KR910020938A - MOS transistor manufacturing method with LDD structure - Google Patents

MOS transistor manufacturing method with LDD structure Download PDF

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Publication number
KR910020938A
KR910020938A KR1019900006471A KR900006471A KR910020938A KR 910020938 A KR910020938 A KR 910020938A KR 1019900006471 A KR1019900006471 A KR 1019900006471A KR 900006471 A KR900006471 A KR 900006471A KR 910020938 A KR910020938 A KR 910020938A
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KR
South Korea
Prior art keywords
gate
transistor manufacturing
ldd structure
polygate
poly
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KR1019900006471A
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Korean (ko)
Inventor
구정석
이혁재
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문정환
금성일렉트론 주식회사
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Priority to KR1019900006471A priority Critical patent/KR910020938A/en
Publication of KR910020938A publication Critical patent/KR910020938A/en

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Abstract

내용 없음No content

Description

LDD 구조를 갖는 모스 트랜지스터 제조방법MOS transistor manufacturing method with LDD structure

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제3도는 제2도의 제조공정을 나타낸 단면도.3 is a cross-sectional view showing the manufacturing process of FIG.

Claims (2)

P형 기판(1)위에 게이트 산화막(2)을 성장시키고 N+폴리게이트(3), TiN층(4), N-폴리게이트(5)를 차례로 디포지션한 후 마스크를 사용하여 N+폴리게이트(5)와 TiN층(4)을 에치하고 다시 마스크를 사용하여 N+폴리게이트(3)을 에치시키므로 N+폴리게이트(5), TiN층(4), N+폴리게이트(3)로 이루어지는 역 T형 구조의 게이트를 형성한 후 N+이온주입으로 N-도핑영역(6)과 N+도핑영역(7)을 형성함을 특징으로 하는 LDD 구조를 갖는 모스 트랜지스터 제조방법.The gate oxide film 2 is grown on the P-type substrate 1, and the N + polygate 3, the TiN layer 4, and the N - polygate 5 are sequentially deposited, and then a N + polygate is formed using a mask. 5 and etch the TiN layer 4, and because the etch back to N + poly gate (3) by using the mask N + composed of a poly gate 5, a TiN layer (4), N + poly gate 3 And forming an N - doped region (6) and an N + doped region (7) by N + ion implantation after forming a gate of an inverted T-type structure. 제1항에 있어서, N-도핑영역(6)은 N+폴리게이트(3)에 의해 가려진 부분에 그리고 N+도핑영역(4)은 노출된 부분에 각각 형성됨을 특징으로 하는 LDD 구조를 갖는 모스 트랜지스터 제조방법.According to claim 1, N - doped region (6) N + poly-in part masked by the gate (3) and N + doped regions (4) are having the LDD structure, characterized by each formed on the exposed portion Moss Transistor manufacturing method. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900006471A 1990-05-08 1990-05-08 MOS transistor manufacturing method with LDD structure KR910020938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900006471A KR910020938A (en) 1990-05-08 1990-05-08 MOS transistor manufacturing method with LDD structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900006471A KR910020938A (en) 1990-05-08 1990-05-08 MOS transistor manufacturing method with LDD structure

Publications (1)

Publication Number Publication Date
KR910020938A true KR910020938A (en) 1991-12-20

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KR1019900006471A KR910020938A (en) 1990-05-08 1990-05-08 MOS transistor manufacturing method with LDD structure

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KR (1) KR910020938A (en)

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