KR900012687A - 점성액체의 도포방법 및 도포장치 - Google Patents

점성액체의 도포방법 및 도포장치

Info

Publication number
KR900012687A
KR900012687A KR1019900001833A KR900001833A KR900012687A KR 900012687 A KR900012687 A KR 900012687A KR 1019900001833 A KR1019900001833 A KR 1019900001833A KR 900001833 A KR900001833 A KR 900001833A KR 900012687 A KR900012687 A KR 900012687A
Authority
KR
South Korea
Prior art keywords
viscous liquid
coating
coating method
coating device
liquid coating
Prior art date
Application number
KR1019900001833A
Other languages
English (en)
Other versions
KR970007060B1 (ko
Inventor
시게야스 나까자와
노부나리 나다모도
소이찌 마쓰오
미쓰루 이이다
Original Assignee
다이닛뽕 인사쓰 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이닛뽕 인사쓰 가부시끼가이샤 filed Critical 다이닛뽕 인사쓰 가부시끼가이샤
Publication of KR900012687A publication Critical patent/KR900012687A/ko
Application granted granted Critical
Publication of KR970007060B1 publication Critical patent/KR970007060B1/ko

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Filters (AREA)
  • Coating Apparatus (AREA)
KR1019900001833A 1989-02-17 1990-02-15 점성액체의 도포방법 및 도포장치 KR970007060B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1-37688 1988-02-17
JP3768889 1989-02-17

Publications (2)

Publication Number Publication Date
KR900012687A true KR900012687A (ko) 1990-09-01
KR970007060B1 KR970007060B1 (ko) 1997-05-02

Family

ID=12504514

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900001833A KR970007060B1 (ko) 1989-02-17 1990-02-15 점성액체의 도포방법 및 도포장치

Country Status (4)

Country Link
US (1) US5099782A (ko)
EP (1) EP0383356B1 (ko)
KR (1) KR970007060B1 (ko)
DE (1) DE69029099T2 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07284715A (ja) * 1994-04-15 1995-10-31 Dainippon Screen Mfg Co Ltd 処理液塗布装置及び処理液塗布方法
JP4118659B2 (ja) * 2001-12-03 2008-07-16 東京応化工業株式会社 基板用トレイ
JP4443393B2 (ja) * 2004-11-29 2010-03-31 東京応化工業株式会社 塗布装置、塗布方法および被膜形成装置
JP2022124070A (ja) * 2021-02-15 2022-08-25 株式会社Screenホールディングス 基板処理装置、および、筒状ガードの加工方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3219473A (en) * 1964-12-29 1965-11-23 Gen Plywood Corp Method of coating and smoothing wood surface
US3695928A (en) * 1970-12-07 1972-10-03 Western Electric Co Selective coating
US3941901A (en) * 1974-02-15 1976-03-02 Hoffmann-La Roche Inc. Surface alignment method for liquid crystal cells and production of polarizers therefor
US4315705A (en) * 1977-03-18 1982-02-16 Gca Corporation Apparatus for handling and treating wafers
GB2045463B (en) * 1979-04-03 1983-04-20 Hall Automation Ltd Arrangement for controlling an operation performed on a workpiece
SU1106546A1 (ru) * 1982-06-18 1984-08-07 Камское объединение по производству большегрузных автомобилей Устройство дл нанесени кле на изделие
JPS5987069A (ja) * 1982-11-08 1984-05-19 Fujitsu Ltd レジスト塗布装置
JPS59139035A (ja) * 1983-01-29 1984-08-09 Seiwa Kogyo Kk スクリ−ン型枠のスクリ−ン面感光剤塗布方法及びその装置
US4674521A (en) * 1985-05-20 1987-06-23 Machine Technology, Inc. Rinsing apparatus and method
IT8747793A0 (it) * 1987-03-31 1987-03-31 Siv Soc Italiana Vetro Apparecchiatura e procedimento per la fabbricazione di vetratura di sicurezza dotate di uno strato superficiale di materia plastica
JPS63246820A (ja) * 1987-04-02 1988-10-13 Mitsubishi Electric Corp 半導体製造方法
US4875434A (en) * 1987-04-02 1989-10-24 Mitsubishi Denki Kabushiki Kaisha Apparatus for coating a substrate with a coating material
JPS63313159A (ja) * 1987-06-17 1988-12-21 Toshiba Corp レジスト塗布装置

Also Published As

Publication number Publication date
EP0383356B1 (en) 1996-11-13
KR970007060B1 (ko) 1997-05-02
DE69029099D1 (de) 1996-12-19
EP0383356A2 (en) 1990-08-22
US5099782A (en) 1992-03-31
EP0383356A3 (en) 1992-02-12
DE69029099T2 (de) 1997-03-20

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Legal Events

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Payment date: 20110503

Year of fee payment: 15

EXPY Expiration of term