KR920020630A - 평판표시소자용 기판예비처리장치 - Google Patents
평판표시소자용 기판예비처리장치 Download PDFInfo
- Publication number
- KR920020630A KR920020630A KR1019910005321A KR910005321A KR920020630A KR 920020630 A KR920020630 A KR 920020630A KR 1019910005321 A KR1019910005321 A KR 1019910005321A KR 910005321 A KR910005321 A KR 910005321A KR 920020630 A KR920020630 A KR 920020630A
- Authority
- KR
- South Korea
- Prior art keywords
- preliminary processing
- housing
- flat panel
- panel display
- substrate preliminary
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims 3
- 239000000126 substance Substances 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000007664 blowing Methods 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 238000005192 partition Methods 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Liquid Crystal (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 구성을 개략적으로 도시한 측단면도.
Claims (3)
- 하우징(1) 내부에 이 하우징(1)의 내벽과 이격되게 제1 통로(2)를 형성하도록되면서 양쪽 측벽에 다수의 관통구멍(9)이 뚫려진 내부케이스(5)가 설치되고, 이 내부케이스(5)의 하부와 이격되게 제2 통로(6)를 형성하도록 히이터(8)가 내장된 약품저장조(7)가 갖춰지며, 상기 내부케이스(5)의 상, 하부에는 격벽(10)을 사이에 두고 자외선램프(10)가 설치되는 한편, 상기 약품저장조(7)의 방출관(14)에 송풍팬(15)이 갖춰진 평판표시소자용 기판예비처리장치.
- 제1항에 있어서, 상기 하우징(1)에는 하우징(1)내부를 진공상태로 만들어주도록 진공펌프(12)가 연결된 것을 특징으로 하는 평판표시소자용 기판예비처리장치.
- 제1항에 있어서, 상기 내부케이스(5)와 약품저장조(7) 사이의 제2통로(6)에 산소공급관(16)이 연결된 것을 특징으로 하는 평판표시소자용 기판예비처리장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910005321A KR930007972B1 (ko) | 1991-04-02 | 1991-04-02 | 평판표시소자용 기판예비처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910005321A KR930007972B1 (ko) | 1991-04-02 | 1991-04-02 | 평판표시소자용 기판예비처리장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920020630A true KR920020630A (ko) | 1992-11-21 |
KR930007972B1 KR930007972B1 (ko) | 1993-08-25 |
Family
ID=19312841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910005321A KR930007972B1 (ko) | 1991-04-02 | 1991-04-02 | 평판표시소자용 기판예비처리장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR930007972B1 (ko) |
-
1991
- 1991-04-02 KR KR1019910005321A patent/KR930007972B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR930007972B1 (ko) | 1993-08-25 |
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G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20100812 Year of fee payment: 18 |
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EXPY | Expiration of term |