KR970046603U - Photosensitive agent recovery device of photosensitive agent coating equipment - Google Patents
Photosensitive agent recovery device of photosensitive agent coating equipmentInfo
- Publication number
- KR970046603U KR970046603U KR2019950038947U KR19950038947U KR970046603U KR 970046603 U KR970046603 U KR 970046603U KR 2019950038947 U KR2019950038947 U KR 2019950038947U KR 19950038947 U KR19950038947 U KR 19950038947U KR 970046603 U KR970046603 U KR 970046603U
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive agent
- recovery device
- coating equipment
- agent coating
- agent recovery
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950038947U KR0132208Y1 (en) | 1995-12-07 | 1995-12-07 | Collection apparatus of photoresist in photoresist coating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950038947U KR0132208Y1 (en) | 1995-12-07 | 1995-12-07 | Collection apparatus of photoresist in photoresist coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970046603U true KR970046603U (en) | 1997-07-31 |
KR0132208Y1 KR0132208Y1 (en) | 1999-02-01 |
Family
ID=19432490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950038947U KR0132208Y1 (en) | 1995-12-07 | 1995-12-07 | Collection apparatus of photoresist in photoresist coating apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0132208Y1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100845258B1 (en) * | 2002-07-13 | 2008-07-10 | 엘지디스플레이 주식회사 | System and method of recovering photo resist and it's remaking method using the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100475731B1 (en) * | 1997-09-13 | 2005-07-05 | 삼성전자주식회사 | Photoresist Injection Control System |
-
1995
- 1995-12-07 KR KR2019950038947U patent/KR0132208Y1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100845258B1 (en) * | 2002-07-13 | 2008-07-10 | 엘지디스플레이 주식회사 | System and method of recovering photo resist and it's remaking method using the same |
Also Published As
Publication number | Publication date |
---|---|
KR0132208Y1 (en) | 1999-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20040820 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |