KR900018418A - 베스내에서 퍼망가네이트를 재생시키는 방법 및 장치 - Google Patents

베스내에서 퍼망가네이트를 재생시키는 방법 및 장치 Download PDF

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Publication number
KR900018418A
KR900018418A KR1019900006319A KR900006319A KR900018418A KR 900018418 A KR900018418 A KR 900018418A KR 1019900006319 A KR1019900006319 A KR 1019900006319A KR 900006319 A KR900006319 A KR 900006319A KR 900018418 A KR900018418 A KR 900018418A
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KR
South Korea
Prior art keywords
ratio
bath
permanganate
vessel
anode
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Application number
KR1019900006319A
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English (en)
Inventor
에이. 크루릭 제럴드
케이. 두피 존
Original Assignee
제럴드 켄트 화이트
몰튼 인터네쇼날, 인코오포레이티드
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Application filed by 제럴드 켄트 화이트, 몰튼 인터네쇼날, 인코오포레이티드 filed Critical 제럴드 켄트 화이트
Publication of KR900018418A publication Critical patent/KR900018418A/ko

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22—Roughening, e.g. by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/21—Manganese oxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes

Abstract

내용 없음

Description

베스내에서 퍼망가네이트를 재생시키는 방법 및 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 실시예 유용한 전극의 측면선도, 제2도는 제1도의 2-2라인에 따른 단면도.

Claims (14)

  1. 알카리 금속 망가네이트 및 물을 포함하는 베스내에서 퍼망가네이트를 생성시키는 방법에 있어서, 양극의 침수 표면적대 음극의 침수 표면적의 비가 5 : 1이상이 되도록 양극 및 음극을 상기 베스내에 잡입시키는 단계; 및 상기 양극에서 망가네이트를 퍼망가네이트로 전환시키고 상기 음극에서 수소 가스를 생성시키도록 상기 양극 및 상기 음극 사이에 충분한 포텐샬 차이를 부가하는 단계를 포함하는 것을 특징으로 하는 방법.
  2. 제1항에 있어서, 상기 포텐샬 차이는 적어도 2volts인 것을 특징으로 하는 방법.
  3. 제1항에 있어서, 상기 포텐샬 차이는 적어도 4volts인 것을 특징으로 하는 방법.
  4. 제1항에 있어서, 상기 비율은 12 : 1이상인 것을 특징으로 하는 방법.
  5. 제1항에 있어서, 상기 비율은 30 : 1이상인 것을 특징으로 하는 방법.
  6. 제1항에 있어서, 상기 비율은 60 : 1이상인 것을 특징으로 하는 방법.
  7. 제1항에 있어서, 산화 가능한 내부의 물질을 산화시킴으로써 상기 퍼망가네이트 베스를 소모시키는 예비단계를 포함하는 것을 특징으로 하는 방법.
  8. 제7항에 있어서, 상기 소모, 잠입, 부가 단계가 동시에 행해지며 따라서, 상기 베스내에 실제적으로 일정한 퍼망가네이트 및 망가네이트 농도가 유지되는 것을 특징으로 하는 방법.
  9. 퍼망가네이트 베스를 재생시키는 장치에 있어서, 베스 및, 기전력 소스에 연결되고 잠입 가능한 부분을 베셀내에 위치시키는 양극과 음극을 수용하는 베셀을 포함하는데 상기 양극의 잠입 가능 면적대 상기 음극의 잠입 가능 면적의 비는 5 : 1이상인 것으로 특징으로 하는 장치.
  10. 제9항에 있어서, 상기 비율은 12 : 1이상인 것을 특징으로 하는 장치.
  11. 제9항에 있어서, 상기 비율은 30 : 1이상인 것을 특징으로 하는 장치.
  12. 제9항에 있어서, 상기 비율은 60 : 1이상인 것을 특징으로 하는 장치.
  13. 제9항에 있어서, 상기 베셀은 전기적으로 전도성인 베스 수용 표면을 갖고, 그의 적어도 일부는 상기 양극의 상기 잠입 가능 부분으로 정의되는 것을 특징으로 하는 장치.
  14. 제9항에 있어서, 상기 양극 및 음극은 단일 셀내에 배치되는 것을 특징으로 하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900006319A 1989-05-05 1990-05-04 베스내에서 퍼망가네이트를 재생시키는 방법 및 장치 KR900018418A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US34785989A 1989-05-05 1989-05-05
US07/347,859 1989-05-05
US39343389A 1989-08-14 1989-08-14
US07/393,433 1989-08-14

Publications (1)

Publication Number Publication Date
KR900018418A true KR900018418A (ko) 1990-12-21

Family

ID=26995453

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900006319A KR900018418A (ko) 1989-05-05 1990-05-04 베스내에서 퍼망가네이트를 재생시키는 방법 및 장치

Country Status (6)

Country Link
EP (1) EP0396252A1 (ko)
JP (1) JPH02301582A (ko)
KR (1) KR900018418A (ko)
AU (1) AU5250490A (ko)
CA (1) CA2013123A1 (ko)
NO (1) NO901781L (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2835811B2 (ja) * 1993-04-16 1998-12-14 株式会社荏原電産 マンガン酸塩から過マンガン酸塩への再生法およびその再生装置
JPH06306667A (ja) * 1993-04-16 1994-11-01 Ebara Densan:Kk アルカリ過マンガン酸塩溶液の電解再生装置
US5660712A (en) * 1995-06-07 1997-08-26 Carus, Iii; Paul Electrolytic production of potassium permanganate using a cationic membrane in an electrolytic cell
IL248600A0 (en) 2016-10-30 2017-02-01 Yeda Res & Dev A method for obtaining platinum group metals from spent catalysts
CN110438506A (zh) * 2019-07-08 2019-11-12 深圳市裕展精密科技有限公司 退镀液的再生制备方法
EP4105361A1 (en) * 2021-06-16 2022-12-21 Atotech Deutschland GmbH & Co. KG Method for oxidizing manganese species in a treatment device
EP4105362A1 (en) * 2021-06-16 2022-12-21 Atotech Deutschland GmbH & Co. KG Method for oxidizing manganese species in a treatment device and treatment device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1135219A (en) * 1965-12-20 1968-12-04 Elektrochemisches Kombinat Bitterfeld Veb Process for the electrolytic production of potassium permanganate
JPS5329160B2 (ko) * 1974-07-12 1978-08-18
DE3716013C2 (de) * 1987-05-11 1993-11-18 Schering Ag Verfahren zur Regenerierung von Permanganat-Ätzlösungen
US4859300A (en) * 1987-07-13 1989-08-22 Enthone, Incorporated Process for treating plastics with alkaline permanganate solutions

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Publication number Publication date
AU5250490A (en) 1990-11-08
CA2013123A1 (en) 1990-11-05
NO901781D0 (no) 1990-04-23
JPH02301582A (ja) 1990-12-13
EP0396252A1 (en) 1990-11-07
NO901781L (no) 1990-11-06

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