KR910015883A - 감광성 필름 형성 공중합체 및 그로 구성되는 조성물 및 그로써 네가티브 또는 포지티브 사진 상을 제조하는 방법 - Google Patents

감광성 필름 형성 공중합체 및 그로 구성되는 조성물 및 그로써 네가티브 또는 포지티브 사진 상을 제조하는 방법 Download PDF

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Publication number
KR910015883A
KR910015883A KR1019910002477A KR910002477A KR910015883A KR 910015883 A KR910015883 A KR 910015883A KR 1019910002477 A KR1019910002477 A KR 1019910002477A KR 910002477 A KR910002477 A KR 910002477A KR 910015883 A KR910015883 A KR 910015883A
Authority
KR
South Korea
Prior art keywords
copolymer
group
photosensitive
composition
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019910002477A
Other languages
English (en)
Korean (ko)
Inventor
우 쳉지우
엠 무어링 앤
티이 야아들리 제임즈
Original Assignee
우 쳉지우
엠 무어링 앤
티이 야아들리 제임즈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 우 쳉지우, 엠 무어링 앤, 티이 야아들리 제임즈 filed Critical 우 쳉지우
Publication of KR910015883A publication Critical patent/KR910015883A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
KR1019910002477A 1990-02-16 1991-02-13 감광성 필름 형성 공중합체 및 그로 구성되는 조성물 및 그로써 네가티브 또는 포지티브 사진 상을 제조하는 방법 Withdrawn KR910015883A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48073390A 1990-02-16 1990-02-16
US480733 1990-02-16

Publications (1)

Publication Number Publication Date
KR910015883A true KR910015883A (ko) 1991-09-30

Family

ID=23909140

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910002477A Withdrawn KR910015883A (ko) 1990-02-16 1991-02-13 감광성 필름 형성 공중합체 및 그로 구성되는 조성물 및 그로써 네가티브 또는 포지티브 사진 상을 제조하는 방법

Country Status (3)

Country Link
EP (1) EP0442755A3 (enExample)
KR (1) KR910015883A (enExample)
TW (1) TW207574B (enExample)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136110A3 (en) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive photosensitive compositions useful as photoresists
US4596763A (en) * 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS63167351A (ja) * 1986-12-22 1988-07-11 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン フォトレジスト組成物
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand

Also Published As

Publication number Publication date
EP0442755A2 (en) 1991-08-21
EP0442755A3 (en) 1991-10-23
TW207574B (enExample) 1993-06-11

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19910213

PG1501 Laying open of application
PC1202 Submission of document of withdrawal before decision of registration

Comment text: [Withdrawal of Procedure relating to Patent, etc.] Withdrawal (Abandonment)

Patent event code: PC12021R01D

Patent event date: 19920516

WITB Written withdrawal of application