KR910009952A - Evaporator for vacuum deposition using electron beam - Google Patents

Evaporator for vacuum deposition using electron beam Download PDF

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Publication number
KR910009952A
KR910009952A KR1019890016402A KR890016402A KR910009952A KR 910009952 A KR910009952 A KR 910009952A KR 1019890016402 A KR1019890016402 A KR 1019890016402A KR 890016402 A KR890016402 A KR 890016402A KR 910009952 A KR910009952 A KR 910009952A
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KR
South Korea
Prior art keywords
electron beam
filament
evaporator
vacuum deposition
shade
Prior art date
Application number
KR1019890016402A
Other languages
Korean (ko)
Inventor
차재영
Original Assignee
차재영
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 차재영 filed Critical 차재영
Priority to KR1019890016402A priority Critical patent/KR910009952A/en
Publication of KR910009952A publication Critical patent/KR910009952A/en

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  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음No content

Description

전자빔을 이용한 진공증착용 증발장치Evaporator for vacuum deposition using electron beam

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 요부 분해 사시도.1 is an exploded perspective view of main parts of the present invention.

제2도는 본 발명의 사시도.2 is a perspective view of the present invention.

제3도는 본 발명중 열전자 방출부의 분해사시도.Figure 3 is an exploded perspective view of the hot electron emission unit in the present invention.

Claims (1)

전자빔을 발생시켜 증발물질을 진공증착시키는 증발장치에 있어서, 편향 마그네트(9)에 의하여 일정한 열전자 방출이 일어나는 필라멘트(23)를 필라멘트 고정몸체(24)의 상측에서 고정핀(25)으로 고정지지시킨후 상기 필라멘트를 감싸는 보호갓(26)과, 상기 필라멘트(23)에서 발생된 전자빔을 크로시블(4)의 증발물질(34)로 유도하는 보조자기 유도부(2)와, 상기 필라멘트(23)의 전자빔에 의해 크로시블(4)의 상측에서 증발물질의 오염을 방지하도록하는 오염방지갓(6)과, 상기 오염방지갓(6)의 하측에서 수냉식 크로시블(1)을 기어(17)(32)에 의해 고정축(20)상에서 회전시키는 서보모타(M)를 구성시킨 전자빔을 이용한 진공증착용 증발장치.In an evaporation apparatus for generating an electron beam and vacuum evaporating material, the filament 23 in which constant hot electron emission is caused by the deflection magnet 9 is fixed and supported by the fixing pin 25 on the filament fixing body 24. After the protective guard 26 surrounding the filament, and the auxiliary magnetic induction unit 2 for guiding the electron beam generated from the filament 23 to the evaporation material 34 of the cross 4, and the filament 23 The anti-fouling shade 6 to prevent the contamination of the evaporation material on the upper side of the cross 4 by the electron beam of the gears, and the water-cooled swivel 1 under the anti-pollution shade 6, the gear 17 Evaporator for vacuum deposition using an electron beam consisting of a servo motor (M) for rotating on a fixed shaft (20) by the (32). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019890016402A 1989-11-10 1989-11-10 Evaporator for vacuum deposition using electron beam KR910009952A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890016402A KR910009952A (en) 1989-11-10 1989-11-10 Evaporator for vacuum deposition using electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890016402A KR910009952A (en) 1989-11-10 1989-11-10 Evaporator for vacuum deposition using electron beam

Publications (1)

Publication Number Publication Date
KR910009952A true KR910009952A (en) 1991-06-28

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ID=67660956

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890016402A KR910009952A (en) 1989-11-10 1989-11-10 Evaporator for vacuum deposition using electron beam

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KR (1) KR910009952A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101051728B1 (en) * 2008-10-02 2011-07-25 (주)브이티에스 Micro electron beam evaporation source
KR20160033181A (en) * 2013-07-18 2016-03-25 버글라스인더스트리 게엠베하 Glazing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101051728B1 (en) * 2008-10-02 2011-07-25 (주)브이티에스 Micro electron beam evaporation source
KR20160033181A (en) * 2013-07-18 2016-03-25 버글라스인더스트리 게엠베하 Glazing

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A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application