KR930007506U - 웨이퍼 세정 장치 - Google Patents

웨이퍼 세정 장치

Info

Publication number
KR930007506U
KR930007506U KR2019910014933U KR910014933U KR930007506U KR 930007506 U KR930007506 U KR 930007506U KR 2019910014933 U KR2019910014933 U KR 2019910014933U KR 910014933 U KR910014933 U KR 910014933U KR 930007506 U KR930007506 U KR 930007506U
Authority
KR
South Korea
Prior art keywords
cleaning device
wafer cleaning
wafer
cleaning
Prior art date
Application number
KR2019910014933U
Other languages
English (en)
Other versions
KR940005223Y1 (ko
Inventor
최원욱
이석만
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019910014933U priority Critical patent/KR940005223Y1/ko
Publication of KR930007506U publication Critical patent/KR930007506U/ko
Application granted granted Critical
Publication of KR940005223Y1 publication Critical patent/KR940005223Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019910014933U 1991-09-13 1991-09-13 웨이퍼 세정 장치 KR940005223Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019910014933U KR940005223Y1 (ko) 1991-09-13 1991-09-13 웨이퍼 세정 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019910014933U KR940005223Y1 (ko) 1991-09-13 1991-09-13 웨이퍼 세정 장치

Publications (2)

Publication Number Publication Date
KR930007506U true KR930007506U (ko) 1993-04-26
KR940005223Y1 KR940005223Y1 (ko) 1994-08-05

Family

ID=19319241

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019910014933U KR940005223Y1 (ko) 1991-09-13 1991-09-13 웨이퍼 세정 장치

Country Status (1)

Country Link
KR (1) KR940005223Y1 (ko)

Also Published As

Publication number Publication date
KR940005223Y1 (ko) 1994-08-05

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Legal Events

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