KR860004321A - C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치 - Google Patents

C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치 Download PDF

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Publication number
KR860004321A
KR860004321A KR1019840007249A KR840007249A KR860004321A KR 860004321 A KR860004321 A KR 860004321A KR 1019840007249 A KR1019840007249 A KR 1019840007249A KR 840007249 A KR840007249 A KR 840007249A KR 860004321 A KR860004321 A KR 860004321A
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KR
South Korea
Prior art keywords
laser
mirror
measuring device
reflectance measuring
output
Prior art date
Application number
KR1019840007249A
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English (en)
Inventor
2) 최주현(외
Original Assignee
윤영석
대우중공업 주식회사
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Publication date
Application filed by 윤영석, 대우중공업 주식회사 filed Critical 윤영석
Priority to KR1019840007249A priority Critical patent/KR860004321A/ko
Priority to US06/775,749 priority patent/US4691106A/en
Priority to JP60221124A priority patent/JPS61215941A/ja
Publication of KR860004321A publication Critical patent/KR860004321A/ko
Priority to KR2019870011390U priority patent/KR870003345Y1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • G01J1/1626—Arrangements with two photodetectors, the signals of which are compared
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/103—Scanning by mechanical motion of stage

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Optical Radar Systems And Details Thereof (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

내용 없음

Description

CO2레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 전체적인 구성을 보인 블록다이아그램.
제2도는 본 발명에 의한 주사(Scan)방식을 보인 설명도.
제3도는 본 발명의 마스크를 보인 사시도.
* 도면의 주요 부분에 대한 부호 설명
1 : CO2레이저발생기, 2 : 쵸퍼(Chopper), 4 : 감쇄기, 5 : 빔스프리터, 6 : 피측정물, 7,7´: 적외선감지기, 8 : 아날로그멀티플렉서, 9 : A/D변환기, 10 : 마이크로폼퓨터, 13 : I/O포트, 14 : 모우터구동회로, 15 : X축의 펄스모우터, 16 : X축의 펄스모우터, 17 : X-Y테이블.

Claims (1)

  1. CO2레이저발생기(1)의 출력이 쵸퍼(3)에서 변조되고 감쇄기(4)에서 적정한 레벨로 감쇄되게 한 것에 있어서, 상기의 감쇄된 출력이 빔스프리터(5) 및 피측정물(6)에 의하여 적외선 감지기(7)(7´)에 입사되게 하고, 이의 출력신호가 아날로그 멀티플렉서(8) 및 A/D 변환기(9) 그리고 I/O포트(13)를 경유하여 마이크로콤퓨터(10)에 입력되게 하며, 마이크로폼퓨터(10)의 명련에 의하여 모우터 구동회로(14)가 X축과 Y축의 펄스모우터(15)(16)를 구동시켜 X-Y테이블(17)을 이동시켜 줌으로써 빔스프리터(5)에 의한 레이저빔으로 피측정물(6)을 주사(Scan)할 수 있게 한 CO2레이저를 이용한 미러의 반사율 측정장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840007249A 1984-11-20 1984-11-20 C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치 KR860004321A (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019840007249A KR860004321A (ko) 1984-11-20 1984-11-20 C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치
US06/775,749 US4691106A (en) 1984-11-20 1985-09-13 Apparatus for determining reflectivity of an object such as a mirror
JP60221124A JPS61215941A (ja) 1984-11-20 1985-10-03 Ｃｏ↓２レ−ザ−を利用したミラ−の反射率測定装置
KR2019870011390U KR870003345Y1 (ko) 1984-11-20 1987-07-10 CO₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019840007249A KR860004321A (ko) 1984-11-20 1984-11-20 C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR2019870011390U Division KR870003345Y1 (ko) 1984-11-20 1987-07-10 CO₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치

Publications (1)

Publication Number Publication Date
KR860004321A true KR860004321A (ko) 1986-06-20

Family

ID=19236255

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840007249A KR860004321A (ko) 1984-11-20 1984-11-20 C0₂레이저(Laser)를 이용한 미러(Mirror)의 반사율 측정장치

Country Status (3)

Country Link
US (1) US4691106A (ko)
JP (1) JPS61215941A (ko)
KR (1) KR860004321A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100360113B1 (ko) * 2000-12-11 2002-11-07 진용옥 오목 거울의 회전을 이용한 분광 촬상 시스템

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2556910B2 (ja) * 1989-11-30 1996-11-27 浜松ホトニクス株式会社 光強度変化検出装置
US8352400B2 (en) 1991-12-23 2013-01-08 Hoffberg Steven M Adaptive pattern recognition based controller apparatus and method and human-factored interface therefore
US10361802B1 (en) 1999-02-01 2019-07-23 Blanding Hovenweep, Llc Adaptive pattern recognition based control system and method
US5754286A (en) * 1996-05-30 1998-05-19 Fuji Photo Film Co., Ltd. Method of identifying defective picture element in image-wise exposure apparatus
NO307675B1 (no) * 1997-04-18 2000-05-08 Lasse Leirfall Anvendelse av en mÕleanordning til indikering av en forurenset, tilsmusset eller brannfarlig tilstand
US7904187B2 (en) 1999-02-01 2011-03-08 Hoffberg Steven M Internet appliance system and method
ATE459869T1 (de) * 2002-09-12 2010-03-15 Trumpf Laser & Systemtechnik Vorrichtung zur überwachung der funktionalität eines optischen elements
US8646227B2 (en) * 2008-07-03 2014-02-11 Mh Solar Co., Ltd. Mass producible solar collector
US20100000517A1 (en) * 2008-07-03 2010-01-07 Greenfield Solar Corp. Sun position tracking
US20100000594A1 (en) * 2008-07-03 2010-01-07 Greenfield Solar Corp. Solar concentrators with temperature regulation
US8450597B2 (en) * 2008-07-03 2013-05-28 Mh Solar Co., Ltd. Light beam pattern and photovoltaic elements layout
US8345255B2 (en) * 2008-07-03 2013-01-01 Mh Solar Co., Ltd. Solar concentrator testing
US9073098B2 (en) * 2012-05-16 2015-07-07 Asml Netherlands B.V. Light collector mirror cleaning

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991302A (en) * 1974-11-22 1976-11-09 Grumman Aerospace Corporation Method for detecting and isolating faults in digital and analog circuits with multiple infrared scanning under conditions of different stimuli
JPS5271287A (en) * 1975-12-11 1977-06-14 Ricoh Co Ltd Measurement of reflection factor
US4203064A (en) * 1977-04-05 1980-05-13 Tokyo Shibaura Electric Co., Ltd. Method for automatically controlling the position of small objects
US4511800A (en) * 1983-03-28 1985-04-16 Rca Corporation Optical reflectance method for determining the surface roughness of materials in semiconductor processing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100360113B1 (ko) * 2000-12-11 2002-11-07 진용옥 오목 거울의 회전을 이용한 분광 촬상 시스템

Also Published As

Publication number Publication date
US4691106A (en) 1987-09-01
JPS61215941A (ja) 1986-09-25

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