs einer scheibenförmigen Substratoberfläche
JPH1021586A (ja) * 1996-07-02 1998-01-23 Sony Corp Ｄｃスパッタリング装置
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
GB0207375D0 (en) 2002-03-28 2002-05-08 Hardide Ltd Cutting tool with hard coating
DE10324202A1 (de) * 2003-05-28 2004-12-16 Aixtron Ag Maskenhaltevorrichtung
WO2014191624A1 (en) * 2013-05-29 2014-12-04 Beneq Oy Substrate holder and arrangement for holding substrates
CN110168131B (zh) * 2017-01-23 2022-06-07 应用材料公司 基板保持器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2044519A1 (de) * 1970-09-08 1972-03-09 Siemens Ag Vorrichtung zum Herstellen von Kon taktschichten an den Enden elektrischer Bauelemente
US5094885A (en) * 1990-10-12 1992-03-10 Genus, Inc. Differential pressure cvd chuck

Also Published As

Publication number Publication date
DE9206635U1 (ko) 1992-09-10
CA2096274A1 (en) 1993-11-16
EP0569660A1 (de) 1993-11-18
JPH0596059U (ja) 1993-12-27

Similar Documents

Publication Publication Date Title
DE69315918D1 (de) Elektronisches Gerät
NO933828D0 (no) Forskalingsanordning
DE9311467U1 (de) Abstützvorrichtung
BR9403908A (pt) Dispositivo de apoio
BR9303759A (pt) Aparelho
DE69318820D1 (de) Entseuchungsvorrichtung
BR9403900A (pt) Dispositivo de apoio
NO943615L (no) Fundamentanordning
DE59308417D1 (de) Gerätekoffer
NO923919L (no) Böyningsbegrensende anordning
NO931102D0 (no) Belastnings-styreanordning
KR930026522U (ko) 기판지지 장치
FI922328A0 (fi) Tukilaite
DK0592007T3 (da) Omskifterapparat
DK111093D0 (da) Tilslutningsapparat
DE9312237U1 (de) Sützeinrichtung
KR950016467U (ko) 지지장치
NO179059C (no) Trekk- og understöttelsesanordning for ledning
KR940017361U (ko) 비디오기판 지지장치
DE59303900D1 (de) Echokompensationsvorrichtung
KR950021454U (ko) 회로기판 위치결정 지지장치
KR950002529U (ko) 기판 지지장치
KR940013709U (ko) 잭핀 보오드
KR920020176U (ko) 전자오르겐용 받침대
IT228082Y1 (it) Dispositivo reggimensole

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid