KR930018775U - Photoresist mist discharge device of photoresist coating system - Google Patents

Photoresist mist discharge device of photoresist coating system

Info

Publication number
KR930018775U
KR930018775U KR2019920000373U KR920000373U KR930018775U KR 930018775 U KR930018775 U KR 930018775U KR 2019920000373 U KR2019920000373 U KR 2019920000373U KR 920000373 U KR920000373 U KR 920000373U KR 930018775 U KR930018775 U KR 930018775U
Authority
KR
South Korea
Prior art keywords
photoresist
discharge device
coating system
mist discharge
photoresist coating
Prior art date
Application number
KR2019920000373U
Other languages
Korean (ko)
Other versions
KR0121219Y1 (en
Inventor
장종환
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR92000373U priority Critical patent/KR0121219Y1/en
Publication of KR930018775U publication Critical patent/KR930018775U/en
Application granted granted Critical
Publication of KR0121219Y1 publication Critical patent/KR0121219Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR92000373U 1992-01-14 1992-01-14 Discharging apparatus of photo resist mist in photo resist coater system KR0121219Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92000373U KR0121219Y1 (en) 1992-01-14 1992-01-14 Discharging apparatus of photo resist mist in photo resist coater system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92000373U KR0121219Y1 (en) 1992-01-14 1992-01-14 Discharging apparatus of photo resist mist in photo resist coater system

Publications (2)

Publication Number Publication Date
KR930018775U true KR930018775U (en) 1993-08-21
KR0121219Y1 KR0121219Y1 (en) 1998-08-01

Family

ID=19327811

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92000373U KR0121219Y1 (en) 1992-01-14 1992-01-14 Discharging apparatus of photo resist mist in photo resist coater system

Country Status (1)

Country Link
KR (1) KR0121219Y1 (en)

Also Published As

Publication number Publication date
KR0121219Y1 (en) 1998-08-01

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Legal Events

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Payment date: 20060320

Year of fee payment: 9

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