KR930020599A - Cleaning liquid for semiconductor substrate - Google Patents

Cleaning liquid for semiconductor substrate Download PDF

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Publication number
KR930020599A
KR930020599A KR1019930003663A KR930003663A KR930020599A KR 930020599 A KR930020599 A KR 930020599A KR 1019930003663 A KR1019930003663 A KR 1019930003663A KR 930003663 A KR930003663 A KR 930003663A KR 930020599 A KR930020599 A KR 930020599A
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KR
South Korea
Prior art keywords
cleaning
cleaning liquid
semiconductor substrate
substrate according
humectant
Prior art date
Application number
KR1019930003663A
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Korean (ko)
Other versions
KR100225147B1 (en
Inventor
야스오 스기하라
가즈시게 다나까
이꾸에 사꾸마
Original Assignee
나시까와 레이지
미쓰비시가스가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 나시까와 레이지, 미쓰비시가스가가꾸 가부시끼가이샤 filed Critical 나시까와 레이지
Publication of KR930020599A publication Critical patent/KR930020599A/en
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Publication of KR100225147B1 publication Critical patent/KR100225147B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/36—Organic compounds containing phosphorus
    • C11D3/361—Phosphonates, phosphinates or phosphonites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/36—Organic compounds containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

포스폰산 킬레이트화제 및 습윤제를 함유하거나, 또는 습윤제만을 함유하는, 반도체 기판용 세정용의 산성 또는 염기성 과산화수소 세정액.An acidic or basic hydrogen peroxide cleaning liquid for cleaning semiconductor substrates containing a phosphonic acid chelating agent and a wetting agent or only a wetting agent.

Description

반도체 기판용 세정액Cleaning liquid for semiconductor substrate

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (13)

포스폰산 킬레이트화제 및 습윤제를 함유하는, 반도체 기판용 세정용의 산성 또는 염기성 관산화수소 세정액.An acidic or basic hydrogen peroxide cleaning liquid for cleaning semiconductor substrates containing a phosphonic acid chelating agent and a humectant. 하기 일반식(Ⅰ)의 다가 알콜 또는 그의 산화 물질로 부터 선택된 한 종류 이상의 습윤제를 함유하는 기판용 세정용 세정액.A cleaning liquid for cleaning a substrate containing at least one humectant selected from polyhydric alcohols of the general formula (I) or oxidized substances thereof. HOCH₂-(CHOH)₂-CH₂OH (n=0~10) (I)HOCH₂- (CHOH) ₂-CH₂OH (n = 0 ~ 10) (I) 제1 또는 2항에 있어서, 세정액의 표면장력이 60 dyne/cm 이하거나 기판 표면에 대한 접촉각이 50°이하인 반도체 기판용 세정용 세정액.The cleaning liquid for semiconductor substrates according to claim 1 or 2, wherein the surface tension of the cleaning liquid is 60 dyne / cm or less or the contact angle with respect to the substrate surface is 50 degrees or less. 제1 또는 2항에 있어서, 암모니아 및 과산화수소의 혼합 수용액인 반도체 기판용 세정용 세정액The cleaning liquid for cleaning a semiconductor substrate according to claim 1 or 2, which is a mixed aqueous solution of ammonia and hydrogen peroxide. 제1항에 있어서, 습윤제가 술폰산 게면활성제인 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the humectant is a sulfonic acid surfactant. 제1항에 있어서, 습윤제가 에틸렌 옥사이드-첨가 비이온성 계면활성제인 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the wetting agent is an ethylene oxide-added nonionic surfactant. 제1항에 있어서, 습윤제가 폴리카르복실산 또는 그의 공중합 변형 생성물인 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the humectant is a polycarboxylic acid or a copolymer modified product thereof. 제1항에 있어서, 습윤제가 제2항에 기재된 일반식(I)의 다가 알콜 또는 그의 산화 물질인 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the humectant is a polyhydric alcohol of the general formula (I) according to claim 2 or an oxidized substance thereof. 제1 또는 2항에 있어서, 습윤제가 에틸렌 글리콜, 글리세롤, 소르비톨, 글리콜산, 에리트리톨, 크실리톨 및 만니톨로 구성된 군으로 부터 선태고딘 1종 이상의 것인 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1 or 2, wherein the wetting agent is at least one sun tangodine from the group consisting of ethylene glycol, glycerol, sorbitol, glycolic acid, erythritol, xylitol, and mannitol. 제1항에 있어서, 포스폰산 킬레이트화제가 프로필렌디아민테트라 (메틸렌 포스폰산), 에틸렌디아민테트라 (메틸렌 포스폰산) 및 디에틸렌트리아민펜타 (메틸렌포스폰산)으로 구성된 군으로부터 선택된 1종인 반도체 기판 세정용 세정액.The semiconductor substrate cleaning method according to claim 1, wherein the phosphonic acid chelating agent is one selected from the group consisting of propylenediaminetetra (methylene phosphonic acid), ethylenediaminetetra (methylene phosphonic acid) and diethylenetriaminepenta (methylenephosphonic acid). Cleaning liquid. 제1항에 있어서, 습윤제가 0.1~15,000ppm의 양으로 존재하는 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the wetting agent is present in an amount of 0.1 to 15,000 ppm. 제2항에 있어서, 일반식(I)의 다가 알콜 또는 그의 산화 물질이 1~15,000ppm의 양으로 존재하는 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 2, wherein the polyhydric alcohol of formula (I) or an oxidizing substance thereof is present in an amount of 1 to 15,000 ppm. 제1항에 있어서, 포스폰산 킬레이트화제가 1ppb~1,000ppm의 양으로 존재하는 반도체 기판 세정용 세정액.The cleaning liquid for cleaning a semiconductor substrate according to claim 1, wherein the phosphonic acid chelating agent is present in an amount of 1 ppb to 1,000 ppm. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930003663A 1992-03-11 1993-03-11 Cleaning solution for semiconductor substrate KR100225147B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP05258092A JP3435698B2 (en) 1992-03-11 1992-03-11 Cleaning liquid for semiconductor substrates
JP92-52580 1992-03-11

Publications (2)

Publication Number Publication Date
KR930020599A true KR930020599A (en) 1993-10-20
KR100225147B1 KR100225147B1 (en) 1999-10-15

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303936B1 (en) * 1997-10-28 2001-10-17 포만 제프리 엘 Method for cleaning semiconductor devices
KR100366623B1 (en) * 2000-07-18 2003-01-09 삼성전자 주식회사 Method for cleaning semiconductor substrate or LCD substrate

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19525521B4 (en) * 1994-07-15 2007-04-26 Lam Research Corp.(N.D.Ges.D.Staates Delaware), Fremont Process for cleaning substrates
JP3039493B2 (en) * 1997-11-28 2000-05-08 日本電気株式会社 Substrate cleaning method and cleaning solution
JP3003684B1 (en) 1998-09-07 2000-01-31 日本電気株式会社 Substrate cleaning method and substrate cleaning liquid
JP5429104B2 (en) * 1998-12-28 2014-02-26 日立化成株式会社 Polishing liquid for metal and polishing method using the same
EP1150341A4 (en) 1998-12-28 2005-06-08 Hitachi Chemical Co Ltd Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
JP4816836B2 (en) * 1998-12-28 2011-11-16 日立化成工業株式会社 Polishing liquid for metal and polishing method using the same
JP4516176B2 (en) * 1999-04-20 2010-08-04 関東化学株式会社 Substrate cleaning solution for electronic materials
JP3767787B2 (en) * 1999-11-19 2006-04-19 東京エレクトロン株式会社 Polishing apparatus and method
TWI339680B (en) * 2002-02-19 2011-04-01 Kanto Kagaku Washing liquid composition for semiconductor substrate
EP1564797B1 (en) * 2002-11-08 2016-07-27 Fujimi Incorporated Polishing composition and rinsing composition
JP2004182773A (en) * 2002-11-29 2004-07-02 Nec Electronics Corp Liquid composition for cleaning hydrophobic substrate
KR100679008B1 (en) * 2005-05-18 2007-02-06 유청 Cleaning composition for semiconductor device
KR100898027B1 (en) 2005-10-04 2009-05-19 가부시키가이샤 아데카 Detergent composition for alkali development apparatus
JP5399308B2 (en) * 2010-03-30 2014-01-29 Ｊｘ日鉱日石金属株式会社 Pretreatment liquid for electroless plating on semiconductor wafer, electroless plating method, and semiconductor device
WO2017188325A1 (en) * 2016-04-28 2017-11-02 富士フイルム株式会社 Composition, composition housing, and method for manufacturing composition
KR101910157B1 (en) 2018-08-06 2018-10-19 영창케미칼 주식회사 The process liquid composiition for treating organic/inorganic hybrid photoresist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303936B1 (en) * 1997-10-28 2001-10-17 포만 제프리 엘 Method for cleaning semiconductor devices
KR100366623B1 (en) * 2000-07-18 2003-01-09 삼성전자 주식회사 Method for cleaning semiconductor substrate or LCD substrate

Also Published As

Publication number Publication date
JP3435698B2 (en) 2003-08-11
KR100225147B1 (en) 1999-10-15
JPH05259140A (en) 1993-10-08

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