KR920001027B1 - 제1물체와 제2물체를 광학적으로 위치맞춤하는 방법 및 장치 - Google Patents

제1물체와 제2물체를 광학적으로 위치맞춤하는 방법 및 장치 Download PDF

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Publication number
KR920001027B1
KR920001027B1 KR1019880002365A KR880002365A KR920001027B1 KR 920001027 B1 KR920001027 B1 KR 920001027B1 KR 1019880002365 A KR1019880002365 A KR 1019880002365A KR 880002365 A KR880002365 A KR 880002365A KR 920001027 B1 KR920001027 B1 KR 920001027B1
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South Korea
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mark
bars
pair
reticle
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Expired
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KR1019880002365A
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Korean (ko)
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KR880011885A (ko
Inventor
도오루 도오조오
미쯔오 다바다
히사가즈 요시노
Original Assignee
가부시기가이샤 도오시바
도리 스기이찌로오
가부시기가이샤 토프콘
모도기 마사요시
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Publication of KR880011885A publication Critical patent/KR880011885A/ko
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Publication of KR920001027B1 publication Critical patent/KR920001027B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1019880002365A 1987-03-11 1988-03-07 제1물체와 제2물체를 광학적으로 위치맞춤하는 방법 및 장치 Expired KR920001027B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62054123A JPS63221616A (ja) 1987-03-11 1987-03-11 マスク・ウエハの位置合わせ方法
JP54123 1987-03-11

Publications (2)

Publication Number Publication Date
KR880011885A KR880011885A (ko) 1988-10-31
KR920001027B1 true KR920001027B1 (ko) 1992-02-01

Family

ID=12961821

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880002365A Expired KR920001027B1 (ko) 1987-03-11 1988-03-07 제1물체와 제2물체를 광학적으로 위치맞춤하는 방법 및 장치

Country Status (3)

Country Link
US (1) US4808002A (https=)
JP (1) JPS63221616A (https=)
KR (1) KR920001027B1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5340992A (en) * 1988-02-16 1994-08-23 Canon Kabushiki Kaisha Apparatus and method of detecting positional relationship using a weighted coefficient
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
JP2000260699A (ja) * 1999-03-09 2000-09-22 Canon Inc 位置検出装置及び該位置検出装置を用いた半導体露光装置
US8903516B2 (en) * 2012-09-04 2014-12-02 United Technologies Corporation Visual alignment system and method for workpiece marking

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525602B2 (https=) * 1973-05-10 1980-07-07
US4568189A (en) * 1983-09-26 1986-02-04 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for aligning a mask and wafer in the fabrication of integrated circuits
US4643579A (en) * 1983-11-21 1987-02-17 Canon Kabushiki Kaisha Aligning method

Also Published As

Publication number Publication date
US4808002A (en) 1989-02-28
KR880011885A (ko) 1988-10-31
JPS63221616A (ja) 1988-09-14
JPH0519297B2 (https=) 1993-03-16

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