KR900702069A - Metal oxidation treatment device. - Google Patents

Metal oxidation treatment device.

Info

Publication number
KR900702069A
KR900702069A KR1019900700138A KR900700138A KR900702069A KR 900702069 A KR900702069 A KR 900702069A KR 1019900700138 A KR1019900700138 A KR 1019900700138A KR 900700138 A KR900700138 A KR 900700138A KR 900702069 A KR900702069 A KR 900702069A
Authority
KR
South Korea
Prior art keywords
gas
oxidation
oxidized
furnace
metal
Prior art date
Application number
KR1019900700138A
Other languages
Korean (ko)
Inventor
다다히로 오미
가즈히꼬 스기야마
후미오 나까하라
사또시 미조까미
Original Assignee
다다히로 오미
원본미기재
오사까 산소 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다다히로 오미, 원본미기재, 오사까 산소 고교 가부시끼가이샤 filed Critical 다다히로 오미
Publication of KR900702069A publication Critical patent/KR900702069A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

Metal oxidn. appts. for forming a passivation film on the surface of a bent pipe of a metal to be oxidised has a bent portion such as a stainless steel pipe. The appts. includes an oxidn. furnace, a gas inlet for introducing a gas into the oxidn. furnace, an exhaust port for discharging the gas from inside the furnace, a heater for heating the furnace to a predetermined temp. and a holder for fixing a tubular metal to be oxidised having a bent portion inside the furnace, the holder serving also as a connection joints. The inlet comes into contact with one of the ends of the bent metal pipe and the exhaust comes into contact with the other end. The bent metal pipe to be oxidised is heated and oxidised in a dry oxidising atmos. while a gas is being passed through the inside of the bent metal pipe to be oxidised.

Description

금속_산화 처리_장치Metal oxidation treatment equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 한 실시예를 도시한 산화 처리 장치의 개략도이고, 제2도 내지 제6도는 본 발명의 산화처리 장치의 조작 순서를 설명하는 도면.1 is a schematic diagram of an oxidation processing apparatus showing one embodiment of the present invention, and FIGS. 2 to 6 illustrate an operation procedure of the oxidation processing apparatus of the present invention.

Claims (5)

산화로, 산화로내에 가스를 도입하기 위한 가스의 도입구, 산화로 내로부터 가스를 배기하기 위한 배기구, 산화로를 소정의 온도로 가열하는 가열기, 굴곡부를 갖는 관상의 피산화 처리 금속(이하, 피산화 처리 금속 곡관이라 칭함)을 산화로내에 고정하는 접속부를 겸비한 홀더를 가지며, 도입구가 피산화 처리 금속 곡관의 한쪽 단부에 접하도록 배치되어 있으며, 배기구가 피산화 처리 금속 곡관의 다른 단부에 접하도록 배치되어 있으며, 피산화 처리 금속 곡관의 내부에 가스를 흐르게 하면서 건조 산화 분위기에서 피산화 처리 금속 곡관을 가열 산화하도록 한 것을 특징으로 하는, 굴곡부를 갖는 스텐레스 강판등의 피산화 처리 금속 곡관의 표면에 부동태막을 형성하기 위한 금속 산화 처리 장치.An oxidation inlet, a gas inlet for introducing gas into the oxidation furnace, an exhaust port for exhausting gas from the oxidation furnace, a heater for heating the oxidation furnace to a predetermined temperature, a tubular oxidation-treated metal having a bent portion (hereinafter, A holder having a connecting portion for fixing the metallized pipe to be oxidized in the oxidation furnace, the inlet is arranged to be in contact with one end of the metallized pipe to be oxidized, and the exhaust port is arranged at the other end of the metallized pipe to be oxidized. Arranged to be in contact with each other, wherein the oxidized metal curved tube is heated and oxidized in a dry oxidizing atmosphere while gas flows inside the oxidized metallic curved tube. Metal oxidation treatment apparatus for forming a passivation film on the surface. 제1항에 있어서, 피산화 처리 금속 곡관의 한쪽 단부에 접하지 않도록 배치된 산화로 내에 파아지용 가스를 도입하기 위한 상기 도입구와는 별도의 다른 도입구 및 피산화 처리 금속 곡관의 다른 단부에 접하지 않도록 배치된 산화로 내로부터 가스를 배기하기 위한 상기 배기구와는 별도의 다른 배기구를 가지며, 피산화 처리 금속 곡관의 외측이 산화되는 것을 방지하도록 한 것을 특징으로 하는 금속 산화처리 장치.The inlet other than the inlet for introducing gas for phage into an oxidation furnace arranged so as not to be in contact with one end of the oxidized metal bend and the other end of the oxidized metal bend. And an exhaust port separate from the exhaust port for exhausting gas from the oxidation furnace arranged so as not to be oxidized, wherein the outside of the oxidation-treated metal curved pipe is prevented from being oxidized. 제1항 또는 제2항에 있어서, 피산화 처리 금속 곡관을 산화로 내에 배치 또는 고정할 때에는 산화로를 배기구, 또는 상기 배기구 및 다른 배기구 측으로부터 개방하는 구성으로 되어 있고, 도입구, 또는 상기 도입구 및 다른 도입구로 개방시에 파아지용 가스를 도입하기 위한 파아지용 가스 라인이 접속되어 있으며, 피산화 처리 금속 곡관을 산화로 내에 배치 또는 고정할때 대기에 노출되는 것을 방지하도록 한 것을 특징으로 하는 금속 산화 처리장치.The method according to claim 1 or 2, wherein the oxidation furnace is opened from the exhaust port, or the exhaust port and other exhaust ports when arranging or fixing the oxidation-treated metal curved pipe in the oxidation furnace. A phage gas line for introducing phage gas upon opening to a sphere and other inlets is connected, and is configured to prevent exposure to the atmosphere when placing or fixing an oxidation-treated metal curved tube in an oxidation furnace. Metal oxidation treatment equipment. 제1항 내지 제3항중 어느 하나에 있어서, 가스의 도입구에 파아지용 가스와 산화 처리 분위기 가스를 교체할 수 있는 시스템으로 한 가스 라인이 접속되어 있고, 가스라인의 파아지용 가스 라인과 산화 처리 분위기 가스 라인종 산화로에 가스를 공급하지 않는 라인을 항상 배기하는 수단을 가지며, 산화처리 분위기를 고청정하게 유지하도록 한 것을 특징으로 하는 금속 산화 처리 장치.4. The gas line according to any one of claims 1 to 3, wherein a gas line having a system capable of replacing a phage gas and an oxidizing atmosphere gas is connected to the gas inlet. A metal oxidation processing apparatus comprising means for always evacuating a line which does not supply gas to an atmospheric gas line type oxidation furnace, to maintain an oxidation treatment atmosphere in a high cleanness. 제1항 내지 제4항중 어느 하나에 있어서, 도입구, 또는 상기 도입구 및 다른 도입구에 접속된 산화 처리 분위기 가스 라인 및 파아지용 가스라인에 가열히가 설치되어 있고, 산화로 내에 공급하는 가스의 온도를 산화처리 분위기의 온도까지 가열하도록 한 것을 특징으로 하는 금속 산화 처리 장치.The gas supplied in the oxidation furnace of any one of Claims 1-4 in which the heating furnace is provided in the inlet port, or the oxidation processing atmosphere gas line and phage gas line connected to the said inlet port and the other inlet port, The metal oxidation treatment apparatus characterized by heating the temperature of to to the temperature of an oxidation treatment atmosphere. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900700138A 1988-08-17 1990-01-24 Metal oxidation treatment device. KR900702069A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP203102/88 1988-08-17
JP63203102A JPH0254751A (en) 1988-08-17 1988-08-17 Metallic oxidation treatment apparatus
PCT/JP1989/000824 WO1990002212A1 (en) 1988-08-17 1989-08-14 Metal oxidation apparatus

Publications (1)

Publication Number Publication Date
KR900702069A true KR900702069A (en) 1990-12-05

Family

ID=16468423

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900700138A KR900702069A (en) 1988-08-17 1990-01-24 Metal oxidation treatment device.

Country Status (7)

Country Link
US (1) US5224998A (en)
EP (1) EP0386257B1 (en)
JP (1) JPH0254751A (en)
KR (1) KR900702069A (en)
AT (1) ATE113323T1 (en)
DE (1) DE68919070T2 (en)
WO (1) WO1990002212A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5591267A (en) * 1988-01-11 1997-01-07 Ohmi; Tadahiro Reduced pressure device
US5569334A (en) * 1992-12-08 1996-10-29 Hitachi Metals, Ltd. Stainless steel member for semiconductor fabrication equipment and surface treatment method therefor
DE19502777A1 (en) * 1994-02-22 1995-08-24 Siemens Ag Method for plasma-assisted backside etching of a semiconductor wafer in the case of a lacquer-free front surface of a pane
JP2987754B2 (en) * 1996-01-17 1999-12-06 岩谷産業株式会社 Passivation treatment method for high purity gas in piping
DE69717182T2 (en) 1996-03-07 2003-07-24 Tadahiro Ohmi An excimer laser
JP3874123B2 (en) * 1996-03-07 2007-01-31 キヤノン株式会社 Discharge electrode, excimer laser oscillation device and stepper
US6503347B1 (en) 1996-04-30 2003-01-07 Surface Engineered Products Corporation Surface alloyed high temperature alloys
CA2175439C (en) 1996-04-30 2001-09-04 Sabino Steven Anthony Petrone Surface alloyed high temperature alloys
JP4125406B2 (en) 1997-08-08 2008-07-30 忠弘 大見 Welding method, refluorination passivation treatment method and welded part of welding member subjected to fluorination passivation treatment
CA3051675C (en) 2012-03-23 2021-07-06 Kubota Corporation Cast product having alumina barrier layer and method for producing same
JP6005963B2 (en) * 2012-03-23 2016-10-12 株式会社クボタ Method for producing a cast product having an alumina barrier layer
JP2019151892A (en) * 2018-03-02 2019-09-12 東京エレクトロン株式会社 Processing method for metal member, processing apparatus, and evaluation method
CN111843407B (en) * 2020-07-29 2021-11-02 扬州大学 Nitriding device and nitriding processing method for 304 stainless steel spiral reamer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2783164A (en) * 1953-09-17 1957-02-26 Nat Res Corp Method of coating a metal substrate with molybdenum
US2815299A (en) * 1955-10-24 1957-12-03 Nat Res Corp Method of producing an adherent molybdenum coating on a metal substrate
US3031338A (en) * 1959-04-03 1962-04-24 Alloyd Res Corp Metal deposition process and apparatus
DE2536446C2 (en) * 1975-08-16 1985-01-10 Uranit GmbH, 5170 Jülich Device for carrying out a method for forming a corrosion-preventing, oxidic protective layer on corrosion-sensitive steels
DE2718518C3 (en) * 1977-04-26 1984-04-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for depositing a layer on the inside of cavities in a workpiece
US4138512A (en) * 1977-10-17 1979-02-06 The United States Of America As Represented By The Secretary Of The Army Process for chemical vapor deposition of a homogeneous alloy of refractory metals
US4293594A (en) * 1980-08-22 1981-10-06 Westinghouse Electric Corp. Method for forming conductive, transparent coating on a substrate
US4636266A (en) * 1984-06-06 1987-01-13 Radiological & Chemical Technology, Inc. Reactor pipe treatment
JPH0680183B2 (en) * 1984-09-26 1994-10-12 株式会社東芝 Inner nitriding device for guide tube for reactor measuring element
FR2574221B1 (en) * 1984-12-05 1988-06-24 Montaudon Patrick METHOD AND DEVICE FOR THE CHEMICAL ATTACK ON A SINGLE SIDE OF A SUBSTRATE
JPS61194168A (en) * 1985-02-20 1986-08-28 Ishikawajima Harima Heavy Ind Co Ltd Treatment for passivation of stainless steel pipe
JPS61281864A (en) * 1985-06-07 1986-12-12 Nisshin Steel Co Ltd Stainless steel strip provided with temper color and its manufacture
DE3614444A1 (en) * 1986-04-29 1987-01-02 Reiner Sarnes Process for oxidising sintered iron parts
GB8925421D0 (en) * 1989-11-10 1989-12-28 Boc Group Plc Shaft sealing arrangements

Also Published As

Publication number Publication date
JPH0548295B2 (en) 1993-07-21
JPH0254751A (en) 1990-02-23
EP0386257A4 (en) 1990-10-03
EP0386257A1 (en) 1990-09-12
ATE113323T1 (en) 1994-11-15
DE68919070T2 (en) 1995-04-20
WO1990002212A1 (en) 1990-03-08
DE68919070D1 (en) 1994-12-01
EP0386257B1 (en) 1994-10-26
US5224998A (en) 1993-07-06

Similar Documents

Publication Publication Date Title
KR900702069A (en) Metal oxidation treatment device.
KR910003758A (en) Vertical type processing device and processing method
DE68919084T2 (en) METAL OXYDING ARRANGEMENT AND METHOD.
KR930016142A (en) Oxidation Diffusion Processing Equipment
KR920018875A (en) Heat treatment device
EP0614216A4 (en) Apparatus for forming oxide film, heat treatment apparatus, semiconductor device, manufacturing method therefor.
KR910003767A (en) Heat treatment device
ES509939A0 (en) "QUICK REFRIGERATION DEVICE OF HOT METAL TUBES".
JPH1183172A (en) Fluid heater
KR950704659A (en) GAS HEATER FOR PROCESSING GASES
KR900005572A (en) Processing method
JPS56115524A (en) Heat treatment of semiconductor wafer
KR930703477A (en) Passivation Processor
JP2001330377A (en) Heat treatment furnace having gas leakage preventive function
FR2420109A2 (en) Heat treatment oven for workpiece giving off coating solvent - has several zones from which gases are removed continuously, and incinerator at upstream zone
JP2000252621A (en) Reflow apparatus
JPH07297181A (en) Method and apparatus for thermal oxidation treatment
JPS57164525A (en) Device conveying semiconductor wafer into core tube of furnace
JPH0571751U (en) Gas sampling device
JPS6254169B2 (en)
Cosnier et al. An Industrial" First": Use of Radiant Tubes With Direct Passage of Current. Electrification of a Carbonitriding Line on an Existing Furnace
JPS5632721A (en) Heat treating device
JPS5624938A (en) High pressure oxidizing apparatus
JPS62115711A (en) Processing device
JPS5539102A (en) Evacuation method of tubular lamp

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application