KR880009874A - 고-실리카 유리 제품의 제조방법 - Google Patents

고-실리카 유리 제품의 제조방법 Download PDF

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Publication number
KR880009874A
KR880009874A KR1019880001895A KR880001895A KR880009874A KR 880009874 A KR880009874 A KR 880009874A KR 1019880001895 A KR1019880001895 A KR 1019880001895A KR 880001895 A KR880001895 A KR 880001895A KR 880009874 A KR880009874 A KR 880009874A
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South Korea
Prior art keywords
silica
fraction
amount
containing material
sol
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KR1019880001895A
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English (en)
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KR950008579B1 (ko
Inventor
엠. 로비노비치 엘리저
Original Assignee
엘리 웨이스
아메리칸 텔레폰 앤드 텔레그라프 캄파니
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Publication of KR880009874A publication Critical patent/KR880009874A/ko
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Publication of KR950008579B1 publication Critical patent/KR950008579B1/ko

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/10Non-chemical treatment
    • C03B37/12Non-chemical treatment of fibres or filaments during winding up
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/016Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by a liquid phase reaction process, e.g. through a gel phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/14Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron and fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/08Doped silica-based glasses containing boron or halide
    • C03C2201/12Doped silica-based glasses containing boron or halide containing fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/08Doped silica-based glasses containing boron or halide
    • C03C2201/14Doped silica-based glasses containing boron or halide containing boron and fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/20Wet processes, e.g. sol-gel process

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

내용 없음.

Description

고-실리카 유리 제품의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (5)

  1. 실리카-함유 물질을 극성 액체중에 분산시켜 솔(sol)을 형성시킨 다음; 상기 솔을 겔화시켜 겔체(gel body)를 형성시키고; 상기 겔체를 가열처리하여 실리카-함유 유리체(glass body)를 형성시킨 다음; 제품의 제조를 완결시키는 단계를 포함하는, 실리카-함유 유리로 이루어진 제품을 제조하는 방법에 있어서, 상기 실리카-함유 물질이 적어도 화학적으로 결합된 불소를 함유하는 제1분획 및 실질적으로 화학적으로 결합된 불소가 부재하는 제2분획을 포함함을 특징으로 하는 방법.
  2. 제1항에 있어서, 액체상태 또는 용액상태의 적어도 하나의 실리콘-함유 화합물을 물-함유 용액과 반응[여기서, 플루오라이드 이온은 상기 화합물과 상기 물-함유 용액사이의 적어도 일부의 반응도중에 존재하며, 상기 반응단계는 상기 제1분획의 형성을 야기시킨다]시키는 단계를 추가로 포함하는 방법.
  3. 제2항에 있어서, 플루오라이드 이온의 양이 sio2100g당 F 약 0.5 내지 약 40g의 범위인 방법.
  4. 제1항에 있어서, 제1분획 및 제2분획의 총량을 기준으로 제1분획의 양이 약 3내지 약 60중량%인 방법.
  5. 제1항에 있어서, 제2분획중의 실리카-함유 물질의 단위질량당 BET표면적이 약 100m2/g이하인 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880001895A 1987-02-24 1988-02-24 하이-실리카 유리 제품의 제조방법 KR950008579B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1790587A 1987-02-24 1987-02-24
US017,905 1993-02-16
US17905 1993-02-16

Publications (2)

Publication Number Publication Date
KR880009874A true KR880009874A (ko) 1988-10-05
KR950008579B1 KR950008579B1 (ko) 1995-08-03

Family

ID=21785201

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880001895A KR950008579B1 (ko) 1987-02-24 1988-02-24 하이-실리카 유리 제품의 제조방법

Country Status (6)

Country Link
EP (1) EP0281282B1 (ko)
JP (1) JPS63295455A (ko)
KR (1) KR950008579B1 (ko)
CA (1) CA1318131C (ko)
DE (1) DE3850895T2 (ko)
DK (1) DK172918B1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69106795T2 (de) * 1990-02-05 1995-09-07 Furukawa Electric Co Ltd Quarzglas dotiert mit einem seltenen erde-element und verfahren zu deren herstellung.
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
DE102004046496A1 (de) * 2004-09-23 2006-04-06 Deutsches Zentrum für Luft- und Raumfahrt e.V. Dispergiermittel
DE102007045097B4 (de) 2007-09-20 2012-11-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von co-dotiertem Quarzglas

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535890A (en) * 1967-10-26 1970-10-27 Corning Glass Works Method of making fused silica
EP0215603A1 (en) * 1985-09-11 1987-03-25 AT&T Corp. Fabrication of high-silica glass article
JPS62100421A (ja) * 1985-10-24 1987-05-09 Seiko Epson Corp フツ素添加ガラスの製造方法
JPS62246828A (ja) * 1986-04-18 1987-10-28 Nippon Telegr & Teleph Corp <Ntt> 光学ガラスの製造方法

Also Published As

Publication number Publication date
EP0281282B1 (en) 1994-08-03
DK92588A (da) 1988-08-25
DE3850895D1 (de) 1994-09-08
DK92588D0 (da) 1988-02-23
JPS63295455A (ja) 1988-12-01
DK172918B1 (da) 1999-10-04
CA1318131C (en) 1993-05-25
EP0281282A1 (en) 1988-09-07
KR950008579B1 (ko) 1995-08-03
DE3850895T2 (de) 1994-12-22

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